Andrew M. Waite

Person

Beverly, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Implant to form vertical FETs with self-aligned drain spacer and ju...
- Patent number 11,640,987
- Issue date May 2, 2023
- Applied Materials, Inc.
- Andrew Michael Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced etch resistance for insulator layers implanted with low en...
- Patent number 11,424,164
- Issue date Aug 23, 2022
- Applied Materials, Inc.
- Andrew Michael Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Asymmetric gate spacer formation using multiple ion implants
- Patent number 10,896,855
- Issue date Jan 19, 2021
- Applied Materials, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques and structure for forming thin silicon-on-insulator mate...
- Patent number 10,600,675
- Issue date Mar 24, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch rate modulation through ion implantation
- Patent number 10,332,748
- Issue date Jun 25, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Techniques for forming isolation structures in a substrate
- Patent number 10,090,166
- Issue date Oct 2, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Andrew Michael Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch rate modulation through ion implantation
- Patent number 9,934,982
- Issue date Apr 3, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Masking for high temperature implants
- Patent number 9,679,776
- Issue date Jun 13, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implant for defect control
- Patent number 9,299,564
- Issue date Mar 29, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of doping a polycrystalline transistor channel for vertical...
- Patent number 9,018,064
- Issue date Apr 28, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of implanting high aspect ratio features
- Patent number 8,846,508
- Issue date Sep 30, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for forming low contact resistance device
- Patent number 8,617,955
- Issue date Dec 31, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Andrew Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to modify the shape of a cavity using angled implantation
- Patent number 8,450,194
- Issue date May 28, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Andrew Waite
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SURFACE ROUGHNESS REDUCTION FOR PHOTONICS USING HIGH-TEMPERATURE IM...
- Publication number 20240255700
- Publication date Aug 1, 2024
- Applied Materials, Inc.
- Eric Jay Simmons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRECISION OXIDATION CONTROL BY ION IMPLANTATION
- Publication number 20240203743
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Supakit Charnvanichborikarn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPLANT TO FORM VERTICAL FETS WITH SELF-ALIGNED DRAIN SPACER AND JU...
- Publication number 20220246746
- Publication date Aug 4, 2022
- Applied Materials, Inc.
- Andrew Michael Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED ETCH RESISTANCE FOR INSULATOR LAYERS IMPLANTED WITH LOW EN...
- Publication number 20220068715
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Andrew Michael Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASYMMETRIC GATE SPACER FORMATION USING MULTIPLE ION IMPLANTS
- Publication number 20200388541
- Publication date Dec 10, 2020
- Applied Materials, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Techniques and Structure for Forming Thin Silicon-on-Insulator Mate...
- Publication number 20190027396
- Publication date Jan 24, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR FORMING ISOLATION STRUCTURES IN A SUBSTRATE
- Publication number 20180197747
- Publication date Jul 12, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Andrew Michael Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch Rate Modulation Through Ion Implantation
- Publication number 20180182636
- Publication date Jun 28, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch Rate Modulation Through Ion Implantation
- Publication number 20170178914
- Publication date Jun 22, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Masking For High Temperature Implants
- Publication number 20170025277
- Publication date Jan 26, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR ION IMPLANTATION OF NARROW SEMICONDUCTOR STRUCTURES
- Publication number 20150214339
- Publication date Jul 30, 2015
- Varian Semiconductor Equipment Associates, Inc.
- ANDREW M. WAITE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Barrier Layer For Electrostatic Chucks
- Publication number 20150062772
- Publication date Mar 5, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Of Doping A Polycrystalline Transistor Channel For Vertical...
- Publication number 20150017772
- Publication date Jan 15, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Implant For Defect Control
- Publication number 20140162435
- Publication date Jun 12, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR FORMING LOW CONTACT RESISTANCE DEVICE
- Publication number 20130015528
- Publication date Jan 17, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Andrew Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO MODIFY THE SHAPE OF A CAVITY USING ANGLED IMPLANTATION
- Publication number 20130001698
- Publication date Jan 3, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Andrew Waite
- H01 - BASIC ELECTRIC ELEMENTS

Andrew M. Waite

Person

Patents Grantslast 30 patents

Implant to form vertical FETs with self-aligned drain spacer and ju...

Enhanced etch resistance for insulator layers implanted with low en...

Asymmetric gate spacer formation using multiple ion implants

Techniques and structure for forming thin silicon-on-insulator mate...

Etch rate modulation through ion implantation

Techniques for forming isolation structures in a substrate

Etch rate modulation through ion implantation

Masking for high temperature implants

Ion implant for defect control

Method of doping a polycrystalline transistor channel for vertical...

Method of implanting high aspect ratio features

Method and system for forming low contact resistance device

Method to modify the shape of a cavity using angled implantation

Patents Applicationslast 30 patents

SURFACE ROUGHNESS REDUCTION FOR PHOTONICS USING HIGH-TEMPERATURE IM...

METHOD FOR PRECISION OXIDATION CONTROL BY ION IMPLANTATION

IMPLANT TO FORM VERTICAL FETS WITH SELF-ALIGNED DRAIN SPACER AND JU...

ENHANCED ETCH RESISTANCE FOR INSULATOR LAYERS IMPLANTED WITH LOW EN...

ASYMMETRIC GATE SPACER FORMATION USING MULTIPLE ION IMPLANTS

Techniques and Structure for Forming Thin Silicon-on-Insulator Mate...

TECHNIQUES FOR FORMING ISOLATION STRUCTURES IN A SUBSTRATE

Etch Rate Modulation Through Ion Implantation

Etch Rate Modulation Through Ion Implantation

Masking For High Temperature Implants

TECHNIQUES FOR ION IMPLANTATION OF NARROW SEMICONDUCTOR STRUCTURES

Barrier Layer For Electrostatic Chucks

Method Of Doping A Polycrystalline Transistor Channel For Vertical...

Ion Implant For Defect Control

METHOD AND SYSTEM FOR FORMING LOW CONTACT RESISTANCE DEVICE

METHOD TO MODIFY THE SHAPE OF A CAVITY USING ANGLED IMPLANTATION