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Light-sensitive composition
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Patent number 5,364,738
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Issue date Nov 15, 1994
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Fuji Photo Film Co., Ltd.
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Shunichi Kondo
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Photopolymerizable composition
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Patent number 5,346,805
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Issue date Sep 13, 1994
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Fuji Photo Film Co., Ltd.
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Syunichi Kondo
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C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Light-sensitive composition
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Patent number 5,320,931
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Issue date Jun 14, 1994
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Fuji Photo Film Co., Ltd.
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Akira Umehara
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Photopolymerizable composition
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Patent number 5,250,385
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Issue date Oct 5, 1993
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Fuji Photo Film Co., Ltd.
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Syunichi Kondo
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Positively working resist material
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Patent number 4,842,986
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Issue date Jun 27, 1989
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Fuji Photo Film Co., Ltd.
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Nobuaki Matsuda
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Photopolymerizable compositions
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Patent number 4,505,793
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Issue date Mar 19, 1985
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Fuji Photo Film Co., Ltd.
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Koji Tamoto
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C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Photopolymerizable compositions
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Patent number 4,399,211
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Issue date Aug 16, 1983
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Fuji Photo Film Co., Ltd.
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Syunichi Kondo
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C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Photopolymerizable composition
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Patent number 4,367,280
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Issue date Jan 4, 1983
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Fuji Photo Film Co., Ltd.
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Syunichi Kondo
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C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Photopolymerizable compositions
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Patent number 4,290,870
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Issue date Sep 22, 1981
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Fuji Photo Film Co., Ltd.
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Syunichi Kondoh
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C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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