Jeong, Hyun Kim, Sung Il Park, Ki Hyun Ryu, Gyu Hyeon Lee, and Chan Hee Hong, "Interaction Between Cr and Cl.sub.2 Gas in TFT-Array Fabrication," LG Electronics, Inc., 533 Hogaedong, Anyangshi, 430-080 Korea, pp. 85-86. |
C. Barratt, C. Constantine, D. Johnson, and W. Barrow, "Dry-Etching of Indium Tin Oxide for Flat-Panel-Display Fabrication," Plasma-Therm, Inc., St. Petersburg, FL and Planar Systems, Beaverton, OR, 30.3 |
Masaru Takabatake, Youkou Wakui, and Nobutake Konishi, "Ito Dry Etching Using HBr Gas For TFT-LCD's," (Dry Etch Symposium) P3-4, pp. 200-203, Hitachi Research Lab, Hitachi, Ltd., 7-1-1, Omica-cho, Hitachi-shi, Ibaraki-ken, 319-12, Japan. |
R.J. Saia, R.F. Kwasnick, and C.Y. Wei, "Selective Reactive Ion Etching of Indium-Tin Oxide in a Hydrocarbon Gas Mixture," J. Electrochem, Soc. vol. 138, No. 2, (Feb. 1991), pp. 493-496. |
J. Malloy, P. Maguire, S.J. Laverty, and J.A. McLaughlin, "The Reactive Ion Etching of Transparent Electrodes for Flat Panel Displays Using Ar/Cl.sub.2 Plasmas," J. Electrochem Soc., vol. 142., No. 12, (Dec. 1995), pp. 4285-4289. |
S.A. Knickerbocker and A.K. Kulkarni, "Calculation of the Figure of Merit for Indium Tin Oxide Films Based on Basic Theory," J. Vac. Sci. Technol. A, vol. 13, No. 3, (May 1995, Jun. 1995), pp. 1048-1052. |
L.Y. Tsou, "Reactive Ion Etching of Indium Tin Oxide with Hydrogen Bromide," J. Electrochem. Soc., vol. 140, No. 10, (Oct. 1993), pp. 2965-2969. |