Barak Bringoltz

Person

Rishon Le Tzion, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Detecting outliers and anomalies for OCD metrology machine learning
- Patent number 12,038,271
- Issue date Jul 16, 2024
- Nova Ltd.
- Eitan A. Rothstein
- G01 - MEASURING TESTING
Information Patent Grant
System and method for controlling measurements of sample's parameters
- Patent number 11,874,606
- Issue date Jan 16, 2024
- Nova Ltd.
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Accuracy improvements in optical metrology
- Patent number 11,862,522
- Issue date Jan 2, 2024
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Machine and deep learning methods for spectra-based metrology and p...
- Patent number 11,815,819
- Issue date Nov 14, 2023
- Nova Ltd.
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology and process control for semiconductor manufacturing
- Patent number 11,763,181
- Issue date Sep 19, 2023
- Nova Ltd.
- Eitan Rothstein
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology and process control for semiconductor manufacturing
- Patent number 11,093,840
- Issue date Aug 17, 2021
- Nova Measuring Instruments Ltd.
- Eitan Rothstein
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of analyzing and utilizing landscapes to reduce or eliminate...
- Patent number 10,831,108
- Issue date Nov 10, 2020
- KLA Corporation
- Tal Marciano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Symmetric target design in scatterometry overlay metrology
- Patent number 10,591,406
- Issue date Mar 17, 2020
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Grant
Scanning in angle-resolved reflectometry and algorithmically elimin...
- Patent number 10,533,940
- Issue date Jan 14, 2020
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Estimating and eliminating inter-cell process variation inaccuracy
- Patent number 10,415,963
- Issue date Sep 17, 2019
- KLA-Tencor Corporation
- Tal Marciano
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Near field metrology
- Patent number 10,261,014
- Issue date Apr 16, 2019
- KLA-Tencor Corporation
- Noam Sapiens
- G02 - OPTICS
Information Patent Grant
Reflection symmetric scatterometry overlay targets and methods
- Patent number 10,234,280
- Issue date Mar 19, 2019
- KLA-Tencor Corporation
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Analyzing root causes of process variation in scatterometry metrology
- Patent number 10,203,200
- Issue date Feb 12, 2019
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Grant
Scanning in angle-resolved reflectometry and algorithmically elimin...
- Patent number 10,126,238
- Issue date Nov 13, 2018
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Scanning in angle-resolved reflectometry and algorithmically elimin...
- Patent number 9,958,385
- Issue date May 1, 2018
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Pupil plane calibration for scatterometry overlay measurement
- Patent number 9,909,982
- Issue date Mar 6, 2018
- KLA-Tencor Corporation
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Feed forward of metrology data in a metrology system
- Patent number 9,903,711
- Issue date Feb 27, 2018
- KLA-Tencor Corporation
- Ady Levy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Removing process-variation-related inaccuracies from scatterometry...
- Patent number 9,874,527
- Issue date Jan 23, 2018
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing algorithmic inaccuracy in scatterometry overlay metrology
- Patent number 9,869,543
- Issue date Jan 16, 2018
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Grant
Decreasing inaccuracy due to non-periodic effects on scatterometric...
- Patent number 9,851,300
- Issue date Dec 26, 2017
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Grant
Apodization for pupil imaging scatterometry
- Patent number 9,784,987
- Issue date Oct 10, 2017
- KLA-Tencor Corporation
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Symmetric target design in scatterometry overlay metrology
- Patent number 9,739,702
- Issue date Aug 22, 2017
- KLA-Tencor Corporation
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aperture alignment in scatterometry metrology systems
- Patent number 9,726,984
- Issue date Aug 8, 2017
- KLA-Tencor Corporation
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase characterization of targets
- Patent number 9,581,430
- Issue date Feb 28, 2017
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Apodization for pupil imaging scatterometry
- Patent number 9,091,650
- Issue date Jul 28, 2015
- KLA-Tencor Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
MACHINE AND DEEP LEARNING METHODS FOR SPECTRA-BASED METROLOGY AND P...
- Publication number 20240310737
- Publication date Sep 19, 2024
- NOVA LTD
- Barak BRINGOLTZ
- G05 - CONTROLLING REGULATING
Information Patent Application
METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20240078450
- Publication date Mar 7, 2024
- NOVA LTD
- EITAN ROTHSTEIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for controlling measurements of sample's parameters
- Publication number 20230185203
- Publication date Jun 15, 2023
- NOVA LTD
- Barak BRINGOLTZ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MACHINE AND DEEP LEARNING METHODS FOR SPECTRA-BASED METROLOGY AND P...
- Publication number 20230124431
- Publication date Apr 20, 2023
- NOVA LTD
- Barak BRINGOLTZ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMBINING PHYSICAL MODELING AND MACINE LEARNING
- Publication number 20230023634
- Publication date Jan 26, 2023
- NOVA LTD
- Barak BRINGOLTZ
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETECTING OUTLIERS AND ANOMALIES FOR OCD METROLOGY MACHINE LEARNING
- Publication number 20230017097
- Publication date Jan 19, 2023
- NOVA LTD
- EITAN A. ROTHSTEIN
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20220036218
- Publication date Feb 3, 2022
- NOVA LTD
- EITAN ROTHSTEIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY
- Publication number 20210175132
- Publication date Jun 10, 2021
- KLA-Tencor Corporation
- Barak Bringoltz
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20210150387
- Publication date May 20, 2021
- NOVA MEASURING INSTRUMENTS LTD.
- EITAN ROTHSTEIN
- G01 - MEASURING TESTING
Information Patent Application
Scanning in Angle-Resolved Reflectometry and Algorithmically Elimin...
- Publication number 20190094142
- Publication date Mar 28, 2019
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
SCANNING IN ANGLE-RESOLVED REFLECTOMETRY AND ALGORITHMICALLY ELIMIN...
- Publication number 20180106723
- Publication date Apr 19, 2018
- KLA-Tencor Corporation
- Amnon MANASSEN
- G01 - MEASURING TESTING
Information Patent Application
ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY
- Publication number 20180047646
- Publication date Feb 15, 2018
- KLA-Tencor Corporation
- Barak Bringoltz
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Analyzing Root Causes of Process Variation in Scatterometry Metrology
- Publication number 20180023950
- Publication date Jan 25, 2018
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF ANALYZING AND UTILIZING LANDSCAPES TO REDUCE OR ELIMINAT...
- Publication number 20160313658
- Publication date Oct 27, 2016
- KLA-Tencor Corporation
- Tal Marciano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Feed Forward of Metrology Data in a Metrology System
- Publication number 20160290796
- Publication date Oct 6, 2016
- KLA-Tencor Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY
- Publication number 20160216197
- Publication date Jul 28, 2016
- KLA-Tencor Corporation
- Barak Bringoltz
- G02 - OPTICS
Information Patent Application
REMOVING PROCESS-VARIATION-RELATED INACCURACIES FROM SCATTEROMETRY...
- Publication number 20150316490
- Publication date Nov 5, 2015
- KLA-Tencor Corporation
- Eran Amit
- G01 - MEASURING TESTING
Information Patent Application
Apodization for Pupil Imaging Scatterometry
- Publication number 20150316783
- Publication date Nov 5, 2015
- KLA-Tencor Corporation
- Andrew V. Hill
- G02 - OPTICS
Information Patent Application
ESTIMATING AND ELIMINATING INTER-CELL PROCESS VARIATION INACCURACY
- Publication number 20150292877
- Publication date Oct 15, 2015
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Application
REDUCING ALGORITHMIC INACCURACY IN SCATTEROMETRY OVERLAY METROLOGY
- Publication number 20150233705
- Publication date Aug 20, 2015
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Application
REFLECTION SYMMETRIC SCATTEROMETRY OVERLAY TARGETS AND METHODS
- Publication number 20150219449
- Publication date Aug 6, 2015
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Application
SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY
- Publication number 20150204664
- Publication date Jul 23, 2015
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Application
NEAR FIELD METROLOGY
- Publication number 20150198524
- Publication date Jul 16, 2015
- KLA-Tencor Corporation
- Noam Sapiens
- G01 - MEASURING TESTING
Information Patent Application
SCANNING IN ANGLE-RESOLVED REFLECTOMETRY AND ALGORITHMICALLY ELIMIN...
- Publication number 20150116717
- Publication date Apr 30, 2015
- KLA-Tencor Corporation
- Amnon MANASSEN
- G01 - MEASURING TESTING
Information Patent Application
APERTURE ALIGNMENT IN SCATTEROMETRY METROLOGY SYSTEMS
- Publication number 20150015883
- Publication date Jan 15, 2015
- KAL-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Application
PUPIL PLANE CALIBRATION FOR SCATTEROMETRY OVERLAY MEASUREMENT
- Publication number 20140257734
- Publication date Sep 11, 2014
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Application
Apodization for Pupil Imaging Scatterometry
- Publication number 20140146322
- Publication date May 29, 2014
- Andrew V. Hill
- G02 - OPTICS
Information Patent Application
ANALYTIC CONTINUATIONS TO THE CONTINUUM LIMIT IN NUMERICAL SIMULATI...
- Publication number 20140136164
- Publication date May 15, 2014
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Application
PHASE CHARACTERIZATION OF TARGETS
- Publication number 20140111791
- Publication date Apr 24, 2014
- Amnon Manassen
- G01 - MEASURING TESTING

Barak Bringoltz

Person

Patents Grantslast 30 patents

Detecting outliers and anomalies for OCD metrology machine learning

System and method for controlling measurements of sample's parameters

Accuracy improvements in optical metrology

Machine and deep learning methods for spectra-based metrology and p...

Metrology and process control for semiconductor manufacturing

Metrology and process control for semiconductor manufacturing

Method of analyzing and utilizing landscapes to reduce or eliminate...

Symmetric target design in scatterometry overlay metrology

Scanning in angle-resolved reflectometry and algorithmically elimin...

Estimating and eliminating inter-cell process variation inaccuracy

Near field metrology

Reflection symmetric scatterometry overlay targets and methods

Analyzing root causes of process variation in scatterometry metrology

Scanning in angle-resolved reflectometry and algorithmically elimin...

Scanning in angle-resolved reflectometry and algorithmically elimin...

Pupil plane calibration for scatterometry overlay measurement

Feed forward of metrology data in a metrology system

Removing process-variation-related inaccuracies from scatterometry...

Reducing algorithmic inaccuracy in scatterometry overlay metrology

Decreasing inaccuracy due to non-periodic effects on scatterometric...

Apodization for pupil imaging scatterometry

Symmetric target design in scatterometry overlay metrology

Aperture alignment in scatterometry metrology systems

Phase characterization of targets

Apodization for pupil imaging scatterometry

Patents Applicationslast 30 patents

MACHINE AND DEEP LEARNING METHODS FOR SPECTRA-BASED METROLOGY AND P...

METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING

System and method for controlling measurements of sample's parameters

MACHINE AND DEEP LEARNING METHODS FOR SPECTRA-BASED METROLOGY AND P...

COMBINING PHYSICAL MODELING AND MACINE LEARNING

DETECTING OUTLIERS AND ANOMALIES FOR OCD METROLOGY MACHINE LEARNING

METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING

ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY

METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING

Scanning in Angle-Resolved Reflectometry and Algorithmically Elimin...

SCANNING IN ANGLE-RESOLVED REFLECTOMETRY AND ALGORITHMICALLY ELIMIN...

ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY

Analyzing Root Causes of Process Variation in Scatterometry Metrology

METHODS OF ANALYZING AND UTILIZING LANDSCAPES TO REDUCE OR ELIMINAT...

Feed Forward of Metrology Data in a Metrology System

SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY

REMOVING PROCESS-VARIATION-RELATED INACCURACIES FROM SCATTEROMETRY...

Apodization for Pupil Imaging Scatterometry

ESTIMATING AND ELIMINATING INTER-CELL PROCESS VARIATION INACCURACY

REDUCING ALGORITHMIC INACCURACY IN SCATTEROMETRY OVERLAY METROLOGY

REFLECTION SYMMETRIC SCATTEROMETRY OVERLAY TARGETS AND METHODS

SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY

NEAR FIELD METROLOGY

SCANNING IN ANGLE-RESOLVED REFLECTOMETRY AND ALGORITHMICALLY ELIMIN...

APERTURE ALIGNMENT IN SCATTEROMETRY METROLOGY SYSTEMS

PUPIL PLANE CALIBRATION FOR SCATTEROMETRY OVERLAY MEASUREMENT

Apodization for Pupil Imaging Scatterometry

ANALYTIC CONTINUATIONS TO THE CONTINUUM LIMIT IN NUMERICAL SIMULATI...

PHASE CHARACTERIZATION OF TARGETS