Alex Goldenshtein

Person

Nes Ziona, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam apparatus and method of controlling sample ch...
- Patent number 11,545,338
- Issue date Jan 3, 2023
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterriftechnik mbH
- Dominik Patrick Ehberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
On-axis illumination and alignment for charge control during charge...
- Patent number 10,168,614
- Issue date Jan 1, 2019
- Applied Materials Israel Ltd.
- Alex Goldenshtein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection of a lithographic mask that is protected by a pellicle
- Patent number 10,156,785
- Issue date Dec 18, 2018
- Applied Materials Israel Ltd.
- Alon Litman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for discharging an area that is scanned by an electron beam
- Patent number 10,153,126
- Issue date Dec 11, 2018
- Applied Materials Israel Ltd.
- Alex Goldenshtein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for discharging an area that is scanned by an electron beam
- Patent number 9,673,023
- Issue date Jun 6, 2017
- Applied Materials Israel Ltd.
- Alex Goldenshtein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection of a lithographic mask that is protected by a pellicle
- Patent number 9,366,954
- Issue date Jun 14, 2016
- Applied Materials Israel Ltd.
- Alon Litman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection system and a method for aerial reticle inspection
- Patent number 7,400,390
- Issue date Jul 15, 2008
- Applied Materials, Israel, Ltd.
- Alex Goldenshtein
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
DISCHARGING A REGION OF A SAMPLE
- Publication number 20240420917
- Publication date Dec 19, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Roey Levy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRICAL IMPEDANCE MEASUREMENT USING AN ELECTRON BEAM
- Publication number 20240151669
- Publication date May 9, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Alex Goldenshtein
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND METHOD OF CONTROLLING SAMPLE CH...
- Publication number 20220359152
- Publication date Nov 10, 2022
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Dominik Patrick Ehberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ON-AXIS ILLUMINATION AND ALIGNMENT FOR CHARGE CONTROL DURING CHARGE...
- Publication number 20180364564
- Publication date Dec 20, 2018
- APPLIED MATERIALS ISRAEL LTD.
- Alex Goldenshtein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM FOR DISCHARGING AN AREA THAT IS SCANNED BY AN ELECTRON BEAM
- Publication number 20170250052
- Publication date Aug 31, 2017
- APPLIED MATERIALS ISRAEL LTD.
- Alex GOLDENSHTEIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR DISCHARGING AN AREA THAT IS SCANNED BY AN ELECTRON BEAM
- Publication number 20160336146
- Publication date Nov 17, 2016
- APPLIED MATERIALS ISRAEL LTD.
- Alex GOLDENSHTEIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION OF A LITHOGRAPHIC MASK THAT IS PROTECTED BY A PELLICLE
- Publication number 20160282714
- Publication date Sep 29, 2016
- APPLIED MATERIALS ISRAEL LTD.
- Alon Litman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION OF A LITHOGRAPHIC MASK THAT IS PROTECTED BY A PELLICLE
- Publication number 20150028203
- Publication date Jan 29, 2015
- Applied Materials Israel, Ltd.
- Alon Litman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection system and a method for aerial reticle inspection
- Publication number 20060114453
- Publication date Jun 1, 2006
- Applied Materials Israel Ltd.
- Alex Goldenshtein
- G01 - MEASURING TESTING

Alex Goldenshtein

Person

Patents Grantslast 30 patents

Charged particle beam apparatus and method of controlling sample ch...

On-axis illumination and alignment for charge control during charge...

Inspection of a lithographic mask that is protected by a pellicle

System for discharging an area that is scanned by an electron beam

System for discharging an area that is scanned by an electron beam

Inspection of a lithographic mask that is protected by a pellicle

Inspection system and a method for aerial reticle inspection

Patents Applicationslast 30 patents

DISCHARGING A REGION OF A SAMPLE

ELECTRICAL IMPEDANCE MEASUREMENT USING AN ELECTRON BEAM

CHARGED PARTICLE BEAM APPARATUS AND METHOD OF CONTROLLING SAMPLE CH...

ON-AXIS ILLUMINATION AND ALIGNMENT FOR CHARGE CONTROL DURING CHARGE...

SYSTEM FOR DISCHARGING AN AREA THAT IS SCANNED BY AN ELECTRON BEAM

SYSTEM FOR DISCHARGING AN AREA THAT IS SCANNED BY AN ELECTRON BEAM

INSPECTION OF A LITHOGRAPHIC MASK THAT IS PROTECTED BY A PELLICLE

INSPECTION OF A LITHOGRAPHIC MASK THAT IS PROTECTED BY A PELLICLE

Inspection system and a method for aerial reticle inspection