Alexander Svizher

Person

Haifa, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Misregistration metrology by using fringe Moiré and optical Moiré e...
- Patent number 11,164,307
- Issue date Nov 2, 2021
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology targets and methods with oblique periodic structures
- Patent number 11,137,692
- Issue date Oct 5, 2021
- KLA-Tencor Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rotated boundaries of stops and targets
- Patent number 10,761,022
- Issue date Sep 1, 2020
- KLA-Tencor Corporation
- Tzahi Grunzweig
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Quick adjustment of metrology measurement parameters according to p...
- Patent number 10,699,969
- Issue date Jun 30, 2020
- KLA-Tencor Corporation
- Einat Peled
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Symmetric target design in scatterometry overlay metrology
- Patent number 10,591,406
- Issue date Mar 17, 2020
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Grant
Fault discrimination and calibration of scatterometry overlay targets
- Patent number 10,527,952
- Issue date Jan 7, 2020
- KLA-Tencor Corporation
- Tzahi Grunzweig
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for providing illumination in optical metrology
- Patent number 10,203,247
- Issue date Feb 12, 2019
- KLA-Tencor Corporation
- Gregory R. Brady
- F21 - LIGHTING
Information Patent Grant
Decreasing inaccuracy due to non-periodic effects on scatterometric...
- Patent number 9,851,300
- Issue date Dec 26, 2017
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Grant
Symmetric target design in scatterometry overlay metrology
- Patent number 9,739,702
- Issue date Aug 22, 2017
- KLA-Tencor Corporation
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase characterization of targets
- Patent number 9,581,430
- Issue date Feb 28, 2017
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Systems for providing illumination in optical metrology
- Patent number 9,512,985
- Issue date Dec 6, 2016
- KLA-Tencor Corporation
- Gregory R. Brady
- G02 - OPTICS
Information Patent Grant
Optics symmetrization for metrology
- Patent number 9,164,397
- Issue date Oct 20, 2015
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology systems and methods
- Patent number 9,080,971
- Issue date Jul 14, 2015
- KLA-Tencor Corp.
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Discrete polarization scatterometry
- Patent number 8,896,832
- Issue date Nov 25, 2014
- KLA-Tencor Corp.
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Metrology systems and methods
- Patent number 8,873,054
- Issue date Oct 28, 2014
- KLA-Tencor Corp.
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Metrology systems and methods
- Patent number 8,441,639
- Issue date May 14, 2013
- KLA-Tencor Corp.
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods
- Patent number 8,390,808
- Issue date Mar 5, 2013
- KLA-Tencor Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods
- Patent number 8,243,273
- Issue date Aug 14, 2012
- KLA-Tencor Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY TARGETS AND METHODS WITH OBLIQUE PERIODIC STRUCTURES
- Publication number 20200124982
- Publication date Apr 23, 2020
- KLA-TENCOR CORPORATION
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Quick Adjustment Of Metrology Measurement Parameters According To P...
- Publication number 20190074227
- Publication date Mar 7, 2019
- Einat Peled
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fault Discrimination and Calibration of Scatterometry Overlay Targets
- Publication number 20180373167
- Publication date Dec 27, 2018
- KLA-Tencor Corporation
- Tzahi Grunzweig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems for Providing Illumination in Optical Metrology
- Publication number 20170146399
- Publication date May 25, 2017
- KLA-Tencor Corporation
- Gregory R. Brady
- G02 - OPTICS
Information Patent Application
SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY
- Publication number 20160216197
- Publication date Jul 28, 2016
- KLA-Tencor Corporation
- Barak Bringoltz
- G02 - OPTICS
Information Patent Application
ROTATED BOUNDARIES OF STOPS AND TARGETS
- Publication number 20160209327
- Publication date Jul 21, 2016
- KLA-Tencor Corporation
- Tzahi Grunzweig
- G01 - MEASURING TESTING
Information Patent Application
SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY
- Publication number 20150204664
- Publication date Jul 23, 2015
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Application
Metrology Systems and Methods
- Publication number 20150036142
- Publication date Feb 5, 2015
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
Systems for Providing Illumination in Optical Metrology
- Publication number 20140240951
- Publication date Aug 28, 2014
- KLA-Tencor Corporation
- Gregory R. Brady
- G02 - OPTICS
Information Patent Application
PHASE CHARACTERIZATION OF TARGETS
- Publication number 20140111791
- Publication date Apr 24, 2014
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
Metrology Systems and Methods
- Publication number 20130229661
- Publication date Sep 5, 2013
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
OPTICS SYMMETRIZATION FOR METROLOGY
- Publication number 20120033226
- Publication date Feb 9, 2012
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
DISCRETE POLARIZATION SCATTEROMETRY
- Publication number 20110310388
- Publication date Dec 22, 2011
- KLA-Tencor Corporation
- Andrew V. Hill
- G02 - OPTICS
Information Patent Application
METROLOGY SYSTEMS AND METHODS
- Publication number 20110069312
- Publication date Mar 24, 2011
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
Enhanced Ovl dummy field enabling "on-the-fly" ovl measurement methods
- Publication number 20090303482
- Publication date Dec 10, 2009
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS

Alexander Svizher

Person

Patents Grantslast 30 patents

Misregistration metrology by using fringe Moiré and optical Moiré e...

Metrology targets and methods with oblique periodic structures

Rotated boundaries of stops and targets

Quick adjustment of metrology measurement parameters according to p...

Symmetric target design in scatterometry overlay metrology

Fault discrimination and calibration of scatterometry overlay targets

Systems for providing illumination in optical metrology

Decreasing inaccuracy due to non-periodic effects on scatterometric...

Symmetric target design in scatterometry overlay metrology

Phase characterization of targets

Systems for providing illumination in optical metrology

Optics symmetrization for metrology

Metrology systems and methods

Discrete polarization scatterometry

Metrology systems and methods

Metrology systems and methods

Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods

Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods

Patents Applicationslast 30 patents

METROLOGY TARGETS AND METHODS WITH OBLIQUE PERIODIC STRUCTURES

Quick Adjustment Of Metrology Measurement Parameters According To P...

Fault Discrimination and Calibration of Scatterometry Overlay Targets

Systems for Providing Illumination in Optical Metrology

SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY

ROTATED BOUNDARIES OF STOPS AND TARGETS

SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY

Metrology Systems and Methods

Systems for Providing Illumination in Optical Metrology

PHASE CHARACTERIZATION OF TARGETS

Metrology Systems and Methods

OPTICS SYMMETRIZATION FOR METROLOGY

DISCRETE POLARIZATION SCATTEROMETRY

METROLOGY SYSTEMS AND METHODS

Enhanced Ovl dummy field enabling "on-the-fly" ovl measurement methods