Andrew D. Bailey III

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of etch model calibration using optical scatterometry
- Patent number 11,704,463
- Issue date Jul 18, 2023
- Lam Research Corporation
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pulsed plasma chamber in dual chamber configuration
- Patent number 11,670,486
- Issue date Jun 6, 2023
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi zone gas injection upper electrode system
- Patent number 11,594,400
- Issue date Feb 28, 2023
- Lam Research Corporation
- Ryan Bise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining process rate
- Patent number 11,056,322
- Issue date Jul 6, 2021
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for calibrating scalar field contribution value...
- Patent number 11,029,668
- Issue date Jun 8, 2021
- Lam Research Corporation
- Marcus Musselman
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for performing edge ring characterization
- Patent number 11,011,353
- Issue date May 18, 2021
- Lam Research Corporation
- Marcus Musselman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etch model calibration using optical scatterometry
- Patent number 10,997,345
- Issue date May 4, 2021
- Lam Research Corporation
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of feature exaction from time-series of spectra to control e...
- Patent number 10,847,430
- Issue date Nov 24, 2020
- Lam Research Corporation
- Ye Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for determining field non-uniformities of a wafer...
- Patent number 10,763,142
- Issue date Sep 1, 2020
- Lam Research Corporation
- Marcus Musselman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi zone gas injection upper electrode system
- Patent number 10,622,195
- Issue date Apr 14, 2020
- Lam Research Corporation
- Ryan Bise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist design layout pattern proximity correction through fast...
- Patent number 10,585,347
- Issue date Mar 10, 2020
- Lam Research Corporation
- Saravanapriyan Sriraman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of etch model calibration using optical scatterometry
- Patent number 10,572,697
- Issue date Feb 25, 2020
- Lam Research Corporation
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pulsed plasma chamber in dual chamber configuration
- Patent number 10,553,399
- Issue date Feb 4, 2020
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Layout pattern proximity correction through edge placement error pr...
- Patent number 10,534,257
- Issue date Jan 14, 2020
- Lam Research Corporation
- Mehmet Derya Tetiker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma etching systems and methods using empirical mode decomposition
- Patent number 10,504,704
- Issue date Dec 10, 2019
- Lam Research Corporation
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for calibrating scalar field contribution value...
- Patent number 10,386,821
- Issue date Aug 20, 2019
- Lam Research Corporation
- Marcus Musselman
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatuses for etch profile matching by surface kineti...
- Patent number 10,386,828
- Issue date Aug 20, 2019
- Lam Research Corporation
- Mehmet Derya Tetiker
- G05 - CONTROLLING REGULATING
Information Patent Grant
Systems and methods for aligning measurement device in substrate pr...
- Patent number 10,312,121
- Issue date Jun 4, 2019
- Lam Research Corporation
- Marcus Musselman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatuses for etch profile optimization by reflectanc...
- Patent number 10,303,830
- Issue date May 28, 2019
- Lam Research Corporation
- Mehmet Derya Tetiker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of feature exaction from time-series of spectra to control e...
- Patent number 10,262,910
- Issue date Apr 16, 2019
- Lam Research Corporation
- Ye Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for detecting a process point in multi-mode pulse...
- Patent number 10,242,849
- Issue date Mar 26, 2019
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangements for manipulating plasma confinement within a plasma pr...
- Patent number 10,217,610
- Issue date Feb 26, 2019
- Lam Research Corporation
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist design layout pattern proximity correction through fast...
- Patent number 10,197,908
- Issue date Feb 5, 2019
- Lam Research Corporation
- Saravanapriyan Sriraman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Negative ion control for dielectric etch
- Patent number 10,181,412
- Issue date Jan 15, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etch metric sensitivity for endpoint detection
- Patent number 10,032,681
- Issue date Jul 24, 2018
- Lam Research Corporation
- Andrew D. Bailey
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and apparatuses for etch profile optimization by reflectanc...
- Patent number 9,996,647
- Issue date Jun 12, 2018
- Lam Research Corporation
- Mehmet Derya Tetiker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for detecting endpoint for through-silicon via reveal appli...
- Patent number 9,941,178
- Issue date Apr 10, 2018
- Lam Research Corporation
- Alan Jeffrey Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flexible temperature compensation systems and methods for substrate...
- Patent number 9,864,361
- Issue date Jan 9, 2018
- Lam Research Corporation
- Andrew D. Bailey
- G05 - CONTROLLING REGULATING
Information Patent Grant
Equipment front end module for transferring wafers and method of tr...
- Patent number 9,818,633
- Issue date Nov 14, 2017
- Lam Research Corporation
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatuses for etch profile optimization by reflectanc...
- Patent number 9,792,393
- Issue date Oct 17, 2017
- Lam Research Corporation
- Mehmet Derya Tetiker
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
PULSED PLASMA CHAMBER IN DUAL CHAMBER CONFIGURATION
- Publication number 20230317412
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE GEOMETRY TRIM COIL
- Publication number 20230274911
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING AND PLASMA UNIFORMITY CONTROL USING MAGNETICS
- Publication number 20230071249
- Publication date Mar 9, 2023
- LAM RESEARCH CORPORATION
- Scott Briggs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISTRIBUTION FACEPLATE WITH OBLIQUE FLOW PATHS
- Publication number 20230057217
- Publication date Feb 23, 2023
- LAM RESEARCH CORPORATION
- Henry Stephen Povolny
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
INTEGRATED HARDWARE-SOFTWARE COMPUTER VISION SYSTEM FOR AUTONOMOUS...
- Publication number 20220270901
- Publication date Aug 25, 2022
- LAM RESEARCH CORPORATION
- Hossein SADEGHI
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD OF ETCH MODEL CALIBRATION USING OPTICAL SCATTEROMETRY
- Publication number 20210216695
- Publication date Jul 15, 2021
- LAM RESEARCH CORPORATION
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI ZONE GAS INJECTION UPPER ELECTRODE SYSTEM
- Publication number 20200243307
- Publication date Jul 30, 2020
- LAM RESEARCH CORPORATION
- Ryan Bise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED PLASMA CHAMBER IN DUAL CHAMBER CONFIGURATION
- Publication number 20200227237
- Publication date Jul 16, 2020
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCH MODEL CALIBRATION USING OPTICAL SCATTEROMETRY
- Publication number 20200218844
- Publication date Jul 9, 2020
- LAM RESEARCH CORPORATION
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROTECTIVE COATING ON PHOTORESIST FOR PHOTORESIST METROLOGY
- Publication number 20190393105
- Publication date Dec 26, 2019
- LAM RESEARCH CORPORATION
- Jea L. Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR CALIBRATING SCALAR FIELD CONTRIBUTION VALUE...
- Publication number 20190332094
- Publication date Oct 31, 2019
- LAM RESEARCH CORPORATION
- Marcus Musselman
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD OF ETCH MODEL CALIBRATION USING OPTICAL SCATTEROMETRY
- Publication number 20190311083
- Publication date Oct 10, 2019
- LAM RESEARCH CORPORATION
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...
- Publication number 20190250501
- Publication date Aug 15, 2019
- LAM RESEARCH CORPORATION
- Saravanapriyan Sriraman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of Feature Exaction from Time-series of Spectra to Control E...
- Publication number 20190244870
- Publication date Aug 8, 2019
- LAM RESEARCH CORPORATION
- Ye Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUSES FOR ETCH PROFILE OPTIMIZATION BY REFLECTANC...
- Publication number 20190049937
- Publication date Feb 14, 2019
- LAM RESEARCH CORPORATION
- Mehmet Derya Tetiker
- G05 - CONTROLLING REGULATING
Information Patent Application
DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH EDGE PLACEMENT E...
- Publication number 20180314148
- Publication date Nov 1, 2018
- LAM RESEARCH CORPORATION
- Mehmet Derya Tetiker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND APPARATUSES FOR ETCH PROFILE OPTIMIZATION BY REFLECTANC...
- Publication number 20180260509
- Publication date Sep 13, 2018
- Lam Research Corporation
- Mehmet Derya Tetiker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of Feature Exaction from Time-series of Spectra to Control E...
- Publication number 20180182632
- Publication date Jun 28, 2018
- LAM RESEARCH CORPORATION
- Ye Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUSES FOR ETCH PROFILE OPTIMIZATION BY REFLECTANC...
- Publication number 20170371991
- Publication date Dec 28, 2017
- LAM RESEARCH CORPORATION
- Mehmet Derya Tetiker
- G01 - MEASURING TESTING
Information Patent Application
PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...
- Publication number 20170363950
- Publication date Dec 21, 2017
- LAM RESEARCH CORPORATION
- Saravanapriyan Sriraman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING PROCESS RATE
- Publication number 20170338160
- Publication date Nov 23, 2017
- LAM RESEARCH CORPORATION
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ALIGNING MEASUREMENT DEVICE IN SUBSTRATE PR...
- Publication number 20170287753
- Publication date Oct 5, 2017
- LAM RESEARCH CORPORATION
- Marcus Musselman
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR PERFORMING EDGE RING CHARACTERIZATION
- Publication number 20170287682
- Publication date Oct 5, 2017
- LAM RESEARCH CORPORATION
- Marcus Musselman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH METRIC SENSITIVITY FOR ENDPOINT DETECTION
- Publication number 20170256463
- Publication date Sep 7, 2017
- LAM RESEARCH CORPORATION
- Andrew D. Bailey
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND APPARATUSES FOR ETCH PROFILE OPTIMIZATION BY REFLECTANC...
- Publication number 20170228482
- Publication date Aug 10, 2017
- LAM RESEARCH CORPORATION
- Mehmet Derya Tetiker
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR DETECTING A PROCESS POINT IN MULT-MODE PULSE...
- Publication number 20170207070
- Publication date Jul 20, 2017
- LAM RESEARCH CORPORATION
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUSES FOR ETCH PROFILE MATCHING BY SURFACE KINETI...
- Publication number 20170176983
- Publication date Jun 22, 2017
- LAM RESEARCH CORPORATION
- Mehmet Derya Tetiker
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING PROCESS RATE
- Publication number 20170084503
- Publication date Mar 23, 2017
- LAM RESEARCH CORPORATION
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION
- Publication number 20170084433
- Publication date Mar 23, 2017
- LAM RESEARCH CORPORATION
- LUC ALBAREDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Detecting Endpoint for Through-Silicon Via Reveal Appli...
- Publication number 20170062290
- Publication date Mar 2, 2017
- LAM RESEARCH CORPORATION
- Alan Jeffrey Miller
- H01 - BASIC ELECTRIC ELEMENTS

Andrew D. Bailey III

Person

Patents Grantslast 30 patents

Method of etch model calibration using optical scatterometry

Pulsed plasma chamber in dual chamber configuration

Multi zone gas injection upper electrode system

Method and apparatus for determining process rate

Systems and methods for calibrating scalar field contribution value...

Systems and methods for performing edge ring characterization

Method of etch model calibration using optical scatterometry

Method of feature exaction from time-series of spectra to control e...

System and method for determining field non-uniformities of a wafer...

Multi zone gas injection upper electrode system

Photoresist design layout pattern proximity correction through fast...

Method of etch model calibration using optical scatterometry

Pulsed plasma chamber in dual chamber configuration

Layout pattern proximity correction through edge placement error pr...

Plasma etching systems and methods using empirical mode decomposition

Systems and methods for calibrating scalar field contribution value...

Methods and apparatuses for etch profile matching by surface kineti...

Systems and methods for aligning measurement device in substrate pr...

Methods and apparatuses for etch profile optimization by reflectanc...

Method of feature exaction from time-series of spectra to control e...

System and method for detecting a process point in multi-mode pulse...

Arrangements for manipulating plasma confinement within a plasma pr...

Photoresist design layout pattern proximity correction through fast...

Negative ion control for dielectric etch

Etch metric sensitivity for endpoint detection

Methods and apparatuses for etch profile optimization by reflectanc...

Methods for detecting endpoint for through-silicon via reveal appli...

Flexible temperature compensation systems and methods for substrate...

Equipment front end module for transferring wafers and method of tr...

Methods and apparatuses for etch profile optimization by reflectanc...

Patents Applicationslast 30 patents

PULSED PLASMA CHAMBER IN DUAL CHAMBER CONFIGURATION

ADJUSTABLE GEOMETRY TRIM COIL

ETCHING AND PLASMA UNIFORMITY CONTROL USING MAGNETICS

GAS DISTRIBUTION FACEPLATE WITH OBLIQUE FLOW PATHS

INTEGRATED HARDWARE-SOFTWARE COMPUTER VISION SYSTEM FOR AUTONOMOUS...

METHOD OF ETCH MODEL CALIBRATION USING OPTICAL SCATTEROMETRY

MULTI ZONE GAS INJECTION UPPER ELECTRODE SYSTEM

PULSED PLASMA CHAMBER IN DUAL CHAMBER CONFIGURATION

METHOD OF ETCH MODEL CALIBRATION USING OPTICAL SCATTEROMETRY

PROTECTIVE COATING ON PHOTORESIST FOR PHOTORESIST METROLOGY

SYSTEMS AND METHODS FOR CALIBRATING SCALAR FIELD CONTRIBUTION VALUE...

METHOD OF ETCH MODEL CALIBRATION USING OPTICAL SCATTEROMETRY

PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...

Method of Feature Exaction from Time-series of Spectra to Control E...

METHODS AND APPARATUSES FOR ETCH PROFILE OPTIMIZATION BY REFLECTANC...

DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH EDGE PLACEMENT E...

METHODS AND APPARATUSES FOR ETCH PROFILE OPTIMIZATION BY REFLECTANC...

Method of Feature Exaction from Time-series of Spectra to Control E...

METHODS AND APPARATUSES FOR ETCH PROFILE OPTIMIZATION BY REFLECTANC...

PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...

METHOD AND APPARATUS FOR DETERMINING PROCESS RATE

SYSTEMS AND METHODS FOR ALIGNING MEASUREMENT DEVICE IN SUBSTRATE PR...

SYSTEMS AND METHODS FOR PERFORMING EDGE RING CHARACTERIZATION

ETCH METRIC SENSITIVITY FOR ENDPOINT DETECTION

METHODS AND APPARATUSES FOR ETCH PROFILE OPTIMIZATION BY REFLECTANC...

SYSTEM AND METHOD FOR DETECTING A PROCESS POINT IN MULT-MODE PULSE...

METHODS AND APPARATUSES FOR ETCH PROFILE MATCHING BY SURFACE KINETI...

METHOD AND APPARATUS FOR DETERMINING PROCESS RATE

PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION

Methods for Detecting Endpoint for Through-Silicon Via Reveal Appli...