Alexander Tregub

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Mounting a pellicle to a frame
- Patent number 8,551,675
- Issue date Oct 8, 2013
- Intel Corporation
- Florence Eschbach
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Mounting a pellicle to a frame
- Patent number 8,012,651
- Issue date Sep 6, 2011
- Intel Corporation
- Florence Eschbach
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation stability of polymer pellicles
- Patent number 7,763,395
- Issue date Jul 27, 2010
- Intel Corporation
- Alexander (Alex) Tregub
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Brush for cleaning wafer
- Patent number 7,469,443
- Issue date Dec 30, 2008
- Intel Corporation
- Huey-Chiang Liou
- B08 - CLEANING
Information Patent Grant
Detecting particle agglomeration in chemical mechanical polishing s...
- Patent number 7,383,723
- Issue date Jun 10, 2008
- Intel Corporation
- Alexander Tregub
- G01 - MEASURING TESTING
Information Patent Grant
Mounting a pellicle to a frame
- Patent number 7,316,869
- Issue date Jan 8, 2008
- Intel Corporation
- Florence Eschbach
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process to optimize properties of polymer pellicles and resist for...
- Patent number 7,314,667
- Issue date Jan 1, 2008
- Intel Corporation
- Alexander Tregub
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fullerenes to increase radiation resistance in polymer-based pellicles
- Patent number 7,288,299
- Issue date Oct 30, 2007
- Intel Corporation
- Alexander Tregub
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Fullerenes to increase radiation resistance in polymer-based pellicles
- Patent number 7,288,300
- Issue date Oct 30, 2007
- Intel Corporation
- Alexander Tregub
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Attaching a pellicle frame to a reticle
- Patent number 7,264,853
- Issue date Sep 4, 2007
- Intel Corporation
- Florence Eschbach
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thermal analysis and characterization of layers and multiple layer...
- Patent number 7,048,434
- Issue date May 23, 2006
- Intel Corporation
- Alex Tregub
- G01 - MEASURING TESTING
Information Patent Grant
Conditioning polishing pad for chemical-mechanical polishing
- Patent number 7,048,610
- Issue date May 23, 2006
- Intel Corporation
- Alexander Tregub
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL-MECHANICAL PLANARIZATION (CMP) PAD CONDITIONER BRUSH-AND-A...
- Publication number 20190193245
- Publication date Jun 27, 2019
- Intel Corporation
- Alexander Tregub
- B24 - GRINDING POLISHING
Information Patent Application
MOUNTING A PELLICLE TO A FRAME
- Publication number 20110294048
- Publication date Dec 1, 2011
- Intel Corporation
- Florence Eschbach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mounting a Pellicle to a Frame
- Publication number 20080094591
- Publication date Apr 24, 2008
- Intel Corporation
- Florence Eschbach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hardened porous polymer chemical mechanical polishing (CMP) pad
- Publication number 20070117393
- Publication date May 24, 2007
- Alexander Tregub
- B24 - GRINDING POLISHING
Information Patent Application
Use of alternative polymer materials for "soft" polymer pellicles
- Publication number 20070037074
- Publication date Feb 15, 2007
- Alexander Tregub
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method of manufacturing a polymer memory device
- Publication number 20070003695
- Publication date Jan 4, 2007
- Alexander Tregub
- G11 - INFORMATION STORAGE
Information Patent Application
Treatment of CMP pad window to improve transmittance
- Publication number 20060291530
- Publication date Dec 28, 2006
- Alexander Tregub
- B24 - GRINDING POLISHING
Information Patent Application
Detecting particle agglomeration in chemical mechanical polishing s...
- Publication number 20060266736
- Publication date Nov 30, 2006
- Alexander Tregub
- G01 - MEASURING TESTING
Information Patent Application
Radiation stability of polymer pellicles
- Publication number 20060234134
- Publication date Oct 19, 2006
- Alexander Tregub
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Brush for cleaning wafer
- Publication number 20060151003
- Publication date Jul 13, 2006
- Intel Corporation
- Huey-Chiang Liou
- B08 - CLEANING
Information Patent Application
Fullerences to increase radiation resistance in polymer-based pelli...
- Publication number 20060008528
- Publication date Jan 12, 2006
- Intel Corporation
- Alexander Tregub
- B82 - NANO-TECHNOLOGY
Information Patent Application
Anti-bacterial protection to improve performance of post CMP clean...
- Publication number 20050287032
- Publication date Dec 29, 2005
- Alexander Tregub
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Use of alternative polymer materials for "soft" polymer pellicles
- Publication number 20050202252
- Publication date Sep 15, 2005
- Alexander Tregub
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Process to optimize properties of polymer pellicles and resist for...
- Publication number 20050203254
- Publication date Sep 15, 2005
- Alexander Tregub
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mounting a pellicle to a frame
- Publication number 20050048376
- Publication date Mar 3, 2005
- Intel Corporation
- Florence Eschbach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Attaching a pellicle frame to a reticle
- Publication number 20050045262
- Publication date Mar 3, 2005
- Intel Corporation
- Florence Eschbach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fullerenes to increase radiation resistance in polymer-based pellicles
- Publication number 20050029126
- Publication date Feb 10, 2005
- Alexander Tregub
- B82 - NANO-TECHNOLOGY
Information Patent Application
Thermal analysis and characterization of layers and multiple layer...
- Publication number 20040054495
- Publication date Mar 18, 2004
- Alex Tregub
- G01 - MEASURING TESTING
Information Patent Application
Brush for cleaning/scrubbing a substrate
- Publication number 20040040575
- Publication date Mar 4, 2004
- Alexander Tregub
- B08 - CLEANING
Information Patent Application
Annealing of CMP polishing pads
- Publication number 20030207661
- Publication date Nov 6, 2003
- Alexander Tregub
- B24 - GRINDING POLISHING

Alexander Tregub

Person

Patents Grantslast 30 patents

Mounting a pellicle to a frame

Mounting a pellicle to a frame

Radiation stability of polymer pellicles

Brush for cleaning wafer

Detecting particle agglomeration in chemical mechanical polishing s...

Mounting a pellicle to a frame

Process to optimize properties of polymer pellicles and resist for...

Fullerenes to increase radiation resistance in polymer-based pellicles

Fullerenes to increase radiation resistance in polymer-based pellicles

Attaching a pellicle frame to a reticle

Thermal analysis and characterization of layers and multiple layer...

Conditioning polishing pad for chemical-mechanical polishing

Patents Applicationslast 30 patents

CHEMICAL-MECHANICAL PLANARIZATION (CMP) PAD CONDITIONER BRUSH-AND-A...

MOUNTING A PELLICLE TO A FRAME

Mounting a Pellicle to a Frame

Hardened porous polymer chemical mechanical polishing (CMP) pad

Use of alternative polymer materials for "soft" polymer pellicles

Method of manufacturing a polymer memory device

Treatment of CMP pad window to improve transmittance

Detecting particle agglomeration in chemical mechanical polishing s...

Radiation stability of polymer pellicles

Brush for cleaning wafer

Fullerences to increase radiation resistance in polymer-based pelli...

Anti-bacterial protection to improve performance of post CMP clean...

Use of alternative polymer materials for "soft" polymer pellicles

Process to optimize properties of polymer pellicles and resist for...

Mounting a pellicle to a frame

Attaching a pellicle frame to a reticle

Fullerenes to increase radiation resistance in polymer-based pellicles

Thermal analysis and characterization of layers and multiple layer...

Brush for cleaning/scrubbing a substrate

Annealing of CMP polishing pads