Alex Paterson

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 12,193,138
- Issue date Jan 7, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-frequency, direct-drive inductively coupled plasma source
- Patent number 12,165,841
- Issue date Dec 10, 2024
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching isolation features and dense features within a substrate
- Patent number 12,119,232
- Issue date Oct 15, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-level parameter and frequency pulsing with a low angular spread
- Patent number 12,068,131
- Issue date Aug 20, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective silicon dioxide removal using low pressure low bias deute...
- Patent number 12,057,319
- Issue date Aug 6, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronization of RF generators
- Patent number 12,046,450
- Issue date Jul 23, 2024
- Lam Research Corporation
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge ring arrangement with moveable edge rings
- Patent number 12,027,410
- Issue date Jul 2, 2024
- Lam Research Corporation
- Haoquan Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 11,915,912
- Issue date Feb 27, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for cooling RF heated chamber components
- Patent number 11,887,819
- Issue date Jan 30, 2024
- Lam Research Corporation
- Jon McChesney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for reverse pulsing
- Patent number 11,798,785
- Issue date Oct 24, 2023
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct frequency tuning for matchless plasma source in substrate pr...
- Patent number 11,728,137
- Issue date Aug 15, 2023
- Lam Research Corporation
- Yuhou Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF pulsing within pulsing for semiconductor RF plasma processing
- Patent number 11,728,136
- Issue date Aug 15, 2023
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 11,716,805
- Issue date Aug 1, 2023
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air cooled faraday shield and methods for using the same
- Patent number 11,692,732
- Issue date Jul 4, 2023
- Lam Research Corporation
- Saravanapriyan Sriraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Moveable edge coupling ring for edge process control during semicon...
- Patent number 11,605,546
- Issue date Mar 14, 2023
- Lam Research Corporation
- Jon McChesney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 11,569,067
- Issue date Jan 31, 2023
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone cooling of plasma heated window
- Patent number 11,538,666
- Issue date Dec 27, 2022
- Lam Research Corporation
- Yiting Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for cooling RF heated chamber components
- Patent number 11,495,441
- Issue date Nov 8, 2022
- Lam Research Corporation
- Jon McChesney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-level parameter and frequency pulsing with a low angular spread
- Patent number 11,462,390
- Issue date Oct 4, 2022
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency tuning for a matchless plasma source
- Patent number 11,437,219
- Issue date Sep 6, 2022
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of on-wafer cd uniformity with movable edge ring and gas in...
- Patent number 11,424,103
- Issue date Aug 23, 2022
- Lam Research Corporation
- Yiting Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching isolation features and dense features within a substrate
- Patent number 11,398,387
- Issue date Jul 26, 2022
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF pulsing within pulsing for semiconductor RF plasma processing
- Patent number 11,342,159
- Issue date May 24, 2022
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 11,224,116
- Issue date Jan 11, 2022
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal plasma grid for semiconductor fabrication
- Patent number 11,171,021
- Issue date Nov 9, 2021
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for removing and replacing consumable parts from a semicond...
- Patent number 11,112,773
- Issue date Sep 7, 2021
- Lam Research Corporation
- David D. Trussell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal contamination reduction in substrate processing systems with...
- Patent number 11,056,321
- Issue date Jul 6, 2021
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 11,049,693
- Issue date Jun 29, 2021
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monoenergetic ion generation for controlled etch
- Patent number 11,011,351
- Issue date May 18, 2021
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image based plasma sheath profile detection on plasma processing tools
- Patent number 10,957,521
- Issue date Mar 23, 2021
- Lam Research Corporation
- Yuhou Wang
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
Reference Box for Direct-Drive Radiofrequency Power Supply
- Publication number 20240404804
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Junction System for Direct-Drive Radiofrequency Power Supply
- Publication number 20240396372
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Symmetric Coupling of Coil to Direct-Drive Radiofrequency Power Sup...
- Publication number 20240395503
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- John Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Enclosure Including Spectral Reflectometry System for Pla...
- Publication number 20240395519
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING ARRANGEMENT WITH MOVEABLE EDGE RINGS
- Publication number 20240355667
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Haoquan Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SILICON DIOXIDE REMOVAL USING LOW PRESSURE LOW BIAS DEUTE...
- Publication number 20240355636
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF RF GENERATORS
- Publication number 20240331976
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...
- Publication number 20240162005
- Publication date May 16, 2024
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REVERSE PULSING
- Publication number 20240030000
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING
- Publication number 20230360883
- Publication date Nov 9, 2023
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR CONTROLLING PLASMA DENSITY DISTRIBUTION PROFILES INCLUD...
- Publication number 20230352272
- Publication date Nov 2, 2023
- LAM RESEARCH CORPORATION
- Juline SHOEB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20230354502
- Publication date Nov 2, 2023
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSING RF COILS OF A PLASMA CHAMBER IN REVERSE SYNCHRONIZATION
- Publication number 20230282448
- Publication date Sep 7, 2023
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF RF GENERATORS
- Publication number 20230274913
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID LIQUID/AIR COOLING SYSTEM FOR TCP WINDOWS
- Publication number 20230245854
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Andrea ALBERTI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Protection System for Switches in Direct Drive Circuits of Substrat...
- Publication number 20230245873
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF RF PULSING SCHEMES AND OF SENSOR DATA COLLECTION
- Publication number 20230230805
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- John Stephen Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Controlling Radiofrequency Pulse-Initiation...
- Publication number 20230154728
- Publication date May 18, 2023
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC WINDOW FOR SUBSTRATE PROCESSING CHAMBER
- Publication number 20230126058
- Publication date Apr 27, 2023
- LAM RESEARCH CORPORATION
- Maolin LONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE COOLING OF PLASMA HEATED WINDOW
- Publication number 20230121097
- Publication date Apr 20, 2023
- LAM RESEARCH CORPORATION
- Yiting ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...
- Publication number 20230124201
- Publication date Apr 20, 2023
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR COOLING RF HEATED CHAMBER COMPONENTS
- Publication number 20230039721
- Publication date Feb 9, 2023
- LAM RESEARCH CORPORATION
- Jon MCCHESNEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LEVEL PARAMETER AND FREQUENCY PULSING WITH A LOW ANGULAR SPREAD
- Publication number 20230005718
- Publication date Jan 5, 2023
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING ISOLATION FEATURES AND DENSE FEATURES WITHIN A SUBSTRATE
- Publication number 20220319856
- Publication date Oct 6, 2022
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING SYSTEMS FOR SUBSTRATE PROCESSING SYSTEMS
- Publication number 20220285136
- Publication date Sep 8, 2022
- LAM RESEARCH CORPORATION
- Hui Ling HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING
- Publication number 20220254608
- Publication date Aug 11, 2022
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE
- Publication number 20220199365
- Publication date Jun 23, 2022
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Automated Frequency Tuning of Radiofrequency...
- Publication number 20220189738
- Publication date Jun 16, 2022
- LAM RESEARCH CORPORATION
- Mathew Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SILICON DIOXIDE REMOVAL USING LOW PRESSURE LOW BIAS DEUTE...
- Publication number 20220148852
- Publication date May 12, 2022
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LOCATION DETECTION AND ADJUSTMENT
- Publication number 20220126454
- Publication date Apr 28, 2022
- LAM RESEARCH CORPORATION
- Michael John Martin
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS

Alex Paterson

Person

Patents Grantslast 30 patents

Matchless plasma source for semiconductor wafer fabrication

Dual-frequency, direct-drive inductively coupled plasma source

Etching isolation features and dense features within a substrate

Multi-level parameter and frequency pulsing with a low angular spread

Selective silicon dioxide removal using low pressure low bias deute...

Synchronization of RF generators

Edge ring arrangement with moveable edge rings

Systems and methods for achieving peak ion energy enhancement with...

Systems for cooling RF heated chamber components

Systems for reverse pulsing

Direct frequency tuning for matchless plasma source in substrate pr...

RF pulsing within pulsing for semiconductor RF plasma processing

Matchless plasma source for semiconductor wafer fabrication

Air cooled faraday shield and methods for using the same

Moveable edge coupling ring for edge process control during semicon...

Systems and methods for achieving peak ion energy enhancement with...

Multi-zone cooling of plasma heated window

Systems for cooling RF heated chamber components

Multi-level parameter and frequency pulsing with a low angular spread

Frequency tuning for a matchless plasma source

Control of on-wafer cd uniformity with movable edge ring and gas in...

Etching isolation features and dense features within a substrate

RF pulsing within pulsing for semiconductor RF plasma processing

Matchless plasma source for semiconductor wafer fabrication

Internal plasma grid for semiconductor fabrication

Systems for removing and replacing consumable parts from a semicond...

Metal contamination reduction in substrate processing systems with...

Systems and methods for achieving peak ion energy enhancement with...

Monoenergetic ion generation for controlled etch

Image based plasma sheath profile detection on plasma processing tools

Patents Applicationslast 30 patents

Reference Box for Direct-Drive Radiofrequency Power Supply

Junction System for Direct-Drive Radiofrequency Power Supply

Symmetric Coupling of Coil to Direct-Drive Radiofrequency Power Sup...

Metrology Enclosure Including Spectral Reflectometry System for Pla...

EDGE RING ARRANGEMENT WITH MOVEABLE EDGE RINGS

SELECTIVE SILICON DIOXIDE REMOVAL USING LOW PRESSURE LOW BIAS DEUTE...

SYNCHRONIZATION OF RF GENERATORS

SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...

SYSTEMS AND METHODS FOR REVERSE PULSING

RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING

SYSTEMS FOR CONTROLLING PLASMA DENSITY DISTRIBUTION PROFILES INCLUD...

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

PULSING RF COILS OF A PLASMA CHAMBER IN REVERSE SYNCHRONIZATION

SYNCHRONIZATION OF RF GENERATORS

HYBRID LIQUID/AIR COOLING SYSTEM FOR TCP WINDOWS

Protection System for Switches in Direct Drive Circuits of Substrat...

SYNCHRONIZATION OF RF PULSING SCHEMES AND OF SENSOR DATA COLLECTION

Methods and Systems for Controlling Radiofrequency Pulse-Initiation...

DIELECTRIC WINDOW FOR SUBSTRATE PROCESSING CHAMBER

MULTI-ZONE COOLING OF PLASMA HEATED WINDOW

SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...

SYSTEMS FOR COOLING RF HEATED CHAMBER COMPONENTS

MULTI-LEVEL PARAMETER AND FREQUENCY PULSING WITH A LOW ANGULAR SPREAD

ETCHING ISOLATION FEATURES AND DENSE FEATURES WITHIN A SUBSTRATE

EDGE RING SYSTEMS FOR SUBSTRATE PROCESSING SYSTEMS

RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING

DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE

Method and System for Automated Frequency Tuning of Radiofrequency...

SELECTIVE SILICON DIOXIDE REMOVAL USING LOW PRESSURE LOW BIAS DEUTE...

SUBSTRATE LOCATION DETECTION AND ADJUSTMENT