TREA

Arie Jeffrey Den Boef

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  • Waalre, NL
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Patents Applicationslast 30 patents

  • Information Patent Application

    METROLOGY METHOD, TARGET AND SUBSTRATE
    • Publication number 20190064677
    • Publication date Feb 28, 2019
    • ASML NETHERLANDS B.V.
    • Martin Jacobus Johan Jak
    • G02 - OPTICS
  • Information Patent Application

    Alignment system and method
    • Publication number 20080088956
    • Publication date Apr 17, 2008
    • ASML NETHERLANDS B.V.
    • Arie Jeffrey Den Boef
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Latent overlay metrology
    • Publication number 20060109463
    • Publication date May 25, 2006
    • ASML NETHERLANDS B.V.
    • Arie Jeffrey Den Boef
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Method and apparatus for angular-resolved spectroscopic lithography...
    • Publication number 20060066855
    • Publication date Mar 30, 2006
    • ASML NETHERLANDS B.V.
    • Arie Jeffrey Maria Den Boef
    • G01 - MEASURING TESTING
  • Information Patent Application

    Alignment system and method
    • Publication number 20060007446
    • Publication date Jan 12, 2006
    • ASML NETHERLANDS B.V.
    • Arie Jeffrey Den Boef
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Test pattern, inspection method, and device manufacturing method
    • Publication number 20040119970
    • Publication date Jun 24, 2004
    • Mircea Dusa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY