Alok RANJAN

Person

Slingerlands, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Autonomous operation of plasma processing tool
- Patent number 12,300,477
- Issue date May 13, 2025
- Tokyo Electron Limited
- Jun Shinagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching of polycrystalline semiconductors
- Patent number 12,300,500
- Issue date May 13, 2025
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of uniformity control
- Patent number 12,300,468
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a FET structure by selective deposition of film o...
- Patent number 12,288,692
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process control enabled VDC sensor for plasma process
- Patent number 12,272,520
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods of control for plasma processing
- Patent number 12,230,475
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Alok Ranjan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing methods using multiphase multifrequency bias pulses
- Patent number 12,217,935
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for extreme ultraviolet (EUV) resist patterning development
- Patent number 12,189,297
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote source pulsing with advanced pulse control
- Patent number 12,183,583
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster assisted plasma processing
- Patent number 12,131,888
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for real-time pulse measurement and pulse timing adjustment...
- Patent number 12,057,293
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tailored electron energy distribution function by new plasma source...
- Patent number 12,014,901
- Issue date Jun 18, 2024
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for gate stack formation and etching
- Patent number 12,009,430
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic plasma processing
- Patent number 11,961,735
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Yun Han
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing with radio frequency (RF) source and bias signal...
- Patent number 11,942,307
- Issue date Mar 26, 2024
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fast neutral generation for plasma processing
- Patent number 11,915,910
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Virtual metrology enhanced plasma process optimization method
- Patent number 11,869,756
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Jun Shinagawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus
- Patent number 11,832,373
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-phase pulsing systems and methods for plasma processing
- Patent number 11,817,295
- Issue date Nov 14, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-containing liner process
- Patent number 11,699,741
- Issue date Jul 11, 2023
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 11,688,586
- Issue date Jun 27, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of atomic layer etching of oxide
- Patent number 11,658,037
- Issue date May 23, 2023
- Tokyo Electron Limited
- Sonam D. Sherpa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect correction on metal resists
- Patent number 11,605,539
- Issue date Mar 14, 2023
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for dry etching compound materials
- Patent number 11,605,542
- Issue date Mar 14, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching metal during processing of a semiconductor structure
- Patent number 11,557,487
- Issue date Jan 17, 2023
- Tokyo Electron Limited
- Roberto C. Longo Pazos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed capacitively coupled plasma processes
- Patent number 11,545,364
- Issue date Jan 3, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic plasma etch process
- Patent number 11,527,413
- Issue date Dec 13, 2022
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing systems and methods for chemical processing a sub...
- Patent number 11,521,834
- Issue date Dec 6, 2022
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,470,712
- Issue date Oct 11, 2022
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch processes
- Patent number 11,398,386
- Issue date Jul 26, 2022
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Electron-Stimulated Etching of Silicon
- Publication number 20250210361
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Sonam Dorje SHERPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING OF SILICON OXIDE AT CRYOGENIC TEMPERATURE
- Publication number 20250210367
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Sonam Dorje SHERPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REDUCING PHOTORESIST AND CARBON ETCH RATES IN AN ICP PR...
- Publication number 20250201573
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Sonam Dorje SHERPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING SUBSTRATES USING VAPOR ADSORPTION
- Publication number 20250201569
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma Source with Radial Coil Network
- Publication number 20250157791
- Publication date May 15, 2025
- Yuhui ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING
- Publication number 20250149295
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Alok Ranjan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BOW MITIGATION IN HIGH ASPECT RATIO OXIDE AND NITRIDE ETCHES
- Publication number 20250118570
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Mir Abdulla Al Galib
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE HARDMASK ETCH FOR SEMICONDUCTOR PROCESSING
- Publication number 20250118557
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE EDGE ROUGHNESS (LER) IMPROVEMENT OF RESIST PATTERNS
- Publication number 20250112056
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU SIDEWALL PASSIVATION TOWARD THE BOTTOM OF HIGH ASPECT RATIO...
- Publication number 20250095984
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Extreme Ultraviolet (EUV) Resist Patterning Development
- Publication number 20250076771
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
- Publication number 20250079178
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF ETCHING SILICON-AND-OXYGEN-CONTAINING FEATURES AT LOW TE...
- Publication number 20250069895
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Anatoli Chlenov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CLUSTER ASSISTED PLASMA PROCESSING
- Publication number 20250022689
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLIC ETCH OF SILICON OXIDE AND SILICON NITRIDE
- Publication number 20250022714
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
INCREASED ETCH RATES OF SILICON-CONTAINING MATERIALS
- Publication number 20240429062
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR REAL-TIME PULSE MEASUREMENT AND PULSE TIMING ADJUSTMENT...
- Publication number 20240347319
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS
- Publication number 20240266152
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Michael Andrew STEARNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Etching Molybdenum
- Publication number 20240186149
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240049379
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Methods Using Multiphase Multifrequency Bias Pulses
- Publication number 20230411116
- Publication date Dec 21, 2023
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SYSTEMS AND PROCESSES WITH PULSED MAGNETIC FIELD
- Publication number 20230377853
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING USING MULTIPHASE MULTIFREQUENCY POWER PULSES AND VAR...
- Publication number 20230377895
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Uniformity Control
- Publication number 20230377849
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Edge Control During Plasma Processing
- Publication number 20230360889
- Publication date Nov 9, 2023
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTONOMOUS OPERATION OF PLASMA PROCESSING TOOL
- Publication number 20230352282
- Publication date Nov 2, 2023
- TOKYO ELECTRON LIMITED
- Jun SHINAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Extreme Ultraviolet (EUV) Resist Patterning Development
- Publication number 20230341781
- Publication date Oct 26, 2023
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching of Polycrystalline Semiconductors
- Publication number 20230317462
- Publication date Oct 5, 2023
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Plasma Processing
- Publication number 20230230814
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
- Publication number 20230187214
- Publication date Jun 15, 2023
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS

Alok RANJAN

Person

Patents Grantslast 30 patents

Autonomous operation of plasma processing tool

Etching of polycrystalline semiconductors

Method of uniformity control

Method of forming a FET structure by selective deposition of film o...

Process control enabled VDC sensor for plasma process

Systems and methods of control for plasma processing

Plasma processing methods using multiphase multifrequency bias pulses

Methods for extreme ultraviolet (EUV) resist patterning development

Remote source pulsing with advanced pulse control

Gas cluster assisted plasma processing

Methods for real-time pulse measurement and pulse timing adjustment...

Tailored electron energy distribution function by new plasma source...

Method for gate stack formation and etching

Cyclic plasma processing

Plasma processing with radio frequency (RF) source and bias signal...

Fast neutral generation for plasma processing

Virtual metrology enhanced plasma process optimization method

Plasma processing apparatus

Three-phase pulsing systems and methods for plasma processing

Metal-containing liner process

Method and apparatus for plasma processing

Method of atomic layer etching of oxide

Defect correction on metal resists

Method for dry etching compound materials

Etching metal during processing of a semiconductor structure

Pulsed capacitively coupled plasma processes

Cyclic plasma etch process

Plasma processing systems and methods for chemical processing a sub...

Plasma processing apparatus

Plasma etch processes

Patents Applicationslast 30 patents

Electron-Stimulated Etching of Silicon

ATOMIC LAYER ETCHING OF SILICON OXIDE AT CRYOGENIC TEMPERATURE

METHODS FOR REDUCING PHOTORESIST AND CARBON ETCH RATES IN AN ICP PR...

ETCHING SUBSTRATES USING VAPOR ADSORPTION

Inductively Coupled Plasma Source with Radial Coil Network

SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING

BOW MITIGATION IN HIGH ASPECT RATIO OXIDE AND NITRIDE ETCHES

SELECTIVE HARDMASK ETCH FOR SEMICONDUCTOR PROCESSING

LINE EDGE ROUGHNESS (LER) IMPROVEMENT OF RESIST PATTERNS

IN-SITU SIDEWALL PASSIVATION TOWARD THE BOTTOM OF HIGH ASPECT RATIO...

Methods for Extreme Ultraviolet (EUV) Resist Patterning Development

REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL

METHODS OF ETCHING SILICON-AND-OXYGEN-CONTAINING FEATURES AT LOW TE...

GAS CLUSTER ASSISTED PLASMA PROCESSING

CYCLIC ETCH OF SILICON OXIDE AND SILICON NITRIDE

INCREASED ETCH RATES OF SILICON-CONTAINING MATERIALS

SYSTEMS FOR REAL-TIME PULSE MEASUREMENT AND PULSE TIMING ADJUSTMENT...

PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS

Methods for Etching Molybdenum

PLASMA PROCESSING APPARATUS

Plasma Processing Methods Using Multiphase Multifrequency Bias Pulses

PLASMA SYSTEMS AND PROCESSES WITH PULSED MAGNETIC FIELD

PLASMA ETCHING USING MULTIPHASE MULTIFREQUENCY POWER PULSES AND VAR...

Method of Uniformity Control

Apparatus for Edge Control During Plasma Processing

AUTONOMOUS OPERATION OF PLASMA PROCESSING TOOL

Methods for Extreme Ultraviolet (EUV) Resist Patterning Development

Etching of Polycrystalline Semiconductors

Method and Apparatus for Plasma Processing

REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL