Andreas Fischer

Person

Castro Valley, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Electron excitation atomic layer etch
- Patent number 11,637,022
- Issue date Apr 25, 2023
- Lam Research Corporation
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Predicting etch characteristics in thermal etching and atomic layer...
- Patent number 11,520,953
- Issue date Dec 6, 2022
- Lam Research Corporation
- Thorsten Lill
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Thermal atomic layer etch with rapid temperature cycling
- Patent number 11,380,556
- Issue date Jul 5, 2022
- Lam Research Corporation
- Theodoros Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching using a combination of plasma and vapor treatm...
- Patent number 10,784,118
- Issue date Sep 22, 2020
- Lam Research Corporation
- Andreas Fischer
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Atomic layer etching methods and apparatus
- Patent number 10,692,724
- Issue date Jun 23, 2020
- Lam Research Corporation
- David Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of directionality in atomic layer etching
- Patent number 10,559,475
- Issue date Feb 11, 2020
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ignition and sustaining apparatus
- Patent number 10,395,901
- Issue date Aug 27, 2019
- Lam Research Corporation
- Neil Martin Paul Benjamin
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Atomic layer etching of metal oxide
- Patent number 10,354,887
- Issue date Jul 16, 2019
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching of AL2O3 using a combination of plasma and vap...
- Patent number 10,256,108
- Issue date Apr 9, 2019
- Lam Research Corporation
- Andreas Fischer
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Wet-dry integrated wafer processing system
- Patent number 10,249,521
- Issue date Apr 2, 2019
- Lam Research AG
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of directionality in atomic layer etching
- Patent number 10,229,837
- Issue date Mar 12, 2019
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for preventing plasma un-confinement events in a plasma pro...
- Patent number 9,928,995
- Issue date Mar 27, 2018
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling ion energy distribution in plasma processing systems
- Patent number 9,887,069
- Issue date Feb 6, 2018
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooled pin lifter paddle for semiconductor substrate processing app...
- Patent number 9,859,145
- Issue date Jan 2, 2018
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustment of VUV emission of a plasma via collisional resonant ene...
- Patent number 9,609,730
- Issue date Mar 28, 2017
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid feature etching and bevel etching systems
- Patent number 9,564,285
- Issue date Feb 7, 2017
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for dual confinement and ultra-high pressure...
- Patent number 9,548,186
- Issue date Jan 17, 2017
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for DC voltage control on RF-powered electrode
- Patent number 9,536,711
- Issue date Jan 3, 2017
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with features from side wall
- Patent number 9,484,243
- Issue date Nov 1, 2016
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatuses for effectively reducing gas residence time...
- Patent number 9,299,541
- Issue date Mar 29, 2016
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing systems having multi-layer segmented electrodes a...
- Patent number 9,293,926
- Issue date Mar 22, 2016
- Lam Research Corporation
- Andreas Fischer
- B44 - DECORATIVE ARTS
Information Patent Grant
Capacitively-coupled plasma processing system having a plasma proce...
- Patent number 9,251,999
- Issue date Feb 2, 2016
- Lam Research Corporation
- Rajinder Dhindsa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma ignition and sustaining methods and apparatuses
- Patent number 9,174,296
- Issue date Nov 3, 2015
- Lam Research Corporation
- Neil Martin Paul Benjamin
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatuses, systems and methods for rapid cleaning of plasma confi...
- Patent number 8,956,461
- Issue date Feb 17, 2015
- Lam Research Corporation
- Eric Hudson
- B08 - CLEANING
Information Patent Grant
Plasma-enhanced substrate processing method and apparatus
- Patent number 8,911,637
- Issue date Dec 16, 2014
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated capacitive and inductive power sources for a plasma etch...
- Patent number 8,911,590
- Issue date Dec 16, 2014
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge ring assembly with dielectric spacer ring
- Patent number 8,911,589
- Issue date Dec 16, 2014
- Lam Research Corporation
- Jeremy Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for igniting and sustaining plasma
- Patent number 8,884,178
- Issue date Nov 11, 2014
- Lam Research Corporation
- Andreas Fischer
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods and apparatus for dual confinement and ultra-high pressure...
- Patent number 8,869,741
- Issue date Oct 28, 2014
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma confinement structures in plasma processing systems and meth...
- Patent number 8,677,590
- Issue date Mar 25, 2014
- Lam Research Corporation
- Eric Hudson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ATOMIC LAYER ETCHING USING BORON TRICHLORIDE
- Publication number 20250125155
- Publication date Apr 17, 2025
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND APPARATUSES FOR PROCESSING CHALCOGENIDES
- Publication number 20240381790
- Publication date Nov 14, 2024
- LAM RESEARCH CORPORATION
- John Hoang
Information Patent Application
ETCH SELECTIVITY CONTROL IN ATOMIC LAYER ETCHING
- Publication number 20230326761
- Publication date Oct 12, 2023
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON EXCITATION ATOMIC LAYER ETCH
- Publication number 20230298904
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING OF A SEMICONDUCTOR, A METAL, OR A METAL OXIDE...
- Publication number 20230274939
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Thorsten Bernd Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING OF INDIUM GALLIUM ZINC OXIDE
- Publication number 20230274949
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Aaron Lynn Routzahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING OF MOLYBDENUM
- Publication number 20230093011
- Publication date Mar 23, 2023
- LAM RESEARCH CORPORATION
- Andreas Fischer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL ATOMIC LAYER ETCH WITH RAPID TEMPERATURE CYCLING
- Publication number 20220293431
- Publication date Sep 15, 2022
- LAM RESEARCH CORPORATION
- Theodoros Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON EXCITATION ATOMIC LAYER ETCH
- Publication number 20210280433
- Publication date Sep 9, 2021
- LAM RESEARCH CORPORATION
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL ATOMIC LAYER ETCH WITH RAPID TEMPERATURE CYCLING
- Publication number 20210104414
- Publication date Apr 8, 2021
- LAM RESEARCH CORPORATION
- Theo Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING METHODS AND APPARATUS
- Publication number 20200312670
- Publication date Oct 1, 2020
- LAM RESEARCH CORPORATION
- David Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREDICTING ETCH CHARACTERISTICS IN THERMAL ETCHING AND ATOMIC LAYER...
- Publication number 20190340316
- Publication date Nov 7, 2019
- LAM RESEARCH CORPORATION
- Thorsten Lill
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ATOMIC LAYER ETCHING USING A COMBINATION OF PLASMA AND VAPOR TREATM...
- Publication number 20190198345
- Publication date Jun 27, 2019
- LAM RESEARCH CORPORATION
- Andreas Fischer
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
CONTROL OF DIRECTIONALITY IN ATOMIC LAYER ETCHING
- Publication number 20190157105
- Publication date May 23, 2019
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING OF METAL OXIDE
- Publication number 20190096690
- Publication date Mar 28, 2019
- LAM RESEARCH CORPORATION
- Andreas FISCHER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF DIRECTIONALITY IN ATOMIC LAYER ETCHING
- Publication number 20180366343
- Publication date Dec 20, 2018
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF DIRECTIONALITY IN ATOMIC LAYER ETCHING
- Publication number 20180247832
- Publication date Aug 30, 2018
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING METHODS AND APPARATUS
- Publication number 20180182634
- Publication date Jun 28, 2018
- LAM RESEARCH CORPORATION
- David Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET-DRY INTEGRATED WAFER PROCESSING SYSTEM
- Publication number 20170271180
- Publication date Sep 21, 2017
- LAM RESEARCH AG
- Thorsten LILL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING OF AL203 USING A COMBINATION OF PLASMA AND VAP...
- Publication number 20170256416
- Publication date Sep 7, 2017
- LAM RESEARCH CORPORATION
- Andreas Fischer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUSES FOR CONTROLLING PLASMA PROPERTIES BY CONTRO...
- Publication number 20170250059
- Publication date Aug 31, 2017
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIFREQUENCY CAPACITIVELY COUPLED PLASMA ETCH CHAMBER
- Publication number 20170213734
- Publication date Jul 27, 2017
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTMENT OF VUV EMISSION OF A PLASMA VIA COLLISIONAL RESONANT ENE...
- Publication number 20170170036
- Publication date Jun 15, 2017
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTMENT OF VUV EMISSION OF A PLASMA VIA COLLISIONAL RESONANT ENE...
- Publication number 20160135274
- Publication date May 12, 2016
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOVABLE GAS NOZZLE IN DRYING MODULE
- Publication number 20160086864
- Publication date Mar 24, 2016
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Ignition and Sustaining Apparatus
- Publication number 20160056023
- Publication date Feb 25, 2016
- LAM RESEARCH CORPORATION
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL-TIME EDGE ENCROACHMENT CONTROL FOR WAFER BEVEL
- Publication number 20150318150
- Publication date Nov 5, 2015
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING CHAMBER WITH FEATURES FROM SIDE WALL
- Publication number 20150303085
- Publication date Oct 22, 2015
- LAM RESEARCH CORPORATION
- Dean J. LARSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANNULAR BAFFLE FOR PUMPING FROM ABOVE A PLANE OF THE SEMICONDUCTOR...
- Publication number 20150155187
- Publication date Jun 4, 2015
- LAM RESEARCH CORPORATION
- Iqbal Shareef
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLED PIN LIFTER PADDLE FOR SEMICONDUCTOR SUBSTRATE PROCESSING APP...
- Publication number 20150024594
- Publication date Jan 22, 2015
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS

Andreas Fischer

Person

Patents Grantslast 30 patents

Electron excitation atomic layer etch

Predicting etch characteristics in thermal etching and atomic layer...

Thermal atomic layer etch with rapid temperature cycling

Atomic layer etching using a combination of plasma and vapor treatm...

Atomic layer etching methods and apparatus

Control of directionality in atomic layer etching

Plasma ignition and sustaining apparatus

Atomic layer etching of metal oxide

Atomic layer etching of AL2O3 using a combination of plasma and vap...

Wet-dry integrated wafer processing system

Control of directionality in atomic layer etching

Methods for preventing plasma un-confinement events in a plasma pro...

Controlling ion energy distribution in plasma processing systems

Cooled pin lifter paddle for semiconductor substrate processing app...

Adjustment of VUV emission of a plasma via collisional resonant ene...

Hybrid feature etching and bevel etching systems

Methods and apparatus for dual confinement and ultra-high pressure...

Method and apparatus for DC voltage control on RF-powered electrode

Processing chamber with features from side wall

Methods and apparatuses for effectively reducing gas residence time...

Plasma processing systems having multi-layer segmented electrodes a...

Capacitively-coupled plasma processing system having a plasma proce...

Plasma ignition and sustaining methods and apparatuses

Apparatuses, systems and methods for rapid cleaning of plasma confi...

Plasma-enhanced substrate processing method and apparatus

Integrated capacitive and inductive power sources for a plasma etch...

Edge ring assembly with dielectric spacer ring

Methods and apparatus for igniting and sustaining plasma

Methods and apparatus for dual confinement and ultra-high pressure...

Plasma confinement structures in plasma processing systems and meth...

Patents Applicationslast 30 patents

ATOMIC LAYER ETCHING USING BORON TRICHLORIDE

TECHNIQUES AND APPARATUSES FOR PROCESSING CHALCOGENIDES

ETCH SELECTIVITY CONTROL IN ATOMIC LAYER ETCHING

ELECTRON EXCITATION ATOMIC LAYER ETCH

ATOMIC LAYER ETCHING OF A SEMICONDUCTOR, A METAL, OR A METAL OXIDE...

ETCHING OF INDIUM GALLIUM ZINC OXIDE

ATOMIC LAYER ETCHING OF MOLYBDENUM

THERMAL ATOMIC LAYER ETCH WITH RAPID TEMPERATURE CYCLING

ELECTRON EXCITATION ATOMIC LAYER ETCH

THERMAL ATOMIC LAYER ETCH WITH RAPID TEMPERATURE CYCLING

ATOMIC LAYER ETCHING METHODS AND APPARATUS

PREDICTING ETCH CHARACTERISTICS IN THERMAL ETCHING AND ATOMIC LAYER...

ATOMIC LAYER ETCHING USING A COMBINATION OF PLASMA AND VAPOR TREATM...

CONTROL OF DIRECTIONALITY IN ATOMIC LAYER ETCHING

ATOMIC LAYER ETCHING OF METAL OXIDE

CONTROL OF DIRECTIONALITY IN ATOMIC LAYER ETCHING

CONTROL OF DIRECTIONALITY IN ATOMIC LAYER ETCHING

ATOMIC LAYER ETCHING METHODS AND APPARATUS

WET-DRY INTEGRATED WAFER PROCESSING SYSTEM

ATOMIC LAYER ETCHING OF AL203 USING A COMBINATION OF PLASMA AND VAP...

METHODS AND APPARATUSES FOR CONTROLLING PLASMA PROPERTIES BY CONTRO...

MULTIFREQUENCY CAPACITIVELY COUPLED PLASMA ETCH CHAMBER

ADJUSTMENT OF VUV EMISSION OF A PLASMA VIA COLLISIONAL RESONANT ENE...

ADJUSTMENT OF VUV EMISSION OF A PLASMA VIA COLLISIONAL RESONANT ENE...

MOVABLE GAS NOZZLE IN DRYING MODULE

Plasma Ignition and Sustaining Apparatus

REAL-TIME EDGE ENCROACHMENT CONTROL FOR WAFER BEVEL

PROCESSING CHAMBER WITH FEATURES FROM SIDE WALL

ANNULAR BAFFLE FOR PUMPING FROM ABOVE A PLANE OF THE SEMICONDUCTOR...

COOLED PIN LIFTER PADDLE FOR SEMICONDUCTOR SUBSTRATE PROCESSING APP...