Arpan P. Mahorowala

Person

Bronxville, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chamfer-less via integration scheme
- Patent number 11,987,876
- Issue date May 21, 2024
- Lam Research Corporation
- Sivananda Krishnan Kanakasabapathy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of etch-stop layer for enhanced patterning
- Patent number 11,869,770
- Issue date Jan 9, 2024
- Lam Research Corporation
- Nagraj Shankar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 11,784,047
- Issue date Oct 10, 2023
- Lam Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 11,183,383
- Issue date Nov 23, 2021
- Lam Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of etch-stop layer for enhanced patterning
- Patent number 11,094,542
- Issue date Aug 17, 2021
- Lam Research Corporation
- Nagraj Shankar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 11,031,245
- Issue date Jun 8, 2021
- Lan Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of etch-stop layer for enhanced patterning
- Patent number 10,566,194
- Issue date Feb 18, 2020
- Lam Research Corporation
- Nagraj Shankar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High dry etch rate materials for semiconductor patterning applications
- Patent number 10,074,543
- Issue date Sep 11, 2018
- Lam Research Corporation
- Arpan Mahorowala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 9,824,893
- Issue date Nov 21, 2017
- Lam Research Corporation
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and structures for protecting one area while processing ano...
- Patent number 9,059,000
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Deok-kee Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process of making a lithographic structure using antireflective mat...
- Patent number 8,609,322
- Issue date Dec 17, 2013
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process of making a lithographic structure using antireflective mat...
- Patent number 8,293,454
- Issue date Oct 23, 2012
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process of making a semiconductor device using multiple antireflect...
- Patent number 7,968,270
- Issue date Jun 28, 2011
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective hardmask and uses thereof
- Patent number 7,648,820
- Issue date Jan 19, 2010
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for patterning features in semiconductor devices
- Patent number 7,545,041
- Issue date Jun 9, 2009
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and structures for protecting one area while processing ano...
- Patent number 7,497,959
- Issue date Mar 3, 2009
- International Business Machines Corporation
- Deok-kee Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of making a semiconductor device using multiple antireflect...
- Patent number 7,485,573
- Issue date Feb 3, 2009
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for multilayer photoresist dry development
- Patent number 7,344,991
- Issue date Mar 18, 2008
- Tokyo Electron Limited
- Vaidyanathan Balasubramaniam
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Antireflective composition and process of making a lithographic str...
- Patent number 7,326,442
- Issue date Feb 5, 2008
- International Business Machines Corporation
- Katherina E. Babich
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithographic antireflective hardmask compositions and uses thereof
- Patent number 7,223,517
- Issue date May 29, 2007
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Water and aqueous base soluble antireflective coating/hardmask mate...
- Patent number 7,175,966
- Issue date Feb 13, 2007
- International Business Machines Corporation
- Katherina E Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for etching a film stack
- Patent number 7,172,969
- Issue date Feb 6, 2007
- Tokyo Electron Limited
- Annie Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antireflective hardmask and uses thereof
- Patent number 7,172,849
- Issue date Feb 6, 2007
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch selectivity enhancement for tunable etch resistant anti-reflec...
- Patent number 7,077,903
- Issue date Jul 18, 2006
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for patterning features in semiconductor devices
- Patent number 7,030,008
- Issue date Apr 18, 2006
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Attenuated embedded phase shift photomask blanks
- Patent number 6,979,518
- Issue date Dec 27, 2005
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ plasma etch for TERA hard mask materials
- Patent number 6,903,023
- Issue date Jun 7, 2005
- International Business Machines Corporation
- Richard S. Wise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lateral-only photoresist trimming for sub-80 nm gate stack
- Patent number 6,869,899
- Issue date Mar 22, 2005
- International Business Machines Corporation
- Arpan P. Mahorowala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask integrated etch process for patterning of silicon oxide a...
- Patent number 6,869,542
- Issue date Mar 22, 2005
- International Business Machines Corporation
- Sadanand V. Desphande
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to prevent pattern collapse in features etched in sulfur dio...
- Patent number 6,849,389
- Issue date Feb 1, 2005
- International Business Machines Corporation
- Arpan P. Mahorowala
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATION OF FULLY ALIGNED VIA THROUGH SELECTIVE DEPOSITION AND R...
- Publication number 20240030062
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- Dennis M. Hausmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20240030031
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20220005694
- Publication date Jan 6, 2022
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF ETCH-STOP LAYER FOR ENHANCED PATTERNING
- Publication number 20210358753
- Publication date Nov 18, 2021
- LAM RESEARCH CORPORATION
- Nagraj Shankar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20210242019
- Publication date Aug 5, 2021
- LAM RESEARCH CORPORATION
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMFER-LESS VIA INTEGRATION SCHEME
- Publication number 20210017643
- Publication date Jan 21, 2021
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20200219725
- Publication date Jul 9, 2020
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF ETCH-STOP LAYER FOR ENHANCED PATTERNING
- Publication number 20200168466
- Publication date May 28, 2020
- LAM RESEARCH CORPORATION
- Nagraj Shankar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF ETCH-STOP LAYER FOR ENHANCED PATTERNING
- Publication number 20190341256
- Publication date Nov 7, 2019
- LAM RESEARCH CORPORATION
- Nagraj Shankar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METAL OXIDE SUBSTRATES USING ALE AND SELECTIVE DEPOSITION
- Publication number 20190131130
- Publication date May 2, 2019
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EUV PHOTOPATTERNING AND SELECTIVE DEPOSITION FOR NEGATIVE PATTERN MASK
- Publication number 20180308687
- Publication date Oct 25, 2018
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH DRY ETCH RATE MATERIALS FOR SEMICONDUCTOR PATTERNING APPLICATIONS
- Publication number 20180061650
- Publication date Mar 1, 2018
- LAM RESEARCH CORPORATION
- Arpan Mahorowala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20180012759
- Publication date Jan 11, 2018
- LAM RESEARCH CORPORATION
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...
- Publication number 20130017486
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...
- Publication number 20090061355
- Publication date Mar 5, 2009
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS OF MAKING A SEMICONDUCTOR DEVICE USING MULTIPLE ANTIREFLECT...
- Publication number 20080311508
- Publication date Dec 18, 2008
- INTERNATION BUSINESS MACHINES CORPORATION
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and structures for protecting one area while processing ano...
- Publication number 20080261128
- Publication date Oct 23, 2008
- Deok-kee Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Techniques for Patterning Features in Semiconductor Devices
- Publication number 20080187731
- Publication date Aug 7, 2008
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for multilayer photoresist dry development
- Publication number 20080128388
- Publication date Jun 5, 2008
- TOKYO ELECTRON LIMITED
- Vaidyanathan BALASUBRAMANIAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process of making a semiconductor device using multiple antireflect...
- Publication number 20070196748
- Publication date Aug 23, 2007
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective Hardmask and Uses Thereof
- Publication number 20070105363
- Publication date May 10, 2007
- International Business Machines Corporation
- Katherina E. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process of making a lithographic structure using antireflective mat...
- Publication number 20070015082
- Publication date Jan 18, 2007
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective composition and process of making a lithographic str...
- Publication number 20070015083
- Publication date Jan 18, 2007
- International Business Machines Corporation
- Katherina E. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REDUCING FEATURE LINE EDGE ROUGHNESS
- Publication number 20060154184
- Publication date Jul 13, 2006
- International Business Machines Corporation
- Arpan P. Mahorowala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Techniques for patterning features in semiconductor devices
- Publication number 20060118785
- Publication date Jun 8, 2006
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for etching a gate stack
- Publication number 20060049139
- Publication date Mar 9, 2006
- TOKYO ELECTRON LIMITED
- Annie Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for etching a film stack
- Publication number 20060051964
- Publication date Mar 9, 2006
- TOKYO ELECTRON LIMITED
- Annie Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND STRUCTURES FOR PROTECTING ONE AREA WHILE PROCESSING ANO...
- Publication number 20050255386
- Publication date Nov 17, 2005
- International Business Machines Corporation
- Deok-kee Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for etching an organic layer
- Publication number 20050136666
- Publication date Jun 23, 2005
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch selectivity enhancement for tunable etch resistant anti-reflec...
- Publication number 20050098091
- Publication date May 12, 2005
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS

Arpan P. Mahorowala

Person

Patents Grantslast 30 patents

Chamfer-less via integration scheme

Selective deposition of etch-stop layer for enhanced patterning

Tin oxide thin film spacers in semiconductor device manufacturing

Tin oxide thin film spacers in semiconductor device manufacturing

Selective deposition of etch-stop layer for enhanced patterning

Tin oxide thin film spacers in semiconductor device manufacturing

Selective deposition of etch-stop layer for enhanced patterning

High dry etch rate materials for semiconductor patterning applications

Tin oxide thin film spacers in semiconductor device manufacturing

Methods and structures for protecting one area while processing ano...

Process of making a lithographic structure using antireflective mat...

Process of making a lithographic structure using antireflective mat...

Process of making a semiconductor device using multiple antireflect...

Antireflective hardmask and uses thereof

Techniques for patterning features in semiconductor devices

Methods and structures for protecting one area while processing ano...

Process of making a semiconductor device using multiple antireflect...

Method and apparatus for multilayer photoresist dry development

Antireflective composition and process of making a lithographic str...

Lithographic antireflective hardmask compositions and uses thereof

Water and aqueous base soluble antireflective coating/hardmask mate...

Method and system for etching a film stack

Antireflective hardmask and uses thereof

Etch selectivity enhancement for tunable etch resistant anti-reflec...

Techniques for patterning features in semiconductor devices

Attenuated embedded phase shift photomask blanks

In-situ plasma etch for TERA hard mask materials

Lateral-only photoresist trimming for sub-80 nm gate stack

Hard mask integrated etch process for patterning of silicon oxide a...

Method to prevent pattern collapse in features etched in sulfur dio...

Patents Applicationslast 30 patents

INTEGRATION OF FULLY ALIGNED VIA THROUGH SELECTIVE DEPOSITION AND R...

TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING

TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING

SELECTIVE DEPOSITION OF ETCH-STOP LAYER FOR ENHANCED PATTERNING

TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING

CHAMFER-LESS VIA INTEGRATION SCHEME

TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING

SELECTIVE DEPOSITION OF ETCH-STOP LAYER FOR ENHANCED PATTERNING

SELECTIVE DEPOSITION OF ETCH-STOP LAYER FOR ENHANCED PATTERNING

ETCHING METAL OXIDE SUBSTRATES USING ALE AND SELECTIVE DEPOSITION

EUV PHOTOPATTERNING AND SELECTIVE DEPOSITION FOR NEGATIVE PATTERN MASK

HIGH DRY ETCH RATE MATERIALS FOR SEMICONDUCTOR PATTERNING APPLICATIONS

TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING

PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...

PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...

PROCESS OF MAKING A SEMICONDUCTOR DEVICE USING MULTIPLE ANTIREFLECT...

Methods and structures for protecting one area while processing ano...

Techniques for Patterning Features in Semiconductor Devices

Method and apparatus for multilayer photoresist dry development

Process of making a semiconductor device using multiple antireflect...

Antireflective Hardmask and Uses Thereof

Process of making a lithographic structure using antireflective mat...

Antireflective composition and process of making a lithographic str...

METHOD FOR REDUCING FEATURE LINE EDGE ROUGHNESS

Techniques for patterning features in semiconductor devices

Method and system for etching a gate stack

Method and system for etching a film stack

METHODS AND STRUCTURES FOR PROTECTING ONE AREA WHILE PROCESSING ANO...

Method and apparatus for etching an organic layer

Etch selectivity enhancement for tunable etch resistant anti-reflec...