Rich Ferguson, IBM, Image Imbalance, Optical Extensions Workshop, Portland, Oregon (May 13-14, 1999) 18 pages. |
Christophe Pierrat et al., Phase-Shifting Mask Topography Effects on Lithographic Image Quality, SPIE vol. 1927 Optical/Laser Microlithography VI (1993) pp. 28-41. |
U.S. patent application Ser. No. 09/643,005, Winder et al., filed Aug. 21, 2000. |
Griesinger et al., Transmission & Phase Balancing of Alternating Phase Shifting Masks (5X)—Theoretical & Experimental Results, SPIE99 #3873-36, pp. 1-11 (1999). |