Atsushi Gomi

Person

Rensselaer, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for reducing particle contamination in a depos...
- Patent number 8,268,078
- Issue date Sep 18, 2012
- Tokyo Electron Limited
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for introducing a precursor gas to a vapor deposition system
- Patent number 7,892,358
- Issue date Feb 22, 2011
- Tokyo Electron Limited
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for reducing carbon monoxide poisoning in a thin film deposi...
- Patent number 7,858,522
- Issue date Dec 28, 2010
- Tokyo Electron Limited
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition method for forming a film including metal, nitrogen and...
- Patent number 7,491,430
- Issue date Feb 17, 2009
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR THERMAL AND PLASMA ENHANCED VAPOR DEPOSITION AND METH...
- Publication number 20120315404
- Publication date Dec 13, 2012
- TOKYO ELECTRON LIMITED
- Yicheng Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERCONNECT STRUCTURES CONTAINING A RUTHENIUM BARRIER FILM AND MET...
- Publication number 20080237860
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film-Forming Method and Recording Medium
- Publication number 20080107825
- Publication date May 8, 2008
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR REDUCING CARBON MONOXIDE POISONING AT THE...
- Publication number 20070234955
- Publication date Oct 11, 2007
- TOKYO ELECTRON LIMITED
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR INITIATING A DEPOSITION PROCESS UTILIZING A M...
- Publication number 20070237895
- Publication date Oct 11, 2007
- TOKYO ELECTRON LIMITED
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM FOR INTRODUCING A PRECURSOR GAS TO A VAPOR DEPOSITION SYSTEM
- Publication number 20070234962
- Publication date Oct 11, 2007
- TOKYO ELECTRON LIMITED
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REDUCING CARBON MONOXIDE POISONING IN A THIN FILM DEPOSI...
- Publication number 20070232040
- Publication date Oct 4, 2007
- TOKYO ELECTRON LIMITED
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR INTRODUCING A PRECURSOR GAS TO A VAPOR DEPOSITION SYSTEM
- Publication number 20070231489
- Publication date Oct 4, 2007
- TOKYO ELECTRON LIMITED
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for reducing particle formation in a vapor dis...
- Publication number 20070218200
- Publication date Sep 20, 2007
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for reducing particle contamination in a depos...
- Publication number 20070215048
- Publication date Sep 20, 2007
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for thermal and plasma enhanced vapor deposition and meth...
- Publication number 20070116873
- Publication date May 24, 2007
- TOKYO ELECTRON LIMITED
- Yicheng Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for thermal and plasma enhanced vapor deposition and meth...
- Publication number 20070116872
- Publication date May 24, 2007
- TOKYO ELECTRON LIMITED
- Yicheng Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming a tantalum-containing layer from a metalorganic p...
- Publication number 20070054047
- Publication date Mar 8, 2007
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming a tantalum-containing layer from a metalorganic p...
- Publication number 20070054046
- Publication date Mar 8, 2007
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition method
- Publication number 20060029748
- Publication date Feb 9, 2006
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film-forming method
- Publication number 20060008595
- Publication date Jan 12, 2006
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Atsushi Gomi

Person

Patents Grantslast 30 patents

Method and apparatus for reducing particle contamination in a depos...

System for introducing a precursor gas to a vapor deposition system

Method for reducing carbon monoxide poisoning in a thin film deposi...

Deposition method for forming a film including metal, nitrogen and...

Patents Applicationslast 30 patents

APPARATUS FOR THERMAL AND PLASMA ENHANCED VAPOR DEPOSITION AND METH...

INTERCONNECT STRUCTURES CONTAINING A RUTHENIUM BARRIER FILM AND MET...

Film-Forming Method and Recording Medium

METHOD AND APPARATUS FOR REDUCING CARBON MONOXIDE POISONING AT THE...

METHOD AND SYSTEM FOR INITIATING A DEPOSITION PROCESS UTILIZING A M...

SYSTEM FOR INTRODUCING A PRECURSOR GAS TO A VAPOR DEPOSITION SYSTEM

METHOD FOR REDUCING CARBON MONOXIDE POISONING IN A THIN FILM DEPOSI...

METHOD FOR INTRODUCING A PRECURSOR GAS TO A VAPOR DEPOSITION SYSTEM

Method and apparatus for reducing particle formation in a vapor dis...

Method and apparatus for reducing particle contamination in a depos...

Apparatus for thermal and plasma enhanced vapor deposition and meth...

Apparatus for thermal and plasma enhanced vapor deposition and meth...

Method of forming a tantalum-containing layer from a metalorganic p...

Method of forming a tantalum-containing layer from a metalorganic p...

Deposition method

Film-forming method