Anwar Husain

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lift pin mechanism
- Patent number 12,211,734
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Alexander Sulyman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma resistant arc preventative coatings for manufacturing equipm...
- Patent number 12,198,903
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Joseph Frederick Sommers
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Lift pin assembly
- Patent number 12,020,977
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Alexander Sulyman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sheath and temperature control of a process kit in a substrate proc...
- Patent number 11,551,916
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Jaeyong Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Helical plug for reduction or prevention of arcing in a substrate s...
- Patent number 11,551,960
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Reyn T. Wakabayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for reducing high voltage arcing in semicondu...
- Patent number 11,488,852
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Anwar Husain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlled secondary electrode for ion control at subst...
- Patent number 11,424,096
- Issue date Aug 23, 2022
- Applied Materials, Inc.
- Hamid Noorbakhsh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for dechucking wafers
- Patent number 11,171,030
- Issue date Nov 9, 2021
- Applied Materials, Inc.
- Hamid Noorbakhsh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly having a dielectric filler
- Patent number 10,930,540
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge ring assembly for a substrate support in a plasma processing c...
- Patent number 10,847,347
- Issue date Nov 24, 2020
- Applied Materials, Inc.
- Hamid Noorbakhsh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Electrostatic chuck assembly having a dielectric filler
- Patent number 10,504,765
- Issue date Dec 10, 2019
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing chamber with a grounded electrode assembly
- Patent number 9,905,402
- Issue date Feb 27, 2018
- Lam Research Corporation
- Arnold Kholodenko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Confinement of foam delivered by a proximity head
- Patent number 8,739,805
- Issue date Jun 3, 2014
- Lam Research Corporation
- Arnold Kholodenko
- B08 - CLEANING
Information Patent Grant
Single substrate processing head for particle removal using low vis...
- Patent number 8,584,613
- Issue date Nov 19, 2013
- Lam Research Corporation
- Arnold Kholodenko
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for using generator for foam to clean substrate
- Patent number 8,557,051
- Issue date Oct 15, 2013
- Lam Research Corporation
- Arnold Kholodenko
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Wafer carrier drive apparatus and method for operating the same
- Patent number 8,261,905
- Issue date Sep 11, 2012
- Lam Research Corporation
- Arnold Kholodenko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Generator for foam to clean substrate
- Patent number 8,161,984
- Issue date Apr 24, 2012
- Lam Research Corporation
- Arnold Kholodenko
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Apparatus for an optimized plasma chamber grounded electrode assembly
- Patent number 7,743,730
- Issue date Jun 29, 2010
- Lam Research Corporation
- Arnold Kholodenko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin-rinse-dryer
- Patent number 7,226,514
- Issue date Jun 5, 2007
- Applied Materials, Inc.
- Anwar Husain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate cleaning system
- Patent number 6,575,177
- Issue date Jun 10, 2003
- Applied Materials Inc.
- Brian J Brown
- B08 - CLEANING
Information Patent Grant
Spin-rinse-dryer
- Patent number 6,516,816
- Issue date Feb 11, 2003
- Applied Materials, Inc.
- Anwar Husain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gripper for supporting substrate in a vertical orientation
- Patent number 6,474,712
- Issue date Nov 5, 2002
- Applied Materials, Inc.
- Boris I. Govzman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for transferring semiconductor substrates using an input...
- Patent number 6,406,359
- Issue date Jun 18, 2002
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for controlling a temperature of a wafer
- Patent number 6,303,895
- Issue date Oct 16, 2001
- Anwar Husain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling the temperature of a wafer by varying the pressure of g...
- Patent number 6,140,612
- Issue date Oct 31, 2000
- Lam Research Corporation
- Anwar Husain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of in-situ cleaning of a chuck within a plasma chamber
- Patent number 5,911,833
- Issue date Jun 15, 1999
- Lam Research Corporation
- Dean Denison
- B08 - CLEANING
Information Patent Grant
Multilayered electrostatic chuck and method of manufacture thereof
- Patent number 5,880,922
- Issue date Mar 9, 1999
- Lam Research Corporation
- Anwar Husain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayered electrostatic chuck and method of manufacture thereof
- Patent number 5,671,116
- Issue date Sep 23, 1997
- Lam Research Corporation
- Anwar Husain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Characterization, modeling, and design of an electrostatic chuck wi...
- Patent number 5,548,470
- Issue date Aug 20, 1996
- International Business Machines Corporation
- Anwar Husain
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA RESISTANT ARC PREVENTATIVE COATINGS FOR MANUFACTURING EQUPIM...
- Publication number 20230187182
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Joseph Frederick Sommers
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
POROUS PLUG FOR ELECTROSTATIC CHUCK GAS DELIVERY
- Publication number 20230170241
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Alexander SULYMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEABLE ELECTROSTATIC CHUCK OUTER RING FOR EDGE ARCING MITIGATION
- Publication number 20230118651
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Timothy Joseph FRANKLIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIFT PIN ASSEMBLY
- Publication number 20220293451
- Publication date Sep 15, 2022
- Alexander SULYMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIFT PIN MECHANISM
- Publication number 20220293452
- Publication date Sep 15, 2022
- Alexander SULYMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHEATH AND TEMPERATURE CONTROL OF A PROCESS KIT IN A SUBSTRATE PROC...
- Publication number 20210296098
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Jaeyong CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HELICAL PLUG FOR REDUCTION OR PREVENTION OF ARCING IN A SUBSTRATE S...
- Publication number 20210242063
- Publication date Aug 5, 2021
- Applied Materials, Inc.
- REYN T. WAKABAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROLLED SECONDARY ELECTRODE FOR ION CONTROL AT SUBST...
- Publication number 20210134554
- Publication date May 6, 2021
- Applied Materials, Inc.
- HAMID NOORBAKHSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING ASSEMBLY FOR A SUBSTRATE SUPPORT IN A PLASMA PROCESSING C...
- Publication number 20210043428
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Hamid NOORBAKHSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR REDUCTION OR PREVENTION OF ARCING IN A SUBSTRATE SUPPORT
- Publication number 20200411355
- Publication date Dec 31, 2020
- Applied Materials, Inc.
- Hamid NOORBAKHSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR REDUCING HIGH VOLTAGE ARCING IN SEMICONDU...
- Publication number 20200381282
- Publication date Dec 3, 2020
- Applied Materials, Inc.
- Anwar HUSAIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR DECHUCKING WAFERS
- Publication number 20200357675
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- HAMID NOORBAKHSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING ASSEMBLY FOR A SUBSTRATE SUPPORT IN A PLASMA PROCESSING C...
- Publication number 20200066495
- Publication date Feb 27, 2020
- Applied Materials, Inc.
- Hamid NOORBAKHSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK ASSEMBLY HAVING A DIELECTRIC FILLER
- Publication number 20200066566
- Publication date Feb 27, 2020
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO MODULATE THE WAFER EDGE SHEATH IN A PLASMA PROCESSING CHA...
- Publication number 20180323042
- Publication date Nov 8, 2018
- Applied Materials, Inc.
- Haitao WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck Assembly Having A Dielectric Filler
- Publication number 20180308736
- Publication date Oct 25, 2018
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND METHOD FOR ION IMPLANTATION
- Publication number 20160217970
- Publication date Jul 28, 2016
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Anwar HUSAIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND ION IMPLANTER FOR LOW TEMPERATURE IMPLANTATION
- Publication number 20160203950
- Publication date Jul 14, 2016
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Anwar HUSAIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Chamber With a Grounded Electrode Assembly
- Publication number 20150325416
- Publication date Nov 12, 2015
- LAM RESEARCH CORPORATION
- Arnold Kholodenko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Confinement of Foam Delivered by a Proximity Head
- Publication number 20140251382
- Publication date Sep 11, 2014
- LAM RESEARCH CORPORATION
- Arnold Kholodenko
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Method for Using Generator for Foam to Clean Substrate
- Publication number 20120255618
- Publication date Oct 11, 2012
- Arnold Kholodenko
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Wafer Carrier Drive Apparatus and Method for Operating the Same
- Publication number 20100230243
- Publication date Sep 16, 2010
- LAM RESEARCH CORPORATION
- Arnold Kholodenko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Confinement of Foam Delivered by a Proximity Head
- Publication number 20100126528
- Publication date May 27, 2010
- Arnold Kholodenko
- B08 - CLEANING
Information Patent Application
GENERATOR FOR FOAM TO CLEAN SUBSTRATE
- Publication number 20100024842
- Publication date Feb 4, 2010
- Arnold Kholodenko
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SINGLE SUBSTRATE PROCESSING HEAD FOR PARTICLE REMOVAL USING LOW VIS...
- Publication number 20090320942
- Publication date Dec 31, 2009
- LAM RESEARCH CORPORATION
- Arnold Kholodenko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE CLEANING SYSTEM
- Publication number 20080041422
- Publication date Feb 21, 2008
- Brian J. Brown
- B08 - CLEANING
Information Patent Application
Apparatus for an optimized plasma chamber grounded electrode assembly
- Publication number 20070137573
- Publication date Jun 21, 2007
- Arnold Kholodenko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor substrate cleaning system
- Publication number 20060180177
- Publication date Aug 17, 2006
- Brian J. Brown
- B08 - CLEANING
Information Patent Application
Semiconductor substrate cleaning system
- Publication number 20030200988
- Publication date Oct 30, 2003
- APPLIED MATERIALS, INC.
- Brian J. Brown
- B08 - CLEANING
Information Patent Application
Spin-rinse-dryer
- Publication number 20030079762
- Publication date May 1, 2003
- Anwar Husain
- H01 - BASIC ELECTRIC ELEMENTS

Anwar Husain

Person

Patents Grantslast 30 patents

Lift pin mechanism

Plasma resistant arc preventative coatings for manufacturing equipm...

Lift pin assembly

Sheath and temperature control of a process kit in a substrate proc...

Helical plug for reduction or prevention of arcing in a substrate s...

Methods and apparatus for reducing high voltage arcing in semicondu...

Temperature controlled secondary electrode for ion control at subst...

Methods and apparatus for dechucking wafers

Electrostatic chuck assembly having a dielectric filler

Edge ring assembly for a substrate support in a plasma processing c...

Electrostatic chuck assembly having a dielectric filler

Plasma processing chamber with a grounded electrode assembly

Confinement of foam delivered by a proximity head

Single substrate processing head for particle removal using low vis...

Method for using generator for foam to clean substrate

Wafer carrier drive apparatus and method for operating the same

Generator for foam to clean substrate

Apparatus for an optimized plasma chamber grounded electrode assembly

Spin-rinse-dryer

Semiconductor substrate cleaning system

Spin-rinse-dryer

Gripper for supporting substrate in a vertical orientation

Apparatus for transferring semiconductor substrates using an input...

Method and apparatus for controlling a temperature of a wafer

Controlling the temperature of a wafer by varying the pressure of g...

Method of in-situ cleaning of a chuck within a plasma chamber

Multilayered electrostatic chuck and method of manufacture thereof

Multilayered electrostatic chuck and method of manufacture thereof

Characterization, modeling, and design of an electrostatic chuck wi...

Patents Applicationslast 30 patents

PLASMA RESISTANT ARC PREVENTATIVE COATINGS FOR MANUFACTURING EQUPIM...

POROUS PLUG FOR ELECTROSTATIC CHUCK GAS DELIVERY

REPLACEABLE ELECTROSTATIC CHUCK OUTER RING FOR EDGE ARCING MITIGATION

LIFT PIN ASSEMBLY

LIFT PIN MECHANISM

SHEATH AND TEMPERATURE CONTROL OF A PROCESS KIT IN A SUBSTRATE PROC...

HELICAL PLUG FOR REDUCTION OR PREVENTION OF ARCING IN A SUBSTRATE S...

TEMPERATURE CONTROLLED SECONDARY ELECTRODE FOR ION CONTROL AT SUBST...

EDGE RING ASSEMBLY FOR A SUBSTRATE SUPPORT IN A PLASMA PROCESSING C...

APPARATUS FOR REDUCTION OR PREVENTION OF ARCING IN A SUBSTRATE SUPPORT

METHODS AND APPARATUS FOR REDUCING HIGH VOLTAGE ARCING IN SEMICONDU...

METHODS AND APPARATUS FOR DECHUCKING WAFERS

EDGE RING ASSEMBLY FOR A SUBSTRATE SUPPORT IN A PLASMA PROCESSING C...

ELECTROSTATIC CHUCK ASSEMBLY HAVING A DIELECTRIC FILLER

METHOD TO MODULATE THE WAFER EDGE SHEATH IN A PLASMA PROCESSING CHA...

Electrostatic Chuck Assembly Having A Dielectric Filler

ION IMPLANTER AND METHOD FOR ION IMPLANTATION

METHOD AND ION IMPLANTER FOR LOW TEMPERATURE IMPLANTATION

Plasma Processing Chamber With a Grounded Electrode Assembly

Methods for Confinement of Foam Delivered by a Proximity Head

Method for Using Generator for Foam to Clean Substrate

Wafer Carrier Drive Apparatus and Method for Operating the Same

Confinement of Foam Delivered by a Proximity Head

GENERATOR FOR FOAM TO CLEAN SUBSTRATE

SINGLE SUBSTRATE PROCESSING HEAD FOR PARTICLE REMOVAL USING LOW VIS...

SEMICONDUCTOR SUBSTRATE CLEANING SYSTEM

Apparatus for an optimized plasma chamber grounded electrode assembly

Semiconductor substrate cleaning system

Semiconductor substrate cleaning system

Spin-rinse-dryer