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Akitaka Makino

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Patents Grantslast 30 patents

  • Information Patent Grant

    Vacuum processing apparatus
    • Patent number 11,710,619
    • Issue date Jul 25, 2023
    • HITACHI HIGH-TECH CORPORATION
    • Kohei Sato
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus with gas feed and evacuation conduit
    • Patent number 10,103,007
    • Issue date Oct 16, 2018
    • Hitachi High-Technologies Corporation
    • Takumi Tandou
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Wafer processing based on sensor detection and system learning
    • Patent number 8,897,906
    • Issue date Nov 25, 2014
    • Hitachi High-Technologies Corporation
    • Tomohiro Ohashi
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Vacuum processing apparatus
    • Patent number 8,740,011
    • Issue date Jun 3, 2014
    • Hitachi High-Technologies Corporation
    • Susumu Tauchi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus and plasma processing method
    • Patent number 8,569,177
    • Issue date Oct 29, 2013
    • Hitachi High-Technologies Corporation
    • Tomohiro Ohashi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Vacuum processing apparatus
    • Patent number 8,460,467
    • Issue date Jun 11, 2013
    • Hitachi High-Technologies Corporation
    • Akitaka Makino
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Vacuum processing apparatus
    • Patent number 8,286,822
    • Issue date Oct 16, 2012
    • Hitachi High-Technologies Corporation
    • Susumu Tauchi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 8,216,420
    • Issue date Jul 10, 2012
    • Hitachi High-Technologies Corporation
    • Hideyuki Kazumi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma treatment apparatus and plasma treatment method
    • Patent number 8,148,268
    • Issue date Apr 3, 2012
    • Hitachi High-Technologies Corporation
    • Kohei Sato
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Vacuum processing apparatus
    • Patent number 8,100,620
    • Issue date Jan 24, 2012
    • Hitachi High-Technologies Corporation
    • Masakazu Isozaki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Vacuum processing apparatus
    • Patent number 8,048,259
    • Issue date Nov 1, 2011
    • Hitachi High-Technologies Corporation
    • Michiaki Kobayashi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Vacuum processing apparatus
    • Patent number 7,976,632
    • Issue date Jul 12, 2011
    • Hitachi High-Technologies Corporation
    • Akitaka Makino
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Vacuum processing apparatus
    • Patent number 7,833,382
    • Issue date Nov 16, 2010
    • Hitachi High-Technologies Corporation
    • Akitaka Makino
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Vacuum processing apparatus
    • Patent number 7,828,928
    • Issue date Nov 9, 2010
    • Hitachi High-Technologies Corporation
    • Akitaka Makino
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Plasma processing apparatus and plasma processing method
    • Patent number 7,807,581
    • Issue date Oct 5, 2010
    • Hitachi High-Technologies Corporation
    • Susumu Tauchi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 7,674,351
    • Issue date Mar 9, 2010
    • Hitachi High-Technologies Corporation
    • Akitaka Makino
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Vacuum processing apparatus
    • Patent number 7,641,069
    • Issue date Jan 5, 2010
    • Hitachi High-Technologies Corporation
    • Susumu Tauchi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 7,416,633
    • Issue date Aug 26, 2008
    • Hitachi High-Technologies Corporation
    • Akitaka Makino
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Vacuum processing apparatus
    • Patent number 7,335,277
    • Issue date Feb 26, 2008
    • Hitachi High-Technologies Corporation
    • Akitaka Makino
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Vacuum processing apparatus
    • Patent number 7,322,561
    • Issue date Jan 29, 2008
    • Hitachi High-Technologies Corporation
    • Susumu Tauchi
    • F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
  • Information Patent Grant

    Cover ring for a plasma processing apparatus
    • Patent number D557425
    • Issue date Dec 11, 2007
    • Hitachi High-Technologies Corporation
    • Tsutomu Nakamura
    • D24 - Medical and laboratory equipment
  • Information Patent Grant

    Electrode cover for a plasma processing apparatus
    • Patent number D557226
    • Issue date Dec 11, 2007
    • Hitachi High-Technologies Corporation
    • Takeo Uchino
    • D13 - Equipment for production, distribution, or transformation of energy
  • Information Patent Grant

    Grounded electrode for a plasma processing apparatus
    • Patent number D556704
    • Issue date Dec 4, 2007
    • Hitachi High-Technologies Corporation
    • Tsutomu Nakamura
    • D13 - Equipment for production, distribution, or transformation of energy
  • Information Patent Grant

    Vacuum processing apparatus
    • Patent number 7,247,207
    • Issue date Jul 24, 2007
    • Hitachi High-Technologies Corporation
    • Akitaka Makino
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Vacuum processing apparatus and vacuum processing method
    • Patent number 7,194,821
    • Issue date Mar 27, 2007
    • Hitachi High-Technologies Corporation
    • Manabu Edamura
    • G05 - CONTROLLING REGULATING
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 6,850,012
    • Issue date Feb 1, 2005
    • Hitachi High-Technologies Corporation
    • Manabu Edamura
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents