ALEX DEMOS

Person

SAN FRANCISCO, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gas injection system for plasma processing
- Patent number 8,025,731
- Issue date Sep 27, 2011
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas injection system for plasma processing
- Patent number 7,785,417
- Issue date Aug 31, 2010
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing a silicon containing layer on a semiconductor...
- Patent number 6,626,185
- Issue date Sep 30, 2003
- Lam Research Corporation
- Alex Demos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum plasma processor having coil with intermediate portion coupl...
- Patent number 6,268,700
- Issue date Jul 31, 2001
- Lam Research Corporation
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas injection system for plasma processing
- Patent number 6,230,651
- Issue date May 15, 2001
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma CVD
- Patent number 6,184,158
- Issue date Feb 6, 2001
- Lam Research Corporation
- Paul Kevin Shufflebotham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum plasma processor having coil with added conducting segments...
- Patent number 6,028,395
- Issue date Feb 22, 2000
- Lam Research Corporation
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching of transparent electrodes in a low pressure plasma reactor
- Patent number 5,667,631
- Issue date Sep 16, 1997
- Lam Research Corporation
- John P. Holland
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES

Patents Applicationslast 30 patents

Information Patent Application
Gas injection system for plasma processing
- Publication number 20100327085
- Publication date Dec 30, 2010
- Lam Research Corporation,
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively coupled plasma CVD
- Publication number 20010019903
- Publication date Sep 6, 2001
- Paul Kevin Shufflebotham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas injection system for plasma processing
- Publication number 20010010257
- Publication date Aug 2, 2001
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU CHAMBER CLEANING METHOD FOR SUBSTRATE PROCESSING CHAMBER US...
- Publication number 20010008138
- Publication date Jul 19, 2001
- ALEX DEMOS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Gas injection system for plasma processing

Gas injection system for plasma processing

Method of depositing a silicon containing layer on a semiconductor...

Vacuum plasma processor having coil with intermediate portion coupl...

Gas injection system for plasma processing

Inductively coupled plasma CVD

Vacuum plasma processor having coil with added conducting segments...

Dry etching of transparent electrodes in a low pressure plasma reactor

Patents Applicationslast 30 patents

Gas injection system for plasma processing

Inductively coupled plasma CVD

Gas injection system for plasma processing

IN-SITU CHAMBER CLEANING METHOD FOR SUBSTRATE PROCESSING CHAMBER US...