Alex Buxbaum

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Differential imaging with pattern recognition for process automatio...
- Patent number 9,881,766
- Issue date Jan 30, 2018
- FEI Company
- Alexander Buxbaum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface delayering with a programmed manipulator
- Patent number 9,735,066
- Issue date Aug 15, 2017
- FEI Company
- Alexander Buxbaum
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Grant
Differential imaging with pattern recognition for process automatio...
- Patent number 9,297,727
- Issue date Mar 29, 2016
- FEI Company
- Alexander Buxbaum
- G01 - MEASURING TESTING
Information Patent Grant
Method of reducing critical dimension bias during fabrication of a...
- Patent number 7,737,040
- Issue date Jun 15, 2010
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of reducing the average process bias during production of a...
- Patent number 7,468,227
- Issue date Dec 23, 2008
- Applied Materials, Inc.
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle fabrication using a removable hard mask
- Patent number 7,365,014
- Issue date Apr 29, 2008
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus used in reshaping a surface of a photoresist
- Patent number 7,244,334
- Issue date Jul 17, 2007
- Applied Materials, Inc.
- Alex Buxbaum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing a patterned photoresist used to prepare high pe...
- Patent number 7,208,249
- Issue date Apr 24, 2007
- Applied Materials, Inc.
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for substrate orientation
- Patent number 7,077,973
- Issue date Jul 18, 2006
- Applied Materials, Inc.
- Alex Buxbaum
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of increasing the shelf life of a blank photomask substrate
- Patent number 6,998,206
- Issue date Feb 14, 2006
- Applied Materials, Inc.
- Scott Fuller
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Apparatus for reshaping a patterned organic photoresist surface
- Patent number 6,931,619
- Issue date Aug 16, 2005
- Applied Materials, Inc.
- Alex Buxbaum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of preparing optically imaged high performance photomasks
- Patent number 6,703,169
- Issue date Mar 9, 2004
- Applied Materials, Inc.
- Scott Fuller
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of reshaping a patterned organic photoresist surface
- Patent number 6,582,861
- Issue date Jun 24, 2003
- Applied Materials, Inc.
- Alex Buxbaum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DIFFERENTIAL IMAGING WITH PATTERN RECOGNITION FOR PROCESS AUTOMATIO...
- Publication number 20160211113
- Publication date Jul 21, 2016
- FEI Company
- Alexander Buxbaum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Delayering with a Programmed Manipulator
- Publication number 20150214124
- Publication date Jul 30, 2015
- FEI Company
- Alexander Buxbaum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Differential Imaging with Pattern Recognition for Process Automatio...
- Publication number 20150136977
- Publication date May 21, 2015
- FEI Company
- Alexander Buxbaum
- G01 - MEASURING TESTING
Information Patent Application
Method of reducing critical dimension bias during fabrication of a...
- Publication number 20080096138
- Publication date Apr 24, 2008
- APPLIED MATERIALS, INC.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of reducing the average process bias during production of a...
- Publication number 20060105248
- Publication date May 18, 2006
- APPLIED MATERIALS, INC.
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus used in reshaping a surface of a photoresist
- Publication number 20050250023
- Publication date Nov 10, 2005
- Alex Buxbaum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle fabrication using a removable hard mask
- Publication number 20050170655
- Publication date Aug 4, 2005
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for substrate orientation
- Publication number 20040209477
- Publication date Oct 21, 2004
- APPLIED MATERIALS, INC.
- Alex Buxbaum
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of increasing the shelf life of a blank photomask substrate
- Publication number 20040146790
- Publication date Jul 29, 2004
- Scott Fuller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of producing a patterned photoresist used to prepare high pe...
- Publication number 20040063003
- Publication date Apr 1, 2004
- APPLIED MATERIALS, INC.
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for reshaping a patterned organic photoresist surface
- Publication number 20030180634
- Publication date Sep 25, 2003
- Alex Buxbaum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of preparing optically imaged high performance photomasks
- Publication number 20030027083
- Publication date Feb 6, 2003
- APPLIED MATERIALS, INC.
- Scott Fuller
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Method of reshaping a patterned organic photoresist surface
- Publication number 20020160274
- Publication date Oct 31, 2002
- APPLIED MATERIALS, INC.
- Alex Buxbaum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Alex Buxbaum

Person

Patents Grantslast 30 patents

Differential imaging with pattern recognition for process automatio...

Surface delayering with a programmed manipulator

Differential imaging with pattern recognition for process automatio...

Method of reducing critical dimension bias during fabrication of a...

Method of reducing the average process bias during production of a...

Reticle fabrication using a removable hard mask

Apparatus used in reshaping a surface of a photoresist

Method of producing a patterned photoresist used to prepare high pe...

Methods for substrate orientation

Method of increasing the shelf life of a blank photomask substrate

Apparatus for reshaping a patterned organic photoresist surface

Method of preparing optically imaged high performance photomasks

Method of reshaping a patterned organic photoresist surface

Patents Applicationslast 30 patents

DIFFERENTIAL IMAGING WITH PATTERN RECOGNITION FOR PROCESS AUTOMATIO...

Surface Delayering with a Programmed Manipulator

Differential Imaging with Pattern Recognition for Process Automatio...

Method of reducing critical dimension bias during fabrication of a...

Method of reducing the average process bias during production of a...

Apparatus used in reshaping a surface of a photoresist

Reticle fabrication using a removable hard mask

Methods for substrate orientation

Method of increasing the shelf life of a blank photomask substrate

Method of producing a patterned photoresist used to prepare high pe...

Apparatus for reshaping a patterned organic photoresist surface

Method of preparing optically imaged high performance photomasks

Method of reshaping a patterned organic photoresist surface