Barton Lane

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 12,176,183
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 12,119,207
- Issue date Oct 15, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Parallel resonance antenna for radial plasma control
- Patent number 12,074,390
- Issue date Aug 27, 2024
- Tokyo Electron Limited
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 11,817,296
- Issue date Nov 14, 2023
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 11,600,474
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-localized and plasma uniformity control in a plasma processin...
- Patent number 11,551,909
- Issue date Jan 10, 2023
- Tokyo Electron Limited
- Barton G. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for VHF plasma processing
- Patent number 11,515,122
- Issue date Nov 29, 2022
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF measurement system and method
- Patent number 11,410,832
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for focus ring thickness determinations and fee...
- Patent number 11,393,663
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Merritt Funk
- G05 - CONTROLLING REGULATING
Information Patent Grant
Impedance matching apparatus and control method
- Patent number 11,348,761
- Issue date May 31, 2022
- Tokyo Electron Limited
- John Carroll
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical source with contained plasma
- Patent number 11,201,035
- Issue date Dec 14, 2021
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatuses including multiple electron sources
- Patent number 11,043,362
- Issue date Jun 22, 2021
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resonant structure for electron cyclotron resonant (ECR) plasma ion...
- Patent number 11,037,765
- Issue date Jun 15, 2021
- Tokyo Electron Limited
- Barton Lane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-limiting cyclic etch method for carbon-based films
- Patent number 11,037,798
- Issue date Jun 15, 2021
- Tokyo Electron Limited
- Barton G. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system with synchronized signal modulation
- Patent number 10,991,554
- Issue date Apr 27, 2021
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resonant structure for a plasma processing system
- Patent number 10,861,679
- Issue date Dec 8, 2020
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Facilitation of orthotopic patterns during substrate fabrication
- Patent number 10,459,334
- Issue date Oct 29, 2019
- Tokyo Electron Limited
- Barton G. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generation and control using a DC ring
- Patent number 10,354,841
- Issue date Jul 16, 2019
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for controlling plasma density
- Patent number 10,002,744
- Issue date Jun 19, 2018
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency (RF) power coupling system utilizing multiple RF po...
- Patent number 9,396,900
- Issue date Jul 19, 2016
- Tokyo Electron Limited
- Barton Lane
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radio frequency signal splitter and matcher
- Patent number 9,130,536
- Issue date Sep 8, 2015
- Tokyo Electron Limited
- Barton Lane
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Methods of electrical signaling in an ion energy analyzer
- Patent number 9,087,677
- Issue date Jul 21, 2015
- Tokyo Electron Limited
- Merritt Funk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ion energy analyzer
- Patent number 8,847,159
- Issue date Sep 30, 2014
- Tokyo Electron Limited
- Lee Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ion energy analyzer and methods of manufacturing the same
- Patent number 8,816,281
- Issue date Aug 26, 2014
- Tokyo Electron Limited
- Merritt Funk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Adaptive recipe selector
- Patent number 8,501,499
- Issue date Aug 6, 2013
- Tokyo Electron Limited
- Radha Sundararajan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR PLASMA PROCESSING
- Publication number 20250014865
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Parallel Resonance Antenna for Radial Plasma Control
- Publication number 20240380114
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Antenna Plane Magnets for Improved Performance
- Publication number 20240258074
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Plasma Processing
- Publication number 20240213005
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU DIAGNOSIS OF PLASMA SYSTEM
- Publication number 20240203713
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Parallel Resonance Antenna for Radial Plasma Control
- Publication number 20240162619
- Publication date May 16, 2024
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20240038496
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing with Magnetic Ring X Point
- Publication number 20240038506
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Equipment and Method for Improved Edge Uniformity of Plasma Process...
- Publication number 20230402255
- Publication date Dec 14, 2023
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Plasma Processing
- Publication number 20230377845
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Edge Control During Plasma Processing
- Publication number 20230360889
- Publication date Nov 9, 2023
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING
- Publication number 20230282446
- Publication date Sep 7, 2023
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY (RF) SYSTEM WITH EMBEDDED RF SIGNAL PICKUPS
- Publication number 20230132660
- Publication date May 4, 2023
- TOKYO ELECTRON LIMITED
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Plasma Processing
- Publication number 20230054430
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Impedance Matching Apparatus and Control Method
- Publication number 20220076923
- Publication date Mar 10, 2022
- TOKYO ELECTRON LIMITED
- John Carroll
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20210407775
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20210407770
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Measurement System and Method
- Publication number 20210407771
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing System with Synchronized Signal Modulation
- Publication number 20210249226
- Publication date Aug 12, 2021
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUSES INCLUDING MULTIPLE ELECTRON SOURCES
- Publication number 20210082668
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CONTROL ENABLED VDC SENSOR FOR PLASMA PROCESS
- Publication number 20210013005
- Publication date Jan 14, 2021
- TOKYO ELECTRON LIMITED
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHODS FOR VHF PLASMA PROCESSING
- Publication number 20200303164
- Publication date Sep 24, 2020
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR FOCUS RING THICKNESS DETERMINATIONS AND FEE...
- Publication number 20200273678
- Publication date Aug 27, 2020
- TOKYO ELECTRON LIMITED
- Merritt Funk
- G05 - CONTROLLING REGULATING
Information Patent Application
RESONANT STRUCTURE FOR ELECTRON CYCLOTRON RESONANT (ECR) PLASMA ION...
- Publication number 20200013594
- Publication date Jan 9, 2020
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL SOURCE WITH CONTAINED PLASMA
- Publication number 20190341226
- Publication date Nov 7, 2019
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM WITH SYNCHRONIZED SIGNAL MODULATION
- Publication number 20190148113
- Publication date May 16, 2019
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-LOCALIZED AND PLASMA UNIFORMITY CONTROL IN A FABRICATION PROCESS
- Publication number 20190103254
- Publication date Apr 4, 2019
- TOKYO ELECTRON LIMITED
- Barton G. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FACILITATION OF ORTHOTOPIC PATTERNS DURING SUBSTRATE FABRICATION
- Publication number 20180240720
- Publication date Aug 23, 2018
- TOKYO ELECTRON LIMITED
- Barton G. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-LIMITING CYCLIC ETCH METHOD FOR CARBON-BASED FILMS
- Publication number 20180130669
- Publication date May 10, 2018
- TOKYO ELECTRON LIMITED
- Barton G. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Generation and Control Using a DC Ring
- Publication number 20160300738
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS

Barton Lane

Person

Patents Grantslast 30 patents

RF voltage and current (V-I) sensors and measurement methods

Apparatus for plasma processing

Parallel resonance antenna for radial plasma control

RF voltage and current (V-I) sensors and measurement methods

RF voltage and current (V-I) sensors and measurement methods

Ultra-localized and plasma uniformity control in a plasma processin...

System and methods for VHF plasma processing

RF measurement system and method

Methods and systems for focus ring thickness determinations and fee...

Impedance matching apparatus and control method

Radical source with contained plasma

Plasma processing apparatuses including multiple electron sources

Resonant structure for electron cyclotron resonant (ECR) plasma ion...

Self-limiting cyclic etch method for carbon-based films

Plasma processing system with synchronized signal modulation

Resonant structure for a plasma processing system

Facilitation of orthotopic patterns during substrate fabrication

Plasma generation and control using a DC ring

System and method for controlling plasma density

Radio frequency (RF) power coupling system utilizing multiple RF po...

Radio frequency signal splitter and matcher

Methods of electrical signaling in an ion energy analyzer

Ion energy analyzer

Ion energy analyzer and methods of manufacturing the same

Adaptive recipe selector

Patents Applicationslast 30 patents

APPARATUS FOR PLASMA PROCESSING

Parallel Resonance Antenna for Radial Plasma Control

Antenna Plane Magnets for Improved Performance

System and Method for Plasma Processing

IN-SITU DIAGNOSIS OF PLASMA SYSTEM

Parallel Resonance Antenna for Radial Plasma Control

RF Voltage and Current (V-I) Sensors and Measurement Methods

Plasma Processing with Magnetic Ring X Point

Equipment and Method for Improved Edge Uniformity of Plasma Process...

Apparatus for Plasma Processing

Apparatus for Edge Control During Plasma Processing

APPARATUS FOR PLASMA PROCESSING

RADIO FREQUENCY (RF) SYSTEM WITH EMBEDDED RF SIGNAL PICKUPS

Apparatus for Plasma Processing

Impedance Matching Apparatus and Control Method

RF Voltage and Current (V-I) Sensors and Measurement Methods

RF Voltage and Current (V-I) Sensors and Measurement Methods

RF Measurement System and Method

Plasma Processing System with Synchronized Signal Modulation

PLASMA PROCESSING APPARATUSES INCLUDING MULTIPLE ELECTRON SOURCES

PROCESS CONTROL ENABLED VDC SENSOR FOR PLASMA PROCESS

SYSTEM AND METHODS FOR VHF PLASMA PROCESSING

METHODS AND SYSTEMS FOR FOCUS RING THICKNESS DETERMINATIONS AND FEE...

RESONANT STRUCTURE FOR ELECTRON CYCLOTRON RESONANT (ECR) PLASMA ION...

RADICAL SOURCE WITH CONTAINED PLASMA

PLASMA PROCESSING SYSTEM WITH SYNCHRONIZED SIGNAL MODULATION

ULTRA-LOCALIZED AND PLASMA UNIFORMITY CONTROL IN A FABRICATION PROCESS

FACILITATION OF ORTHOTOPIC PATTERNS DURING SUBSTRATE FABRICATION

SELF-LIMITING CYCLIC ETCH METHOD FOR CARBON-BASED FILMS

Plasma Generation and Control Using a DC Ring