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Andrew R. Romano

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  • Pleasanton, CA, US
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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    PHOTORESIST DOUBLE PATTERNING APPARATUS
    • Publication number 20130000846
    • Publication date Jan 3, 2013
    • LAM RESEARCH CORPORATION
    • Andrew R. Romano
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PROTECTIVE LAYER FOR IMPLANT PHOTORESIST
    • Publication number 20120328781
    • Publication date Dec 27, 2012
    • LAM RESEARCH CORPORATION
    • Andrew R. Romano
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCH WITH HIGH ETCH RATE RESIST MASK
    • Publication number 20120282780
    • Publication date Nov 8, 2012
    • LAM RESEARCH CORPORATION
    • Andrew R. Romano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    DOUBLE MASK SELF-ALIGNED DOUBLE PATTERNING TECHNOLOGY (SADPT) PROCESS
    • Publication number 20090215272
    • Publication date Aug 27, 2009
    • LAM RESEARCH CORPORATION
    • S. M. Reza Sadjadi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PROTECTIVE LAYER FOR IMPLANT PHOTORESIST
    • Publication number 20090162553
    • Publication date Jun 25, 2009
    • LAM RESEARCH CORPORATION
    • Andrew R. Romano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST DOUBLE PATTERNING
    • Publication number 20090162790
    • Publication date Jun 25, 2009
    • LAM RESEARCH CORPORATION
    • Andrew R. Romano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    ETCH WITH HIGH ETCH RATE RESIST MASK
    • Publication number 20090163035
    • Publication date Jun 25, 2009
    • LAM RESEARCH CORPORATION
    • Andrew R. Romano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY