Andrew J. Watts

Person

Essex, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Structure and methodology for fabrication and inspection of photoma...
- Patent number 8,423,918
- Issue date Apr 16, 2013
- International Business Machines Corporation
- Jed H. Rankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and methodology for fabrication and inspection of photomasks
- Patent number 7,745,069
- Issue date Jun 29, 2010
- International Business Machines Corporation
- Jed H. Rankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to selectively correct critical dimension errors in the semi...
- Patent number 7,294,440
- Issue date Nov 13, 2007
- International Business Machines Corporation
- Jed H. Rankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Common second level frame exposure methods for making embedded atte...
- Patent number 7,276,316
- Issue date Oct 2, 2007
- International Business Machines Corporation
- Andrew J. Watts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of patterning a substrate by feeding mask defect data forwar...
- Patent number 7,211,356
- Issue date May 1, 2007
- International Business Machines Corporation
- Jed H. Rankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and methodology for fabrication and inspection of photomasks
- Patent number 7,200,257
- Issue date Apr 3, 2007
- International Business Machines Corporation
- Jed H. Rankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monolithic hard pellicle
- Patent number 7,110,195
- Issue date Sep 19, 2006
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of photolithographic critical dimension control by using ret...
- Patent number 6,557,163
- Issue date Apr 29, 2003
- International Business Machines Corporation
- Jed H. Rankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist images by periodic pattern removal
- Patent number 6,387,596
- Issue date May 14, 2002
- International Business Machines Corporation
- Daniel C. Cole
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask with linewidth compensation and method of making same
- Patent number 6,338,921
- Issue date Jan 15, 2002
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gray level mask
- Patent number 5,334,467
- Issue date Aug 2, 1994
- International Business Machines Corporation
- John E. Cronin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making a gray level mask
- Patent number 5,213,916
- Issue date May 25, 1993
- International Business Machines Corporation
- John E. Cronin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plural level chip masking
- Patent number 5,126,006
- Issue date Jun 30, 1992
- International Business Machines Corp.
- John E. Cronin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
STRUCTURE AND METHODOLOGY FOR FABRICATION AND INSPECTION OF PHOTOMASKS
- Publication number 20100162196
- Publication date Jun 24, 2010
- International Business Machines Corporation
- Jed H. Rankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHING APPARATUS FOR SEMICONDUTOR FABRICATION
- Publication number 20080093342
- Publication date Apr 24, 2008
- Timothy J. Dalton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND METHODOLOGY FOR FABRICATION AND INSPECTION OF PHOTOMASKS
- Publication number 20070105024
- Publication date May 10, 2007
- Jed H. Rankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE AND METHODOLOGY FOR FABRICATION AND INSPECTION OF PHOTOMASKS
- Publication number 20060253828
- Publication date Nov 9, 2006
- International Business Machines Corporation
- Jed H. Rankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHING APPARATUS FOR SEMICONDUCTOR FABRICATION
- Publication number 20060191638
- Publication date Aug 31, 2006
- International Business Machines Corporation
- Timothy J. Dalton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING A SUBSTRATE BY FEEDING MASK DEFECT DATA FORWAR...
- Publication number 20060068302
- Publication date Mar 30, 2006
- Jed H. Rankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method to selectively correct critical dimension errors in the semi...
- Publication number 20060019412
- Publication date Jan 26, 2006
- International Business Machines Corporation
- Jed H. Rankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOLITHIC HARD PELLICLE
- Publication number 20050243452
- Publication date Nov 3, 2005
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMMON SECOND LEVEL FRAME EXPOSURE FOR EMBEDDED ATTENUATED PHASE SH...
- Publication number 20050170261
- Publication date Aug 4, 2005
- International Business Machines Corporation
- Andrew J. Watts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST IMAGES BY PERIODIC PATTERN REMOVAL
- Publication number 20010041306
- Publication date Nov 15, 2001
- DANIEL C. COLE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Andrew J. Watts

Person

Patents Grantslast 30 patents

Structure and methodology for fabrication and inspection of photoma...

Structure and methodology for fabrication and inspection of photomasks

Method to selectively correct critical dimension errors in the semi...

Common second level frame exposure methods for making embedded atte...

Method of patterning a substrate by feeding mask defect data forwar...

Structure and methodology for fabrication and inspection of photomasks

Monolithic hard pellicle

Method of photolithographic critical dimension control by using ret...

Method of forming resist images by periodic pattern removal

Mask with linewidth compensation and method of making same

Gray level mask

Method of making a gray level mask

Plural level chip masking

Patents Applicationslast 30 patents

STRUCTURE AND METHODOLOGY FOR FABRICATION AND INSPECTION OF PHOTOMASKS

ETCHING APPARATUS FOR SEMICONDUTOR FABRICATION

STRUCTURE AND METHODOLOGY FOR FABRICATION AND INSPECTION OF PHOTOMASKS

STRUCTURE AND METHODOLOGY FOR FABRICATION AND INSPECTION OF PHOTOMASKS

ETCHING APPARATUS FOR SEMICONDUCTOR FABRICATION

METHOD OF PATTERNING A SUBSTRATE BY FEEDING MASK DEFECT DATA FORWAR...

Method to selectively correct critical dimension errors in the semi...

MONOLITHIC HARD PELLICLE

COMMON SECOND LEVEL FRAME EXPOSURE FOR EMBEDDED ATTENUATED PHASE SH...

METHOD OF FORMING RESIST IMAGES BY PERIODIC PATTERN REMOVAL