Alice Hollister

Person

Tigard, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Carrier ring structure and chamber systems including the same
- Patent number 10,242,848
- Issue date Mar 26, 2019
- Lam Research Corporation
- Eli Jeon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal doping of amorphous carbon and silicon films used as hardmask...
- Patent number 9,520,295
- Issue date Dec 13, 2016
- Lam Research Corporation
- Fayaz Shaikh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxygen-containing ceramic hard masks and associated wet-cleans
- Patent number 9,337,068
- Issue date May 10, 2016
- Lam Research Corporation
- George Andrew Antonelli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sulfur doped carbon hard masks
- Patent number 9,320,387
- Issue date Apr 26, 2016
- Lam Research Corporation
- Sirish K. Reddy
- A47 - FURNITURE DOMESTIC ARTICLES OR APPLIANCES COFFEE MILLS SPICE MILLS SUCT...
Information Patent Grant
PECVD deposition of smooth silicon films
- Patent number 9,117,668
- Issue date Aug 25, 2015
- Novellus Systems, Inc.
- Alice Hollister
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INERT GAS IMPLANTATION FOR HARD MASK SELECTIVITY IMPROVEMENT
- Publication number 20230223263
- Publication date Jul 13, 2023
- LAM RESEARCH CORPORATION
- Daniela Anjos RIGSBY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL DOPING OF AMORPHOUS CARBON AND SILICON FILMS USED AS HARDMASK...
- Publication number 20160225632
- Publication date Aug 4, 2016
- LAM RESEARCH CORPORATION
- Fayaz Shaikh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Carrier Ring Structure and Chamber Systems Including the Same
- Publication number 20160172165
- Publication date Jun 16, 2016
- LAM RESEARCH CORPORATION
- Eli Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PECVD DEPOSITION OF SMOOTH SILICON FILMS
- Publication number 20150325435
- Publication date Nov 12, 2015
- Novellus Systems, Inc.
- Alice G. Hollister
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SULFUR DOPED CARBON HARD MASKS
- Publication number 20150093915
- Publication date Apr 2, 2015
- LAM RESEARCH CORPORATION
- Sirish K. Reddy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXYGEN-CONTAINING CERAMIC HARD MASKS AND ASSOCIATED WET-CLEANS
- Publication number 20140175617
- Publication date Jun 26, 2014
- LAM RESEARCH CORPORATION
- George Andrew Antonelli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PECVD DEPOSITION OF SMOOTH SILICON FILMS
- Publication number 20130316518
- Publication date Nov 28, 2013
- Alice HOLLISTER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INCREASING ETCH SELECTIVITY OF CARBON FILMS WITH LOWER ABSORPTION C...
- Publication number 20120258261
- Publication date Oct 11, 2012
- Novellus Systems, Inc.
- Sirish Reddy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Alice Hollister

Person

Patents Grantslast 30 patents

Carrier ring structure and chamber systems including the same

Metal doping of amorphous carbon and silicon films used as hardmask...

Oxygen-containing ceramic hard masks and associated wet-cleans

Sulfur doped carbon hard masks

PECVD deposition of smooth silicon films

Patents Applicationslast 30 patents

INERT GAS IMPLANTATION FOR HARD MASK SELECTIVITY IMPROVEMENT

METAL DOPING OF AMORPHOUS CARBON AND SILICON FILMS USED AS HARDMASK...

Carrier Ring Structure and Chamber Systems Including the Same

PECVD DEPOSITION OF SMOOTH SILICON FILMS

SULFUR DOPED CARBON HARD MASKS

OXYGEN-CONTAINING CERAMIC HARD MASKS AND ASSOCIATED WET-CLEANS

PECVD DEPOSITION OF SMOOTH SILICON FILMS

INCREASING ETCH SELECTIVITY OF CARBON FILMS WITH LOWER ABSORPTION C...