Atif Noori

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for depositing fluorine/carbon-free conformal tungsten
- Patent number 11,887,855
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing fluorine/carbon-free conformal tungsten
- Patent number 10,985,023
- Issue date Apr 20, 2021
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of films comprising aluminum alloys with high aluminum c...
- Patent number 9,683,287
- Issue date Jun 20, 2017
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-limiting chemical vapor deposition and atomic layer deposition...
- Patent number 9,607,920
- Issue date Mar 28, 2017
- Applied Materials, Inc.
- Mary Edmonds
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing fluorine/carbon-free conformal tungsten
- Patent number 9,601,339
- Issue date Mar 21, 2017
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Accelerated relaxation of strain-relaxed epitaxial buffers by use o...
- Patent number 9,443,728
- Issue date Sep 13, 2016
- Applied Materials, Inc.
- Swaminathan T. Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices including metal-silicon contacts using indium arsenide film...
- Patent number 9,441,298
- Issue date Sep 13, 2016
- Applied Materials, Inc.
- Khaled Z. Ahmed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-limiting chemical vapor deposition and atomic layer deposition...
- Patent number 9,305,780
- Issue date Apr 5, 2016
- Applied Materials, Inc.
- Mary Edmonds
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of fabricating dielectric films from metal amidinate precur...
- Patent number 9,269,574
- Issue date Feb 23, 2016
- Applied Materials, Inc.
- Steven Hung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
N-metal film deposition with initiation layer
- Patent number 9,269,584
- Issue date Feb 23, 2016
- Applied Materials, Inc.
- Seshadri Ganguli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing fluorine/carbon-free conformal tungsten
- Patent number 9,230,815
- Issue date Jan 5, 2016
- Appled Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Devices including metal-silicon contacts using indium arsenide film...
- Patent number 9,190,320
- Issue date Nov 17, 2015
- Applied Materials, Inc.
- Khaled Z. Ahmed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of N-metal films comprising aluminum alloys
- Patent number 9,145,612
- Issue date Sep 29, 2015
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition methods for metal gate electrodes
- Patent number 9,082,702
- Issue date Jul 14, 2015
- Applied Materials, Inc.
- Yu Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for manufacturing metal gates
- Patent number 8,987,080
- Issue date Mar 24, 2015
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for manufacturing high dielectric constant films
- Patent number 8,927,438
- Issue date Jan 6, 2015
- Applied Materials, Inc.
- Hyungjun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of metal films using alane-based precursors
- Patent number 8,927,059
- Issue date Jan 6, 2015
- Applied Materials, Inc.
- Xinliang Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
N-metal film deposition with initiation layer
- Patent number 8,895,443
- Issue date Nov 25, 2014
- Applied Materials, Inc.
- Seshadri Ganguli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping aluminum in tantalum silicide
- Patent number 8,592,305
- Issue date Nov 26, 2013
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming flash memory with ultraviolet treatment
- Patent number 8,501,568
- Issue date Aug 6, 2013
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a non-volatile memory having a silicon nitride ch...
- Patent number 8,252,653
- Issue date Aug 28, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming non-volatile memory having charge trap layer with...
- Patent number 7,816,205
- Issue date Oct 19, 2010
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten
- Publication number 20210225655
- Publication date Jul 22, 2021
- Applied Materials, Inc.
- Xinyu Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten
- Publication number 20170194156
- Publication date Jul 6, 2017
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-LIMITING CHEMICAL VAPOR DEPOSITION AND ATOMIC LAYER DEPOSITION...
- Publication number 20160190030
- Publication date Jun 30, 2016
- Applied Materials, Inc.
- Mary EDMONDS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten
- Publication number 20160104624
- Publication date Apr 14, 2016
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Devices Including Metal-Silicon Contacts Using Indium Arsenide Film...
- Publication number 20160068962
- Publication date Mar 10, 2016
- Applied Materials, Inc.
- Khaled Z. Ahmed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-LIMITING CHEMICAL VAPOR DEPOSITION AND ATOMIC LAYER DEPOSITION...
- Publication number 20150162182
- Publication date Jun 11, 2015
- Applied Materials, Inc.
- Mary EDMONDS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACCELERATED RELAXATION OF STRAIN-RELAXED EPITAXIAL BUFFERS BY USE O...
- Publication number 20150050753
- Publication date Feb 19, 2015
- Applied Materials, Inc.
- Swaminathan T. SRINIVASAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING FLUORINE/CARBON-FREE CONFORMAL TUNGSTEN
- Publication number 20140120723
- Publication date May 1, 2014
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition Of Films Comprising Aluminum Alloys With High Aluminum C...
- Publication number 20140112824
- Publication date Apr 24, 2014
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition Of N-Metal Films Comprising Aluminum Alloys
- Publication number 20140017408
- Publication date Jan 16, 2014
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods For Manufacturing Metal Gates
- Publication number 20130295759
- Publication date Nov 7, 2013
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Fabricating Dielectric Films From Metal Amidinate Precur...
- Publication number 20130288427
- Publication date Oct 31, 2013
- Steven Hung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Atomic Layer Deposition Methods For Metal Gate Electrodes
- Publication number 20130221445
- Publication date Aug 29, 2013
- Yu Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Devices Including Metal-Silicon Contacts Using Indium Arsenide Film...
- Publication number 20130200518
- Publication date Aug 8, 2013
- Khaled Z. Ahmed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Doping aluminum in tantalum silicide
- Publication number 20130122697
- Publication date May 16, 2013
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF METAL FILMS USING ALANE-BASED PRECURSORS
- Publication number 20130115383
- Publication date May 9, 2013
- Xinliang Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
N-Metal Film Deposition With Initiation Layer
- Publication number 20120322250
- Publication date Dec 20, 2012
- Applied Materials, Inc.
- Seshadri Ganguli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
N-Metal Film Deposition With Initiation Layer
- Publication number 20120322262
- Publication date Dec 20, 2012
- Applied Materials, Inc.
- Seshadri Ganguli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Manufacturing High Dielectric Constant Films
- Publication number 20120270409
- Publication date Oct 25, 2012
- Applied Materials, Inc.
- Hyungjun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dry Chemical Cleaning For Semiconductor Processing
- Publication number 20120220116
- Publication date Aug 30, 2012
- Applied Materials, Inc.
- Atif Noori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NON-VOLATILE MEMORY HAVING SILICON NITRIDE CHARGE TRAP LAYER
- Publication number 20100096687
- Publication date Apr 22, 2010
- APPLIED MATERIALS, INC.
- Mihaela BALSEANU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-VOLATILE MEMORY HAVING CHARGE TRAP LAYER WITH COMPOSITIONAL GRA...
- Publication number 20100096688
- Publication date Apr 22, 2010
- APPLIED MATERIALS, INC.
- Mihaela BALSEANU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLASH MEMORY WITH TREATED CHARGE TRAP LAYER
- Publication number 20100099247
- Publication date Apr 22, 2010
- Applied Materials Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UV CURING OF PECVD-DEPOSITED SACRIFICIAL POLYMER FILMS FOR AIR-GAP ILD
- Publication number 20080182403
- Publication date Jul 31, 2008
- ATIF NOORI
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Methods for depositing fluorine/carbon-free conformal tungsten

Methods for depositing fluorine/carbon-free conformal tungsten

Deposition of films comprising aluminum alloys with high aluminum c...

Self-limiting chemical vapor deposition and atomic layer deposition...

Methods for depositing fluorine/carbon-free conformal tungsten

Accelerated relaxation of strain-relaxed epitaxial buffers by use o...

Devices including metal-silicon contacts using indium arsenide film...

Self-limiting chemical vapor deposition and atomic layer deposition...

Methods of fabricating dielectric films from metal amidinate precur...

N-metal film deposition with initiation layer

Methods for depositing fluorine/carbon-free conformal tungsten

Devices including metal-silicon contacts using indium arsenide film...

Deposition of N-metal films comprising aluminum alloys

Atomic layer deposition methods for metal gate electrodes

Methods for manufacturing metal gates

Methods for manufacturing high dielectric constant films

Deposition of metal films using alane-based precursors

N-metal film deposition with initiation layer

Doping aluminum in tantalum silicide

Method of forming flash memory with ultraviolet treatment

Method of forming a non-volatile memory having a silicon nitride ch...

Method of forming non-volatile memory having charge trap layer with...

Patents Applicationslast 30 patents

Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten

Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten

SELF-LIMITING CHEMICAL VAPOR DEPOSITION AND ATOMIC LAYER DEPOSITION...

Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten

Devices Including Metal-Silicon Contacts Using Indium Arsenide Film...

SELF-LIMITING CHEMICAL VAPOR DEPOSITION AND ATOMIC LAYER DEPOSITION...

ACCELERATED RELAXATION OF STRAIN-RELAXED EPITAXIAL BUFFERS BY USE O...

METHODS FOR DEPOSITING FLUORINE/CARBON-FREE CONFORMAL TUNGSTEN

Deposition Of Films Comprising Aluminum Alloys With High Aluminum C...

Deposition Of N-Metal Films Comprising Aluminum Alloys

Methods For Manufacturing Metal Gates

Methods Of Fabricating Dielectric Films From Metal Amidinate Precur...

Atomic Layer Deposition Methods For Metal Gate Electrodes

Devices Including Metal-Silicon Contacts Using Indium Arsenide Film...

Doping aluminum in tantalum silicide

DEPOSITION OF METAL FILMS USING ALANE-BASED PRECURSORS

N-Metal Film Deposition With Initiation Layer

N-Metal Film Deposition With Initiation Layer

Methods For Manufacturing High Dielectric Constant Films

Dry Chemical Cleaning For Semiconductor Processing

NON-VOLATILE MEMORY HAVING SILICON NITRIDE CHARGE TRAP LAYER

NON-VOLATILE MEMORY HAVING CHARGE TRAP LAYER WITH COMPOSITIONAL GRA...

FLASH MEMORY WITH TREATED CHARGE TRAP LAYER

UV CURING OF PECVD-DEPOSITED SACRIFICIAL POLYMER FILMS FOR AIR-GAP ILD