Andrew D. Bailey, III

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for controlling bevel edge etching in a plasma chamber
- Patent number 8,349,202
- Issue date Jan 8, 2013
- Lam Research Corporation
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to remove films on bevel edge and backside of wafer and app...
- Patent number 8,308,896
- Issue date Nov 13, 2012
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wiggling control for pseudo-hardmask
- Patent number 8,304,262
- Issue date Nov 6, 2012
- Lam Research Corporation
- Ben-Li Sheu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for removing an edge polymer from a substrate
- Patent number 8,298,433
- Issue date Oct 30, 2012
- Lam Research Corporation
- Hyungsuk Alexander Yoon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods of and apparatus for protecting a region of process exclusi...
- Patent number 8,268,116
- Issue date Sep 18, 2012
- Lam Research Corporation
- Andrew D. Bailey, III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for detecting plasma unconfinement
- Patent number 8,257,503
- Issue date Sep 4, 2012
- Lam Research Corporation
- KeeChan Kim
- G01 - MEASURING TESTING
Information Patent Grant
Plasma chamber for wafer bevel edge processing
- Patent number 8,252,140
- Issue date Aug 28, 2012
- Lam Research Corporation
- Gregory S. Sexton
- B08 - CLEANING
Information Patent Grant
Method for low-K dielectric etch with reduced damage
- Patent number 8,236,188
- Issue date Aug 7, 2012
- Lam Research Corporation
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer bow metrology arrangements and methods thereof
- Patent number 8,225,683
- Issue date Jul 24, 2012
- Lam Research Corporation
- Andrew D. Bailey, III
- G01 - MEASURING TESTING
Information Patent Grant
System, method and apparatus for self-cleaning dry etch
- Patent number 8,211,238
- Issue date Jul 3, 2012
- Lam Research Corporation
- Andrew D. Bailey, III
- B08 - CLEANING
Information Patent Grant
Dynamic alignment of wafers using compensation values obtained thro...
- Patent number 8,185,242
- Issue date May 22, 2012
- Lam Research Corporation
- Scott Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bevel clean device
- Patent number 8,137,501
- Issue date Mar 20, 2012
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Offset correction techniques for positioning substrates within a pr...
- Patent number 8,135,485
- Issue date Mar 13, 2012
- Lam Research Corporation
- Jack Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for isolated bevel edge clean and method for using the same
- Patent number 8,127,395
- Issue date Mar 6, 2012
- Lam Research Corporation
- Hyungsuk Alexander Yoon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Gas modulation to control edge exclusion in a bevel edge etching pl...
- Patent number 8,083,890
- Issue date Dec 27, 2011
- Lam Research Corporation
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for stress free conductor removal
- Patent number 8,017,516
- Issue date Sep 13, 2011
- Lam Research Corporation
- Andrew D. Bailey, III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for shaping gas profile near bevel edge
- Patent number 7,981,307
- Issue date Jul 19, 2011
- Lam Research Corporation
- Jack Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and arrangement for the reduction of byproduct deposition i...
- Patent number 7,959,984
- Issue date Jun 14, 2011
- Lam Research Corporation
- Shrikant P. Lohokare
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Configurable bevel etcher
- Patent number 7,943,007
- Issue date May 17, 2011
- Lam Research Corporation
- Andrew D. Bailey, III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge electrodes with variable power
- Patent number 7,938,931
- Issue date May 10, 2011
- Lam Research Corporation
- Gregory S. Sexton
- B08 - CLEANING
Information Patent Grant
Apparatus for aligning electrodes in a process chamber to protect a...
- Patent number 7,922,866
- Issue date Apr 12, 2011
- Lam Research Corporation
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods to remove films on bevel edge and backside of...
- Patent number 7,909,960
- Issue date Mar 22, 2011
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bevel etcher with gap control
- Patent number 7,858,898
- Issue date Dec 28, 2010
- Lam Research Corporation
- Andrew D. Bailey, III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-k damage avoidance during bevel etch processing
- Patent number 7,718,542
- Issue date May 18, 2010
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for the removal of a fluorinated polymer from a substrate...
- Patent number 7,691,278
- Issue date Apr 6, 2010
- Lam Research Corporation
- Hyungsuk Alexander Yoon
- B08 - CLEANING
Information Patent Grant
Methods of and apparatus for aligning electrodes in a process chamb...
- Patent number 7,662,254
- Issue date Feb 16, 2010
- Lam Research Corporation
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for the removal of a metal oxide from a substrate and met...
- Patent number 7,662,253
- Issue date Feb 16, 2010
- Lam Research Corporation
- Hyungsuk Alexander Yoon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for the removal of an edge polymer from a substrate and m...
- Patent number 7,651,585
- Issue date Jan 26, 2010
- Lam Research Corporation
- Hyungsuk Alexander Yoon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Expert knowledge methods and systems for data analysis
- Patent number 7,653,515
- Issue date Jan 26, 2010
- Lam Research Corporation
- Puneet Yadav
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Minimizing arcing in a plasma processing chamber
- Patent number 7,611,640
- Issue date Nov 3, 2009
- Lam Research Corporation
- Arthur M. Howald
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Dual Plasma Volume Processing Apparatus for Neutral/Ion Flux Control
- Publication number 20160079039
- Publication date Mar 17, 2016
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Processing Bevel Edge Etching
- Publication number 20160064215
- Publication date Mar 3, 2016
- LAM RESEARCH CORPORATION
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Detecting Plasma Unconfinement
- Publication number 20120305189
- Publication date Dec 6, 2012
- LAM RESEARCH CORPORATION
- KeeChan Kim
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF IN-SITU MEASUREMENTS OF WAFER BOW
- Publication number 20120283865
- Publication date Nov 8, 2012
- LAM RESEARCH CORPORATION
- Andrew D. Bailey, III
- G01 - MEASURING TESTING
Information Patent Application
Bevel Edge Plasma Chamber With Top and Bottom Edge Electrodes
- Publication number 20120273134
- Publication date Nov 1, 2012
- LAM RESEARCH CORPORATION
- Gregory S. Sexton
- B08 - CLEANING
Information Patent Application
WIGGLING CONTROL FOR PSEUDO-HARDMASK
- Publication number 20120214310
- Publication date Aug 23, 2012
- LAM RESEARCH CORPORATION
- Ben-Li Sheu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Isolated Bevel Edge Clean
- Publication number 20120118320
- Publication date May 17, 2012
- LAM RESEARCH CORPORATION
- Hyungsuk Alexander Yoon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Controlling Bevel Edge Etching in a Plasma Chamber
- Publication number 20120074099
- Publication date Mar 29, 2012
- LAM RESEARCH CORPORATION
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Plasma Volume Processing Apparatus for Neutral/Ion Flux Control
- Publication number 20120031559
- Publication date Feb 9, 2012
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Chamber with Dual Axial Gas Injection and Exhaust
- Publication number 20120034786
- Publication date Feb 9, 2012
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS MODULATION TO CONTROL EDGE EXCLUSION IN A BEVEL EDGE ETCHING PL...
- Publication number 20110253312
- Publication date Oct 20, 2011
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SHAPING A GAS PROFILE NEAR BEVEL EDGE
- Publication number 20110232566
- Publication date Sep 29, 2011
- Jack Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFIGURABLE BEVEL ETCHER
- Publication number 20110214687
- Publication date Sep 8, 2011
- LAM RESEARCH CORPORATION
- Andrew D. Bailey III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO REMOVE FILMS ON BEVEL EDGE AND BACKSIDE OF WAFER AND APP...
- Publication number 20110209725
- Publication date Sep 1, 2011
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER FOR WAFER BEVEL EDGE PROCESSING
- Publication number 20110186227
- Publication date Aug 4, 2011
- LAM RESEARCH CORPORATION
- Gregory S. Sexton
- B08 - CLEANING
Information Patent Application
Plasma Processing Chamber for Bevel Edge Processing
- Publication number 20110180212
- Publication date Jul 28, 2011
- Andrew D. Bailey, III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ORIENTING AN UPPER ELECTRODE RELATIVE TO A LOWER ELECTROD...
- Publication number 20110165779
- Publication date Jul 7, 2011
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCAL PLASMA CONFINEMENT AND PRESSURE CONTROL ARRANGEMENT AND METHO...
- Publication number 20110108524
- Publication date May 12, 2011
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REPAIRING LOW-K DIELECTRIC DAMAGE
- Publication number 20110097904
- Publication date Apr 28, 2011
- LAM RESEARCH CORPORATION
- Stephen M. Sirard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRIP WITH REDUCED LOW-K DIELECTRIC DAMAGE
- Publication number 20100285671
- Publication date Nov 11, 2010
- LAM RESEARCH CORPORATION
- Bing Ji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR LOW-K DIELECTRIC ETCH WITH REDUCED DAMAGE
- Publication number 20100261352
- Publication date Oct 14, 2010
- LAM RESEARCH CORPORATION
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULATED MULTI-FREQUENCY PROCESSING METHOD
- Publication number 20100253224
- Publication date Oct 7, 2010
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEVEL PLASMA TREATMENT TO ENHANCE WET EDGE CLEAN
- Publication number 20100213173
- Publication date Aug 26, 2010
- Andrew D. Bailey, III
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR THE REMOVAL OF A FLUORINATED POLYMER FROM A SUBSTRATE
- Publication number 20100181025
- Publication date Jul 22, 2010
- Hyungsuk Alexander Yoon
- B08 - CLEANING
Information Patent Application
LOW-K DAMAGE AVOIDANCE DURING BEVEL ETCH PROCESSING
- Publication number 20100175830
- Publication date Jul 15, 2010
- LAM RESEARCH CORPORATION
- Yunsang KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REMOVING A METAL OXIDE FROM A SUBSTRATE
- Publication number 20100108491
- Publication date May 6, 2010
- Hyungsuk Alexander Yoon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Expert knowledge methods and systems for data analysis
- Publication number 20100100221
- Publication date Apr 22, 2010
- Lam Research Corporation
- Puneet Yadav
- G05 - CONTROLLING REGULATING
Information Patent Application
Apparatus For Aligning Electrodes In A Process Chamber to Protect A...
- Publication number 20100096087
- Publication date Apr 22, 2010
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REMOVING AN EDGE POLYMER FROM A SUBSTRATE
- Publication number 20100099265
- Publication date Apr 22, 2010
- HYUNGSUK ALEXANDER YOON
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SERVICING A PLASMA PROCESSING SYSTEM WITH A ROBOT
- Publication number 20100024186
- Publication date Feb 4, 2010
- Andrew D. Bailey, III
- B08 - CLEANING

Andrew D. Bailey, III

Person

Patents Grantslast 30 patents

Methods for controlling bevel edge etching in a plasma chamber

Methods to remove films on bevel edge and backside of wafer and app...

Wiggling control for pseudo-hardmask

Methods for removing an edge polymer from a substrate

Methods of and apparatus for protecting a region of process exclusi...

Method and apparatus for detecting plasma unconfinement

Plasma chamber for wafer bevel edge processing

Method for low-K dielectric etch with reduced damage

Wafer bow metrology arrangements and methods thereof

System, method and apparatus for self-cleaning dry etch

Dynamic alignment of wafers using compensation values obtained thro...

Bevel clean device

Offset correction techniques for positioning substrates within a pr...

Apparatus for isolated bevel edge clean and method for using the same

Gas modulation to control edge exclusion in a bevel edge etching pl...

Method for stress free conductor removal

Method and apparatus for shaping gas profile near bevel edge

Methods and arrangement for the reduction of byproduct deposition i...

Configurable bevel etcher

Edge electrodes with variable power

Apparatus for aligning electrodes in a process chamber to protect a...

Apparatus and methods to remove films on bevel edge and backside of...

Bevel etcher with gap control

Low-k damage avoidance during bevel etch processing

Apparatus for the removal of a fluorinated polymer from a substrate...

Methods of and apparatus for aligning electrodes in a process chamb...

Apparatus for the removal of a metal oxide from a substrate and met...

Apparatus for the removal of an edge polymer from a substrate and m...

Expert knowledge methods and systems for data analysis

Minimizing arcing in a plasma processing chamber

Patents Applicationslast 30 patents

Dual Plasma Volume Processing Apparatus for Neutral/Ion Flux Control

Methods for Processing Bevel Edge Etching

Method and Apparatus for Detecting Plasma Unconfinement

METHODS OF IN-SITU MEASUREMENTS OF WAFER BOW

Bevel Edge Plasma Chamber With Top and Bottom Edge Electrodes

WIGGLING CONTROL FOR PSEUDO-HARDMASK

Methods for Isolated Bevel Edge Clean

Methods for Controlling Bevel Edge Etching in a Plasma Chamber

Dual Plasma Volume Processing Apparatus for Neutral/Ion Flux Control

Plasma Processing Chamber with Dual Axial Gas Injection and Exhaust

GAS MODULATION TO CONTROL EDGE EXCLUSION IN A BEVEL EDGE ETCHING PL...

METHOD AND APPARATUS FOR SHAPING A GAS PROFILE NEAR BEVEL EDGE

CONFIGURABLE BEVEL ETCHER

METHODS TO REMOVE FILMS ON BEVEL EDGE AND BACKSIDE OF WAFER AND APP...

PLASMA CHAMBER FOR WAFER BEVEL EDGE PROCESSING

Plasma Processing Chamber for Bevel Edge Processing

METHOD OF ORIENTING AN UPPER ELECTRODE RELATIVE TO A LOWER ELECTROD...

LOCAL PLASMA CONFINEMENT AND PRESSURE CONTROL ARRANGEMENT AND METHO...

METHOD FOR REPAIRING LOW-K DIELECTRIC DAMAGE

STRIP WITH REDUCED LOW-K DIELECTRIC DAMAGE

METHOD FOR LOW-K DIELECTRIC ETCH WITH REDUCED DAMAGE

MODULATED MULTI-FREQUENCY PROCESSING METHOD

BEVEL PLASMA TREATMENT TO ENHANCE WET EDGE CLEAN

APPARATUS FOR THE REMOVAL OF A FLUORINATED POLYMER FROM A SUBSTRATE

LOW-K DAMAGE AVOIDANCE DURING BEVEL ETCH PROCESSING

METHODS FOR REMOVING A METAL OXIDE FROM A SUBSTRATE

Expert knowledge methods and systems for data analysis

Apparatus For Aligning Electrodes In A Process Chamber to Protect A...

METHODS FOR REMOVING AN EDGE POLYMER FROM A SUBSTRATE

SERVICING A PLASMA PROCESSING SYSTEM WITH A ROBOT