Annamalai Lakshmanan

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 12,104,243
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low resistivity DRAM buried word line stack
- Patent number 12,022,650
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Doping control of metal nitride films
- Patent number 11,587,829
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low resistivity DRAM buried word line stack
- Patent number 11,587,936
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming a metal silicide interconnection nanowire struc...
- Patent number 10,930,472
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping control of metal nitride films
- Patent number 10,910,263
- Issue date Feb 2, 2021
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doped tantalum nitride for copper barrier applications
- Patent number 10,784,157
- Issue date Sep 22, 2020
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laminate and core shell formation of silicide nanowire
- Patent number 10,593,592
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping control of metal nitride films
- Patent number 10,431,493
- Issue date Oct 1, 2019
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a metal silicide interconnection nanowire struc...
- Patent number 10,204,764
- Issue date Feb 12, 2019
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping control of metal nitride films
- Patent number 10,008,412
- Issue date Jun 26, 2018
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping control of metal nitride films
- Patent number 9,659,814
- Issue date May 23, 2017
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct deposition of nickel silicide nanowire
- Patent number 9,613,859
- Issue date Apr 4, 2017
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing metals using high frequency plasma
- Patent number 9,466,524
- Issue date Oct 11, 2016
- Applied Materials, Inc.
- Paul F. Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Elimination of first wafer effect for PECVD films
- Patent number 9,157,151
- Issue date Oct 13, 2015
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for manganese nitride integration
- Patent number 9,076,661
- Issue date Jul 7, 2015
- Applied Materials, Inc.
- Paul F. Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing a material atop a substrate
- Patent number 8,642,376
- Issue date Feb 4, 2014
- Applied Materials, Inc.
- Sukti Chatterjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hermetic low dielectric constant layer for barrier applications
- Patent number 7,288,205
- Issue date Oct 30, 2007
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Situ oxide cap layer development
- Patent number 7,273,823
- Issue date Sep 25, 2007
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interface engineering to improve adhesion between low k stacks
- Patent number 7,259,111
- Issue date Aug 21, 2007
- Applied Materials, Inc.
- Deenesh Padhi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adhesion improvement for low k dielectrics to conductive materials
- Patent number 7,229,911
- Issue date Jun 12, 2007
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Strengthening the interface between dielectric layers and barrier l...
- Patent number 7,189,658
- Issue date Mar 13, 2007
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bi-layer approach for a hermetic low dielectric constant layer for...
- Patent number 7,091,137
- Issue date Aug 15, 2006
- Applied Materials
- Albert Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning of CVD chambers using remote source with cxfyoz based chem...
- Patent number 6,923,189
- Issue date Aug 2, 2005
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
GRADIENT OXIDATION AND ETCH OF PVD MOLYBDENUM FOR BOTTOM UP GAP FILL
- Publication number 20230343645
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Meng-Shan WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRADIENT OXIDATION AND ETCH FOR PVD METAL AS BOTTOM LINER IN BOTTOM...
- Publication number 20230343643
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Chih-Hsun HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CLEANING AND SELECTIVE MOLYBDENUM DEPOSITION PROCESSES
- Publication number 20230323543
- Publication date Oct 12, 2023
- Applied Materials, Inc.
- Tuerxun Ailihumaer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FIELD SUPPRESSED METAL GAPFILL
- Publication number 20230326744
- Publication date Oct 12, 2023
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DEPOSITING METAL FILMS
- Publication number 20230227975
- Publication date Jul 20, 2023
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW RESISTIVITY DRAM BURIED WORD LINE STACK
- Publication number 20230141748
- Publication date May 11, 2023
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220403505
- Publication date Dec 22, 2022
- Annamalai LAKSHMANAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low Resistivity DRAM Buried Word Line Stack
- Publication number 20220278108
- Publication date Sep 1, 2022
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Resistivity Metal Contact Stack
- Publication number 20220277961
- Publication date Sep 1, 2022
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Doping Control of Metal Nitride Films
- Publication number 20210159118
- Publication date May 27, 2021
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPING CONTROL OF METAL NITRIDE FILMS
- Publication number 20190378754
- Publication date Dec 12, 2019
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A METAL SILICIDE INTERCONNECTION NANOWIRE STRUC...
- Publication number 20190172686
- Publication date Jun 6, 2019
- Applied Materials, Inc.
- Bencherki MEBARKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Doping Control of Metal Nitride Films
- Publication number 20180277428
- Publication date Sep 27, 2018
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Doping Control of Metal Nitride Films
- Publication number 20170256448
- Publication date Sep 7, 2017
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECT DEPOSITION OF NICKEL SILICIDE NANOWIRE
- Publication number 20160204027
- Publication date Jul 14, 2016
- Applied Materials, Inc.
- Annamalai LAKSHMANAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAMINATE AND CORE SHELL FORMATION OF SILICIDE NANOWIRE
- Publication number 20160204029
- Publication date Jul 14, 2016
- Applied Materials, Inc.
- Bencherki MEBARKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A METAL SILICIDE INTERCONNECTION NANOWIRE STRUC...
- Publication number 20160118260
- Publication date Apr 28, 2016
- Applied Materials, Inc.
- Bencherki MEBARKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH THROUGH-PUT AND LOW TEMPERATURE ALD COPPER DEPOSITION AND INTE...
- Publication number 20160032455
- Publication date Feb 4, 2016
- Applied Materials, Inc.
- Feng Q. Liu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Doping Control of Metal Nitride Films
- Publication number 20140220772
- Publication date Aug 7, 2014
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Manganese Nitride Integration
- Publication number 20130292806
- Publication date Nov 7, 2013
- Paul F. Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADHESION IMPROVEMENT FOR LOW K DIELECTRICS TO CONDUCTIVE MATERIALS
- Publication number 20130230986
- Publication date Sep 5, 2013
- Applied Materials, Inc.
- NAGARAJAN RAJAGOPALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method Of Depositing Metals Using High Frequency Plasma
- Publication number 20130196507
- Publication date Aug 1, 2013
- Paul F. Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Doped Tantalum Nitride for Copper Barrier Applications
- Publication number 20130140698
- Publication date Jun 6, 2013
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REMOTE PLASMA SOURCE ASSISTED SILICON-CONT...
- Publication number 20130012030
- Publication date Jan 10, 2013
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING A MATERIAL ATOP A SUBSTRATE
- Publication number 20120295419
- Publication date Nov 22, 2012
- Applied Materials, Inc.
- SUKTI CHATTERJEE
- C30 - CRYSTAL GROWTH
Information Patent Application
Method Of Processing Low K Dielectric Films
- Publication number 20120122320
- Publication date May 17, 2012
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and Apparatus for Silicon Film Deposition
- Publication number 20110230008
- Publication date Sep 22, 2011
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH TEMPERATURE BD DEVELOPMENT FOR MEMORY APPLICATIONS
- Publication number 20100087062
- Publication date Apr 8, 2010
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UV CURING OF PECVD-DEPOSITED SACRIFICIAL POLYMER FILMS FOR AIR-GAP ILD
- Publication number 20080182403
- Publication date Jul 31, 2008
- ATIF NOORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Overall defect reduction for PECVD films
- Publication number 20080050932
- Publication date Feb 28, 2008
- APPLIED MATERIALS, INC.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Annamalai Lakshmanan

Person

Patents Grantslast 30 patents

Methods and apparatus for processing a substrate

Low resistivity DRAM buried word line stack

Doping control of metal nitride films

Low resistivity DRAM buried word line stack

Methods for forming a metal silicide interconnection nanowire struc...

Doping control of metal nitride films

Doped tantalum nitride for copper barrier applications

Laminate and core shell formation of silicide nanowire

Doping control of metal nitride films

Methods for forming a metal silicide interconnection nanowire struc...

Doping control of metal nitride films

Doping control of metal nitride films

Direct deposition of nickel silicide nanowire

Method of depositing metals using high frequency plasma

Elimination of first wafer effect for PECVD films

Methods for manganese nitride integration

Methods for depositing a material atop a substrate

Hermetic low dielectric constant layer for barrier applications

Situ oxide cap layer development

Interface engineering to improve adhesion between low k stacks

Adhesion improvement for low k dielectrics to conductive materials

Strengthening the interface between dielectric layers and barrier l...

Bi-layer approach for a hermetic low dielectric constant layer for...

Cleaning of CVD chambers using remote source with cxfyoz based chem...

Patents Applicationslast 30 patents

GRADIENT OXIDATION AND ETCH OF PVD MOLYBDENUM FOR BOTTOM UP GAP FILL

GRADIENT OXIDATION AND ETCH FOR PVD METAL AS BOTTOM LINER IN BOTTOM...

INTEGRATED CLEANING AND SELECTIVE MOLYBDENUM DEPOSITION PROCESSES

FIELD SUPPRESSED METAL GAPFILL

METHOD OF DEPOSITING METAL FILMS

LOW RESISTIVITY DRAM BURIED WORD LINE STACK

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

Low Resistivity DRAM Buried Word Line Stack

Low Resistivity Metal Contact Stack

Doping Control of Metal Nitride Films

DOPING CONTROL OF METAL NITRIDE FILMS

METHODS FOR FORMING A METAL SILICIDE INTERCONNECTION NANOWIRE STRUC...

Doping Control of Metal Nitride Films

Doping Control of Metal Nitride Films

DIRECT DEPOSITION OF NICKEL SILICIDE NANOWIRE

LAMINATE AND CORE SHELL FORMATION OF SILICIDE NANOWIRE

METHODS FOR FORMING A METAL SILICIDE INTERCONNECTION NANOWIRE STRUC...

HIGH THROUGH-PUT AND LOW TEMPERATURE ALD COPPER DEPOSITION AND INTE...

Doping Control of Metal Nitride Films

Methods For Manganese Nitride Integration

ADHESION IMPROVEMENT FOR LOW K DIELECTRICS TO CONDUCTIVE MATERIALS

Method Of Depositing Metals Using High Frequency Plasma

Doped Tantalum Nitride for Copper Barrier Applications

METHOD AND APPARATUS FOR REMOTE PLASMA SOURCE ASSISTED SILICON-CONT...

METHODS FOR DEPOSITING A MATERIAL ATOP A SUBSTRATE

Method Of Processing Low K Dielectric Films

Method and Apparatus for Silicon Film Deposition

HIGH TEMPERATURE BD DEVELOPMENT FOR MEMORY APPLICATIONS

UV CURING OF PECVD-DEPOSITED SACRIFICIAL POLYMER FILMS FOR AIR-GAP ILD

Overall defect reduction for PECVD films