Asao Yamashita

Person

Hopewell Junction, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 8,251,011
- Issue date Aug 28, 2012
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating metal gate structures using Lithography-Etch-Lithography-E...
- Patent number 8,183,062
- Issue date May 22, 2012
- Tokyo Electron Limited
- Merritt Funk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for performing a chemical oxide removal process
- Patent number 8,175,736
- Issue date May 8, 2012
- Tokyo Electron Limited
- Masayuki Tomoyasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Creating multi-layer/multi-input/multi-output (MLMIMO) models for m...
- Patent number 8,019,458
- Issue date Sep 13, 2011
- Tokyo Electron Limited
- Merritt Funk
- G05 - CONTROLLING REGULATING
Information Patent Grant
Multi-layer/multi-input/multi-output (MLMIMO) models and method for...
- Patent number 7,967,995
- Issue date Jun 28, 2011
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for spacer-optimization (S-O)
- Patent number 7,939,450
- Issue date May 10, 2011
- Tokyo Electron Limited
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for conditioning a process chamber
- Patent number 7,906,032
- Issue date Mar 15, 2011
- Tokyo Electron Limited
- Asao Yamashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for creating a gate optimization evaluation li...
- Patent number 7,899,637
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Asao Yamashita
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Using Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models for meta...
- Patent number 7,894,927
- Issue date Feb 22, 2011
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for performing a chemical oxide removal process
- Patent number 7,877,161
- Issue date Jan 25, 2011
- Tokyo Electron Limited
- Masayuki Tomoyasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for changing the optical properties of resists
- Patent number 7,763,404
- Issue date Jul 27, 2010
- Tokyo Electron Limited
- James E. Willis
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for creating a Spacer-Optimization (S-O) library
- Patent number 7,765,077
- Issue date Jul 27, 2010
- Tokyo Electron Limited
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for optimizing a gate channel
- Patent number 7,713,758
- Issue date May 11, 2010
- Tokyo Electon Limited
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,527,016
- Issue date May 5, 2009
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iso/nested control for soft mask processing
- Patent number 7,328,418
- Issue date Feb 5, 2008
- Tokyo Electron Limited
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formula-based run-to-run control
- Patent number 7,292,906
- Issue date Nov 6, 2007
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iso/nested cascading trim control with model feedback updates
- Patent number 7,209,798
- Issue date Apr 24, 2007
- Tokyo Electron Limited
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system and method for chemically treating a TERA layer
- Patent number 7,097,779
- Issue date Aug 29, 2006
- Tokyo Electron Limited
- Aelan Mosden
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for etching a mask
- Patent number 6,893,975
- Issue date May 17, 2005
- Tokyo Electron Limited
- Hongyu Yue
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR PERFORMING A CHEMICAL OXIDE REMOVAL PROCESS
- Publication number 20110307089
- Publication date Dec 15, 2011
- TOKYO ELECTRON LIMITED
- Masayuki TOMOYASU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Creating Metal Gate Structures Using Lithography-Etch-Lithography-E...
- Publication number 20100214545
- Publication date Aug 26, 2010
- TOKYO ELECTRON LIMITED
- Merritt Funk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Creating Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models for M...
- Publication number 20100036514
- Publication date Feb 11, 2010
- TOKYO ELECTRON LIMITED
- Merritt Funk
- G05 - CONTROLLING REGULATING
Information Patent Application
Using Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models for Meta...
- Publication number 20100036518
- Publication date Feb 11, 2010
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models and Method for...
- Publication number 20090242513
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Spacer-Optimization (S-O)
- Publication number 20090081815
- Publication date Mar 26, 2009
- TOKYO ELECTRON LIMITED
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Creating a Spacer-Optimization (S-O) Library
- Publication number 20090082983
- Publication date Mar 26, 2009
- TOKYO ELECTRON LIMITED
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Optimizing a Gate Channel
- Publication number 20080311687
- Publication date Dec 18, 2008
- TOKYO ELECTRON LIMITED
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Creating a Gate Optimization Evaluation Li...
- Publication number 20080311688
- Publication date Dec 18, 2008
- TOKYO ELECTRON LIMITED
- Asao Yamashita
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR ETCHING A HAFNIUM CONTAINING MATERIAL
- Publication number 20080217294
- Publication date Sep 11, 2008
- TOKYO ELECTRON LIMITED
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CHANGING THE OPTICAL PROPERTIES OF RESISTS
- Publication number 20080076045
- Publication date Mar 27, 2008
- TOKYO ELECTRON LIMITED
- James E. Willis
- G01 - MEASURING TESTING
Information Patent Application
Method for conditioning a process chamber
- Publication number 20070238199
- Publication date Oct 11, 2007
- TOKYO ELECTRON LIMITED
- Asao Yamashita
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20070236148
- Publication date Oct 11, 2007
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing system and method for chemically treating a tera layer
- Publication number 20060254716
- Publication date Nov 16, 2006
- TOKYO ELECTRON LIMITED
- Aelan Mosden
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Iso/nested control for soft mask processing
- Publication number 20060195218
- Publication date Aug 31, 2006
- TOKYO ELECTRON LIMITED
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Iso/nested cascading trim control with model feedback updates
- Publication number 20060064193
- Publication date Mar 23, 2006
- TOKYO ELECTRON LIMITED
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Formula-based run-to-run control
- Publication number 20060015206
- Publication date Jan 19, 2006
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing system and method for chemically treating a tera layer
- Publication number 20060006136
- Publication date Jan 12, 2006
- TOKYO ELECTRON LIMITED
- Aelan Mosden
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing system and method for treating a substrate
- Publication number 20050227494
- Publication date Oct 13, 2005
- TOKYO ELECTRON LIMITED
- Fumihiko Higuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for etching a mask
- Publication number 20050221619
- Publication date Oct 6, 2005
- TOKYO ELECTRON LIMITED
- Hongyu Yue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of operating a system for chemical oxide removal
- Publication number 20040185583
- Publication date Sep 23, 2004
- TOKYO ELECTRON LIMITED
- Masayuki Tomoyasu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Plasma processing apparatus
- Publication number 20040035365
- Publication date Feb 26, 2004
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS

Asao Yamashita

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Creating metal gate structures using Lithography-Etch-Lithography-E...

Method and system for performing a chemical oxide removal process

Creating multi-layer/multi-input/multi-output (MLMIMO) models for m...

Multi-layer/multi-input/multi-output (MLMIMO) models and method for...

Method and apparatus for spacer-optimization (S-O)

Method for conditioning a process chamber

Method and apparatus for creating a gate optimization evaluation li...

Using Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models for meta...

Method and system for performing a chemical oxide removal process

Methods and apparatus for changing the optical properties of resists

Method and apparatus for creating a Spacer-Optimization (S-O) library

Method and apparatus for optimizing a gate channel

Plasma processing apparatus

Iso/nested control for soft mask processing

Formula-based run-to-run control

Iso/nested cascading trim control with model feedback updates

Processing system and method for chemically treating a TERA layer

System and method for etching a mask

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR PERFORMING A CHEMICAL OXIDE REMOVAL PROCESS

Creating Metal Gate Structures Using Lithography-Etch-Lithography-E...

Creating Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models for M...

Using Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models for Meta...

Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models and Method for...

Method and Apparatus for Spacer-Optimization (S-O)

Method and Apparatus for Creating a Spacer-Optimization (S-O) Library

Method and Apparatus for Optimizing a Gate Channel

Method and Apparatus for Creating a Gate Optimization Evaluation Li...

METHOD AND SYSTEM FOR ETCHING A HAFNIUM CONTAINING MATERIAL

METHODS AND APPARATUS FOR CHANGING THE OPTICAL PROPERTIES OF RESISTS

Method for conditioning a process chamber

PLASMA PROCESSING APPARATUS

Processing system and method for chemically treating a tera layer

Iso/nested control for soft mask processing

Iso/nested cascading trim control with model feedback updates

Formula-based run-to-run control

Processing system and method for chemically treating a tera layer

Processing system and method for treating a substrate

System and method for etching a mask

Method of operating a system for chemical oxide removal

Plasma processing apparatus