Andrzej Kaszuba

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon wafers by epitaxial deposition
- Patent number 11,041,253
- Issue date Jun 22, 2021
- Svagos Technik, Inc.
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
Silicon wafers by epitaxial deposition
- Patent number 9,982,363
- Issue date May 29, 2018
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 9,920,451
- Issue date Mar 20, 2018
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 9,556,522
- Issue date Jan 31, 2017
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon wafers by epitaxial deposition
- Patent number 9,255,346
- Issue date Feb 9, 2016
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 8,673,081
- Issue date Mar 18, 2014
- Crystal Solar, Inc.
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 8,663,753
- Issue date Mar 4, 2014
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultraviolet reflector with coolant gas holes and method
- Patent number 8,338,809
- Issue date Dec 25, 2012
- Applied Materials, Inc.
- Yao-Hung Yang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 8,298,629
- Issue date Oct 30, 2012
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultraviolet reflector with coolant gas holes and method
- Patent number 7,964,858
- Issue date Jun 21, 2011
- Applied Materials, Inc.
- Yao-Hung Yang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
High efficiency UV curing system
- Patent number 7,663,121
- Issue date Feb 16, 2010
- Applied Materials, Inc.
- Thomas Nowak
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Heated gas box for PECVD applications
- Patent number 7,628,863
- Issue date Dec 8, 2009
- Applied Materials, Inc.
- Soovo Sen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for reducing entrapment of foreign matter along a moveabl...
- Patent number 7,582,167
- Issue date Sep 1, 2009
- Applied Materials, Inc.
- Andrzej Kaszuba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Increased tool utilization/reduction in MWBC for UV curing chamber
- Patent number 7,554,103
- Issue date Jun 30, 2009
- Applied Materials, Inc.
- Juan Carlos Rocha-Alvarez
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Apparatus for reducing entrapment of foreign matter along a moveabl...
- Patent number 7,279,049
- Issue date Oct 9, 2007
- Applied Materials, Inc.
- Andrzej Kaszuba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SILICON WAFERS BY EPITAXIAL DEPOSITION
- Publication number 20190003076
- Publication date Jan 3, 2019
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
HIGH THROUGHPUT EPITAXIAL DEPOSITION SYSTEM FOR SINGLE CRYSTAL SOLA...
- Publication number 20140318442
- Publication date Oct 30, 2014
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR
- Publication number 20140311403
- Publication date Oct 23, 2014
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR
- Publication number 20140295106
- Publication date Oct 2, 2014
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
High Throughput Multi-Wafer Epitaxial Reactor
- Publication number 20130059430
- Publication date Mar 7, 2013
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
SILICON WAFERS BY EPITAXIAL DEPOSITION
- Publication number 20130032084
- Publication date Feb 7, 2013
- Crytal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
ULTRAVIOLET REFLECTOR WITH COOLANT GAS HOLES AND METHOD
- Publication number 20110248183
- Publication date Oct 13, 2011
- Yao-Hung Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR
- Publication number 20100263587
- Publication date Oct 21, 2010
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
High Throughput Multi-Wafer Epitaxial Reactor
- Publication number 20100215872
- Publication date Aug 26, 2010
- Crystal Solar, Inc.
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
ULTRAVIOLET REFLECTOR WITH COOLANT GAS HOLES AND METHOD
- Publication number 20100096564
- Publication date Apr 22, 2010
- APPLIED MATERIALS, INC.
- Yao-Hung Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
HIGH EFFICIENCY UV CURING SYSTEM
- Publication number 20090162259
- Publication date Jun 25, 2009
- Thomas Nowak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR REDUCING ENTRAPMENT OF FOREIGN MATTER ALONG A MOVEABL...
- Publication number 20080017115
- Publication date Jan 24, 2008
- Andrzej Kaszuba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INCREASED TOOL UTILIZATION/REDUCTION IN MWBC FOR UV CURING CHAMBER
- Publication number 20070298362
- Publication date Dec 27, 2007
- Applied Materials, Inc.
- Juan Carlos Rocha-Alvarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heated gas box for PECVD applications
- Publication number 20070107660
- Publication date May 17, 2007
- APPLIED MATERIALS, INC.
- Soovo Sen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH EFFICIENCY UV CURING SYSTEM
- Publication number 20060249078
- Publication date Nov 9, 2006
- Thomas Nowak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High efficiency UV curing system
- Publication number 20060249175
- Publication date Nov 9, 2006
- APPLIED MATERIALS, INC.
- Thomas Nowak
- B08 - CLEANING
Information Patent Application
TANDEM UV CHAMBER FOR CURING DIELECTRIC MATERIALS
- Publication number 20060251827
- Publication date Nov 9, 2006
- APPLIED MATERIALS, INC.
- Thomas Nowak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heated gas box for PECVD applications
- Publication number 20060027165
- Publication date Feb 9, 2006
- APPLIED MATERIALS, INC.
- Soovo Sen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for reducing entrapment of foreign matter along a moveabl...
- Publication number 20050172905
- Publication date Aug 11, 2005
- APPLIED MATERIALS, INC.
- Andrzej Kaszuba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Andrzej Kaszuba

Person

Patents Grantslast 30 patents

Silicon wafers by epitaxial deposition

Silicon wafers by epitaxial deposition

High throughput multi-wafer epitaxial reactor

High throughput multi-wafer epitaxial reactor

Silicon wafers by epitaxial deposition

High throughput multi-wafer epitaxial reactor

High throughput multi-wafer epitaxial reactor

Ultraviolet reflector with coolant gas holes and method

High throughput multi-wafer epitaxial reactor

Ultraviolet reflector with coolant gas holes and method

High efficiency UV curing system

Heated gas box for PECVD applications

Apparatus for reducing entrapment of foreign matter along a moveabl...

Increased tool utilization/reduction in MWBC for UV curing chamber

Apparatus for reducing entrapment of foreign matter along a moveabl...

Patents Applicationslast 30 patents

SILICON WAFERS BY EPITAXIAL DEPOSITION

HIGH THROUGHPUT EPITAXIAL DEPOSITION SYSTEM FOR SINGLE CRYSTAL SOLA...

HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR

HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR

High Throughput Multi-Wafer Epitaxial Reactor

SILICON WAFERS BY EPITAXIAL DEPOSITION

ULTRAVIOLET REFLECTOR WITH COOLANT GAS HOLES AND METHOD

HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR

High Throughput Multi-Wafer Epitaxial Reactor

ULTRAVIOLET REFLECTOR WITH COOLANT GAS HOLES AND METHOD

HIGH EFFICIENCY UV CURING SYSTEM

APPARATUS FOR REDUCING ENTRAPMENT OF FOREIGN MATTER ALONG A MOVEABL...

INCREASED TOOL UTILIZATION/REDUCTION IN MWBC FOR UV CURING CHAMBER

Heated gas box for PECVD applications

HIGH EFFICIENCY UV CURING SYSTEM

High efficiency UV curing system

TANDEM UV CHAMBER FOR CURING DIELECTRIC MATERIALS

Heated gas box for PECVD applications

Apparatus for reducing entrapment of foreign matter along a moveabl...