Anthony L. Chen

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for determining parameters of process operation
- Patent number 11,724,354
- Issue date Aug 15, 2023
- Ioneer, LLC
- Anthony Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Bare aluminum baffles for resist stripping chambers
- Patent number 8,859,432
- Issue date Oct 14, 2014
- Lam Research Corporation
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bare aluminum baffles for resist stripping chambers
- Patent number 8,313,635
- Issue date Nov 20, 2012
- Lam Research Corporation
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bare aluminum baffles for resist stripping chambers
- Patent number 7,811,409
- Issue date Oct 12, 2010
- Lam Research Corporation
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for tuning a set of plasma processing steps
- Patent number 7,578,945
- Issue date Aug 25, 2009
- Lam Research Corporation
- Vahid Vahedi
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Methods and apparatus for tuning a set of plasma processing steps
- Patent number 7,138,067
- Issue date Nov 21, 2006
- Lam Research Corporation
- Vahid Vahedi
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
H2O vapor as a processing gas for crust, resist, and residue remova...
- Patent number 6,777,173
- Issue date Aug 17, 2004
- Lam Research Corporation
- Anthony Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing aluminum fluoride deposits in plasma etch reactor
- Patent number 6,770,214
- Issue date Aug 3, 2004
- Lam Research Corporation
- Duane Outka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas purge protection of sensors and windows in a gas phase processi...
- Patent number 6,344,151
- Issue date Feb 5, 2002
- Lam Research Corporation
- Anthony L. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High sputter, etch resistant window for plasma processing chambers
- Patent number 6,074,516
- Issue date Jun 13, 2000
- Lam Research Corporation
- Arthur M. Howald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas purge protection of sensors and windows in a gas phase processi...
- Patent number 6,071,375
- Issue date Jun 6, 2000
- Lam Research Corporation
- Anthony L. Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR DETERMINING PARAMETERS OF PROCESS OPERATION
- Publication number 20210101249
- Publication date Apr 8, 2021
- Ioneer, LLC
- Anthony CHEN
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR MEASURING PLASMA EMISSIONS IN A PLASMA PROCES...
- Publication number 20200383196
- Publication date Dec 3, 2020
- Ioneer, LLC
- Anthony CHEN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
BARE ALUMINUM BAFFLES FOR RESIST STRIPPING CHAMBERS
- Publication number 20130056022
- Publication date Mar 7, 2013
- LAM RESEARCH CORPORATION
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR WET CLEANING QUARTZ SURFACES OF COMPONENTS FOR PLASMA P...
- Publication number 20110146909
- Publication date Jun 23, 2011
- LAM RESEARCH CORPORATION
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BARE ALUMINUM BAFFLES FOR RESIST STRIPPING CHAMBERS
- Publication number 20100319813
- Publication date Dec 23, 2010
- LAM RESEARCH CORPORATION
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Bare aluminum baffles for resist stripping chambers
- Publication number 20080178906
- Publication date Jul 31, 2008
- Lam Research Corporation
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective etch of films with high dielectric constant with H2 addition
- Publication number 20070056925
- Publication date Mar 15, 2007
- Lam Research Corporation
- Shenjian Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for tuning a set of plasma processing steps
- Publication number 20070034604
- Publication date Feb 15, 2007
- Lam Research Corporation
- Vahid Vahedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for tuning a set of plasma processing steps
- Publication number 20060065628
- Publication date Mar 30, 2006
- Vahid Vahedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bare aluminum baffles for resist stripping chambers
- Publication number 20050284573
- Publication date Dec 29, 2005
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for wet cleaning quartz surfaces of components for plasma p...
- Publication number 20050274396
- Publication date Dec 15, 2005
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for cleaning a set of structures comprising yttrium oxide i...
- Publication number 20050161061
- Publication date Jul 28, 2005
- Hong Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
H2O vapor as a processing gas for crust, resist, and residue remova...
- Publication number 20040043337
- Publication date Mar 4, 2004
- LAM RESEARCH CORPORATION
- Anthony Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of reducing aluminum fluoride deposits in plasma etch reactor
- Publication number 20020179569
- Publication date Dec 5, 2002
- Duane Outka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Anthony L. Chen

Person

Patents Grantslast 30 patents

Apparatus and method for determining parameters of process operation

Bare aluminum baffles for resist stripping chambers

Bare aluminum baffles for resist stripping chambers

Bare aluminum baffles for resist stripping chambers

Method and apparatus for tuning a set of plasma processing steps

Methods and apparatus for tuning a set of plasma processing steps

H2O vapor as a processing gas for crust, resist, and residue remova...

Method of reducing aluminum fluoride deposits in plasma etch reactor

Gas purge protection of sensors and windows in a gas phase processi...

High sputter, etch resistant window for plasma processing chambers

Gas purge protection of sensors and windows in a gas phase processi...

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR DETERMINING PARAMETERS OF PROCESS OPERATION

METHOD AND SYSTEM FOR MEASURING PLASMA EMISSIONS IN A PLASMA PROCES...

BARE ALUMINUM BAFFLES FOR RESIST STRIPPING CHAMBERS

METHODS FOR WET CLEANING QUARTZ SURFACES OF COMPONENTS FOR PLASMA P...

BARE ALUMINUM BAFFLES FOR RESIST STRIPPING CHAMBERS

Bare aluminum baffles for resist stripping chambers

Selective etch of films with high dielectric constant with H2 addition

Method and apparatus for tuning a set of plasma processing steps

Methods and apparatus for tuning a set of plasma processing steps

Bare aluminum baffles for resist stripping chambers

Methods for wet cleaning quartz surfaces of components for plasma p...

Methods for cleaning a set of structures comprising yttrium oxide i...

H2O vapor as a processing gas for crust, resist, and residue remova...

Method of reducing aluminum fluoride deposits in plasma etch reactor