Baorui Yang

Person

Pflugerville, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method to recover the exposure sensitivity of chemically amplified...
- Patent number 7,977,017
- Issue date Jul 12, 2011
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle constructions
- Patent number 7,910,270
- Issue date Mar 22, 2011
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to recover the exposure sensitivity of chemically amplified...
- Patent number 7,826,033
- Issue date Nov 2, 2010
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam lithography system
- Patent number 7,759,660
- Issue date Jul 20, 2010
- Micron Technology, Inc.
- Baorui Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming reticles
- Patent number 7,754,399
- Issue date Jul 13, 2010
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for quartz bump defect repair with less substrate damage
- Patent number 7,569,314
- Issue date Aug 4, 2009
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming reticles
- Patent number 7,556,897
- Issue date Jul 7, 2009
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming reticles
- Patent number 7,442,472
- Issue date Oct 28, 2008
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming reticles
- Patent number 7,432,025
- Issue date Oct 7, 2008
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for quartz bump defect repair with less substrate damage
- Patent number 7,309,549
- Issue date Dec 18, 2007
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to recover the exposure sensitivity of chemically amplified...
- Patent number 7,258,954
- Issue date Aug 21, 2007
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to recover the exposure sensitivity of chemically amplified...
- Patent number 7,229,725
- Issue date Jun 12, 2007
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for improving angled line feature accuracy and throughput u...
- Patent number 7,229,742
- Issue date Jun 12, 2007
- Micron Technology, Inc.
- Baorui Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for improving angled line feature accuracy and throughput u...
- Patent number 7,226,723
- Issue date Jun 5, 2007
- Micron Technology, Inc.
- Baorui Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to recover the exposure sensitivity of chemically amplified...
- Patent number 7,147,973
- Issue date Dec 12, 2006
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for quartz bump defect repair with less substrate damage
- Patent number 6,933,081
- Issue date Aug 23, 2005
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of patterning materials; and photomasks
- Patent number 6,723,476
- Issue date Apr 20, 2004
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a circuitry fabrication mask having a subtractive...
- Patent number 6,534,223
- Issue date Mar 18, 2003
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction of charging effect and carbon deposition caused by electr...
- Patent number 6,525,317
- Issue date Feb 25, 2003
- Micron Technology Inc.
- Baorui Yang
- G01 - MEASURING TESTING
Information Patent Grant
Method for repairing MoSi attenuated phase shift masks
- Patent number 6,447,962
- Issue date Sep 10, 2002
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to accurately correlate defect coordinates bet...
- Patent number 6,373,976
- Issue date Apr 16, 2002
- Micron Technology, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and apparatus for detecting defects on photomasks
- Patent number 6,297,879
- Issue date Oct 2, 2001
- Micron Technology, Inc.
- Baorui Yang
- G01 - MEASURING TESTING
Information Patent Grant
Method for repairing bump and divot defects in a phase shifting mask
- Patent number 6,291,115
- Issue date Sep 18, 2001
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for repairing MoSi attenuated phase shift masks
- Patent number 6,277,526
- Issue date Aug 21, 2001
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for repairing phase shifting masks
- Patent number 6,114,073
- Issue date Sep 5, 2000
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to accurately correlate defect coordinates bet...
- Patent number 6,106,980
- Issue date Aug 22, 2000
- Micron Technology, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for repairing bump and divot defects in a phase shifting mask
- Patent number 6,103,430
- Issue date Aug 15, 2000
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for repairing alternating phase shifting masks
- Patent number 6,096,459
- Issue date Aug 1, 2000
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to accurately correlate defect coordinates between photomask...
- Patent number 6,037,087
- Issue date Mar 14, 2000
- Micron Technology, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing the carbon halo caused by FIB clear defect repa...
- Patent number 6,030,731
- Issue date Feb 29, 2000
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method to Recover the Exposure Sensitivity of Chemically Amplified...
- Publication number 20110045389
- Publication date Feb 24, 2011
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle Constructions
- Publication number 20100248093
- Publication date Sep 30, 2010
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of Forming Reticles
- Publication number 20090239162
- Publication date Sep 24, 2009
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of Forming Reticles
- Publication number 20080305413
- Publication date Dec 11, 2008
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for improving angled line feature accuracy and throughput u...
- Publication number 20070102651
- Publication date May 10, 2007
- Baorui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for quartz bump defect repair with less substrate damage
- Publication number 20070105027
- Publication date May 10, 2007
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for improving angled line feature accuracy and throughput u...
- Publication number 20070003874
- Publication date Jan 4, 2007
- Baorui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method to recover the exposure sensitivity of chemically amplified...
- Publication number 20060269853
- Publication date Nov 30, 2006
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method to recover the exposure sensitivity of chemically amplified...
- Publication number 20060269852
- Publication date Nov 30, 2006
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of forming reticles
- Publication number 20060234142
- Publication date Oct 19, 2006
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of forming mask patterns, methods of correcting feature dim...
- Publication number 20060183025
- Publication date Aug 17, 2006
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle constructions and methods of forming reticles
- Publication number 20060035156
- Publication date Feb 16, 2006
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for improving angled line feature accuracy and throughput u...
- Publication number 20050233227
- Publication date Oct 20, 2005
- Baorui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method to recover the exposure sensitivity of chemically amplified...
- Publication number 20050170266
- Publication date Aug 4, 2005
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for quartz bump defect repair with less substrate damage
- Publication number 20040202944
- Publication date Oct 14, 2004
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method to recover the exposure sensitivity of chemically amplified...
- Publication number 20040185349
- Publication date Sep 23, 2004
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for quartz bump defect repair with less substrate damage
- Publication number 20030215721
- Publication date Nov 20, 2003
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of patterning materials; and photomasks
- Publication number 20030027056
- Publication date Feb 6, 2003
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for repairing MoSi attenuated phase shifting masks
- Publication number 20010028045
- Publication date Oct 11, 2001
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Baorui Yang

Person

Patents Grantslast 30 patents

Method to recover the exposure sensitivity of chemically amplified...

Reticle constructions

Method to recover the exposure sensitivity of chemically amplified...

Electron beam lithography system

Methods of forming reticles

Method for quartz bump defect repair with less substrate damage

Methods of forming reticles

Methods of forming reticles

Methods of forming reticles

Method for quartz bump defect repair with less substrate damage

Method to recover the exposure sensitivity of chemically amplified...

Method to recover the exposure sensitivity of chemically amplified...

Methods for improving angled line feature accuracy and throughput u...

Methods for improving angled line feature accuracy and throughput u...

Method to recover the exposure sensitivity of chemically amplified...

Method for quartz bump defect repair with less substrate damage

Methods of patterning materials; and photomasks

Method of forming a circuitry fabrication mask having a subtractive...

Reduction of charging effect and carbon deposition caused by electr...

Method for repairing MoSi attenuated phase shift masks

Method and apparatus to accurately correlate defect coordinates bet...

Inspection method and apparatus for detecting defects on photomasks

Method for repairing bump and divot defects in a phase shifting mask

Method for repairing MoSi attenuated phase shift masks

Method for repairing phase shifting masks

Method and apparatus to accurately correlate defect coordinates bet...

Method for repairing bump and divot defects in a phase shifting mask

Method for repairing alternating phase shifting masks

Method to accurately correlate defect coordinates between photomask...

Method for removing the carbon halo caused by FIB clear defect repa...

Patents Applicationslast 30 patents

Method to Recover the Exposure Sensitivity of Chemically Amplified...

Reticle Constructions

Methods of Forming Reticles

Methods of Forming Reticles

Methods for improving angled line feature accuracy and throughput u...

Method for quartz bump defect repair with less substrate damage

Methods for improving angled line feature accuracy and throughput u...

Method to recover the exposure sensitivity of chemically amplified...

Method to recover the exposure sensitivity of chemically amplified...

Methods of forming reticles

Methods of forming mask patterns, methods of correcting feature dim...

Reticle constructions and methods of forming reticles

Methods for improving angled line feature accuracy and throughput u...

Method to recover the exposure sensitivity of chemically amplified...

Method for quartz bump defect repair with less substrate damage

Method to recover the exposure sensitivity of chemically amplified...

Method for quartz bump defect repair with less substrate damage

Methods of patterning materials; and photomasks

Method for repairing MoSi attenuated phase shifting masks