Alok RANJAN

Person

Slingerlands, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gas cluster assisted plasma processing
- Patent number 12,131,888
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for real-time pulse measurement and pulse timing adjustment...
- Patent number 12,057,293
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tailored electron energy distribution function by new plasma source...
- Patent number 12,014,901
- Issue date Jun 18, 2024
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for gate stack formation and etching
- Patent number 12,009,430
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic plasma processing
- Patent number 11,961,735
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Yun Han
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing with radio frequency (RF) source and bias signal...
- Patent number 11,942,307
- Issue date Mar 26, 2024
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fast neutral generation for plasma processing
- Patent number 11,915,910
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Virtual metrology enhanced plasma process optimization method
- Patent number 11,869,756
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Jun Shinagawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus
- Patent number 11,832,373
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-phase pulsing systems and methods for plasma processing
- Patent number 11,817,295
- Issue date Nov 14, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-containing liner process
- Patent number 11,699,741
- Issue date Jul 11, 2023
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 11,688,586
- Issue date Jun 27, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of atomic layer etching of oxide
- Patent number 11,658,037
- Issue date May 23, 2023
- Tokyo Electron Limited
- Sonam D. Sherpa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect correction on metal resists
- Patent number 11,605,539
- Issue date Mar 14, 2023
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for dry etching compound materials
- Patent number 11,605,542
- Issue date Mar 14, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching metal during processing of a semiconductor structure
- Patent number 11,557,487
- Issue date Jan 17, 2023
- Tokyo Electron Limited
- Roberto C. Longo Pazos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed capacitively coupled plasma processes
- Patent number 11,545,364
- Issue date Jan 3, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic plasma etch process
- Patent number 11,527,413
- Issue date Dec 13, 2022
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing systems and methods for chemical processing a sub...
- Patent number 11,521,834
- Issue date Dec 6, 2022
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,470,712
- Issue date Oct 11, 2022
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch processes
- Patent number 11,398,386
- Issue date Jul 26, 2022
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for focus ring thickness determinations and fee...
- Patent number 11,393,663
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Merritt Funk
- G05 - CONTROLLING REGULATING
Information Patent Grant
Apparatuses and methods for plasma processing
- Patent number 11,393,662
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Zhiying Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for anisotropic etch of silicon-based materials with select...
- Patent number 11,342,195
- Issue date May 24, 2022
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion angle detector
- Patent number 11,264,212
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and process for electron beam mediated plasma etch and de...
- Patent number 11,257,685
- Issue date Feb 22, 2022
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mode-switching plasma systems and methods of operating thereof
- Patent number 11,251,021
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid electron beam and RF plasma system for controlled content of...
- Patent number 11,205,562
- Issue date Dec 21, 2021
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ruthenium hard mask process
- Patent number 11,183,398
- Issue date Nov 23, 2021
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing methods using low frequency bias pulses
- Patent number 11,158,516
- Issue date Oct 26, 2021
- Tokyo Electron Limited
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS FOR REAL-TIME PULSE MEASUREMENT AND PULSE TIMING ADJUSTMENT...
- Publication number 20240347319
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Etching Molybdenum
- Publication number 20240186149
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240049379
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Methods Using Multiphase Multifrequency Bias Pulses
- Publication number 20230411116
- Publication date Dec 21, 2023
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SYSTEMS AND PROCESSES WITH PULSED MAGNETIC FIELD
- Publication number 20230377853
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING USING MULTIPHASE MULTIFREQUENCY POWER PULSES AND VAR...
- Publication number 20230377895
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Uniformity Control
- Publication number 20230377849
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Edge Control During Plasma Processing
- Publication number 20230360889
- Publication date Nov 9, 2023
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTONOMOUS OPERATION OF PLASMA PROCESSING TOOL
- Publication number 20230352282
- Publication date Nov 2, 2023
- TOKYO ELECTRON LIMITED
- Jun SHINAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Extreme Ultraviolet (EUV) Resist Patterning Development
- Publication number 20230341781
- Publication date Oct 26, 2023
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching of Polycrystalline Semiconductors
- Publication number 20230317462
- Publication date Oct 5, 2023
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Plasma Processing
- Publication number 20230230814
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
- Publication number 20230187214
- Publication date Jun 15, 2023
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing with Radio Frequency (RF) Source and Bias Signal...
- Publication number 20230117812
- Publication date Apr 20, 2023
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pulsed Capacitively Coupled Plasma Processes
- Publication number 20230081352
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230021588
- Publication date Jan 26, 2023
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VIRTUAL METROLOGY ENHANCED PLASMA PROCESS OPTIMIZATION METHOD
- Publication number 20220406580
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Jun SHINAGAWA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Plasma Processing Apparatus with Tunable Electrical Characteristic
- Publication number 20220392749
- Publication date Dec 8, 2022
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLIC PLASMA PROCESSING
- Publication number 20220392765
- Publication date Dec 8, 2022
- TOKYO ELECTRON LIMITED
- Yun Han
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METAL DURING PROCESSING OF A SEMICONDUCTOR STRUCTURE
- Publication number 20220392773
- Publication date Dec 8, 2022
- TOKYO ELECTRON LIMITED
- Roberto C. Longo Pazos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal-Containing Liner Process
- Publication number 20220384607
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems And Methods For Real-Time Pulse Measurement And Pulse Timin...
- Publication number 20220367149
- Publication date Nov 17, 2022
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SACRIFICIAL GATE CAPPING LAYER FOR GATE PROTECTION
- Publication number 20220359718
- Publication date Nov 10, 2022
- TOKYO ELECTRON LIMITED
- Yun HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A FINFET STRUCTURE
- Publication number 20220344162
- Publication date Oct 27, 2022
- TOKYO ELECTRON LIMITED
- Yun HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST NEUTRAL GENERATION FOR PLASMA PROCESSING
- Publication number 20220310357
- Publication date Sep 29, 2022
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLIC PLASMA ETCH PROCESS
- Publication number 20220246438
- Publication date Aug 4, 2022
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact Etch Stop Layer with Improved Etch Stop Capability
- Publication number 20220246747
- Publication date Aug 4, 2022
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect Correction on Metal Resists
- Publication number 20220181153
- Publication date Jun 9, 2022
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Systems and Methods for Chemical Processing a Sub...
- Publication number 20220068601
- Publication date Mar 3, 2022
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas Cluster Assisted Plasma Processing
- Publication number 20220068607
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS

Alok RANJAN

Person

Patents Grantslast 30 patents

Gas cluster assisted plasma processing

Methods for real-time pulse measurement and pulse timing adjustment...

Tailored electron energy distribution function by new plasma source...

Method for gate stack formation and etching

Cyclic plasma processing

Plasma processing with radio frequency (RF) source and bias signal...

Fast neutral generation for plasma processing

Virtual metrology enhanced plasma process optimization method

Plasma processing apparatus

Three-phase pulsing systems and methods for plasma processing

Metal-containing liner process

Method and apparatus for plasma processing

Method of atomic layer etching of oxide

Defect correction on metal resists

Method for dry etching compound materials

Etching metal during processing of a semiconductor structure

Pulsed capacitively coupled plasma processes

Cyclic plasma etch process

Plasma processing systems and methods for chemical processing a sub...

Plasma processing apparatus

Plasma etch processes

Methods and systems for focus ring thickness determinations and fee...

Apparatuses and methods for plasma processing

Methods for anisotropic etch of silicon-based materials with select...

Ion angle detector

Apparatus and process for electron beam mediated plasma etch and de...

Mode-switching plasma systems and methods of operating thereof

Hybrid electron beam and RF plasma system for controlled content of...

Ruthenium hard mask process

Plasma processing methods using low frequency bias pulses

Patents Applicationslast 30 patents

SYSTEMS FOR REAL-TIME PULSE MEASUREMENT AND PULSE TIMING ADJUSTMENT...

Methods for Etching Molybdenum

PLASMA PROCESSING APPARATUS

Plasma Processing Methods Using Multiphase Multifrequency Bias Pulses

PLASMA SYSTEMS AND PROCESSES WITH PULSED MAGNETIC FIELD

PLASMA ETCHING USING MULTIPHASE MULTIFREQUENCY POWER PULSES AND VAR...

Method of Uniformity Control

Apparatus for Edge Control During Plasma Processing

AUTONOMOUS OPERATION OF PLASMA PROCESSING TOOL

Methods for Extreme Ultraviolet (EUV) Resist Patterning Development

Etching of Polycrystalline Semiconductors

Method and Apparatus for Plasma Processing

REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL

Plasma Processing with Radio Frequency (RF) Source and Bias Signal...

Pulsed Capacitively Coupled Plasma Processes

PLASMA PROCESSING APPARATUS

VIRTUAL METROLOGY ENHANCED PLASMA PROCESS OPTIMIZATION METHOD

Plasma Processing Apparatus with Tunable Electrical Characteristic

CYCLIC PLASMA PROCESSING

ETCHING METAL DURING PROCESSING OF A SEMICONDUCTOR STRUCTURE

Metal-Containing Liner Process

Systems And Methods For Real-Time Pulse Measurement And Pulse Timin...

SACRIFICIAL GATE CAPPING LAYER FOR GATE PROTECTION

METHOD OF FORMING A FINFET STRUCTURE

FAST NEUTRAL GENERATION FOR PLASMA PROCESSING

CYCLIC PLASMA ETCH PROCESS

Contact Etch Stop Layer with Improved Etch Stop Capability

Defect Correction on Metal Resists

Plasma Processing Systems and Methods for Chemical Processing a Sub...

Gas Cluster Assisted Plasma Processing