Akira Tsuji

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation sensitive resin composition
- Patent number RE37179
- Issue date May 15, 2001
- JSR Corporation
- Mikio Yamachika
- 430 - Radiation imagery chemistry: process, composition, or product thereof
Information Patent Grant
Chemically amplified resist composition
- Patent number 6,114,086
- Issue date Sep 5, 2000
- JSR Corporation
- Eiichi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,007,961
- Issue date Dec 28, 1999
- JSR Corporation
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition
- Patent number 5,962,180
- Issue date Oct 5, 1999
- JSR Corporation
- Shinichiro Iwanaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist composition
- Patent number 5,916,729
- Issue date Jun 29, 1999
- JSR Corporation
- Eiichi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition
- Patent number 5,798,201
- Issue date Aug 25, 1998
- Japan Synthetic Rubber Co., Ltd.
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified, radiation-sensitive resin composition
- Patent number 5,731,125
- Issue date Mar 24, 1998
- Japan Synthetic Rubber Co., Ltd.
- Mikio Yamachika
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition
- Patent number 5,707,558
- Issue date Jan 13, 1998
- Japan Synthetic Rubber Co., Ltd.
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition
- Patent number 5,679,495
- Issue date Oct 21, 1997
- Japan Synthetic Rubber Co., Ltd.
- Mikio Yamachika
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition containing quinone diazide es...
- Patent number 5,672,459
- Issue date Sep 30, 1997
- Japan Synthetic Rubber Co., Ltd.
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist composition
- Patent number 5,629,135
- Issue date May 13, 1997
- Japan Synthetic Rubber Co., Ltd.
- Eiichi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition comprising copolymer of isopr...
- Patent number 5,556,734
- Issue date Sep 17, 1996
- Japan Synthetic Rubber Co., Ltd.
- Mikio Yamachika
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Akira Tsuji

Person

Patents Grantslast 30 patents

Radiation sensitive resin composition

Chemically amplified resist composition

Radiation-sensitive resin composition

Radiation sensitive composition

Chemically amplified resist composition

Radiation sensitive resin composition

Chemically amplified, radiation-sensitive resin composition

Radiation sensitive resin composition

Radiation sensitive resin composition

Radiation sensitive resin composition containing quinone diazide es...

Chemically amplified resist composition

Radiation sensitive resin composition comprising copolymer of isopr...