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Beichao Zhang
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Singapore, SG
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Patents Grants
last 30 patents
Information
Patent Grant
Methods to eliminate contact plug sidewall slit
Patent number
7,670,946
Issue date
Mar 2, 2010
Chartered Semiconductor Manufacturing, Ltd.
Yong Kong Siew
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Protruded contact and insertion of inter-layer-dielectric material...
Patent number
7,601,607
Issue date
Oct 13, 2009
Chartered Semiconductor Manufacturing, Ltd.
Wuping Liu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Metal barrier cap fabrication by polymer lift-off
Patent number
7,323,408
Issue date
Jan 29, 2008
Chartered Semiconductor Manufacturing Ltd.
Beichao Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Metal barrier cap fabrication by polymer lift-off
Patent number
7,153,766
Issue date
Dec 26, 2006
Chartered Semiconductor Manufacturing Ltd.
Beichao Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Via electromigration improvement by changing the via bottom geometr...
Patent number
7,045,455
Issue date
May 16, 2006
Chartered Semiconductor Manufacturing Ltd.
Beichao Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of cobalt silicidation using an oxide-Titanium interlayer
Patent number
6,653,227
Issue date
Nov 25, 2003
Chartered Semiconductor Manufacturing Ltd.
Chung Woh Lai
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Implantation for shallow trench isolation (STI) formation and for s...
Publication number
20090315115
Publication date
Dec 24, 2009
CHARTERED SEMICONDUCTOR MANUFACTURING, LTD.
Beichao Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Methods to eliminate contact plug sidewall slit
Publication number
20070264824
Publication date
Nov 15, 2007
CHARTERED SEMICONDUCTOR MANUFACTURING, LTD.
Yong Kong Siew
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Protruded contact and insertion of inter-layer-dielectric material...
Publication number
20070264820
Publication date
Nov 15, 2007
Chartered Semiconductor Manufacturing Ltd.
Wuping Liu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Via electromigration improvement by changing the via bottom geometr...
Publication number
20060160354
Publication date
Jul 20, 2006
Chartered Semiconductor Manufacturing LTD.
BeiChao Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Metal barrier cap fabrication by polymer lift-off
Publication number
20060088995
Publication date
Apr 27, 2006
Chartered Semiconductor Manufacturing Ltd.
Beichao Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Barrier metal cap structure on copper lines and vias
Publication number
20050191851
Publication date
Sep 1, 2005
Chartered Semiconductor Manufacturing Ltd.
Wuping Liu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Via electromigration improvement by changing the via bottom geometr...
Publication number
20050090097
Publication date
Apr 28, 2005
Chartered Semiconductor Manufacturing Ltd.
Beichao Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Metal barrier cap fabrication by polymer lift-off
Publication number
20040137709
Publication date
Jul 15, 2004
Chartered Semiconductor Manufacturing Ltd.
Beichao Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Barrier metal cap structure on copper lines and vias
Publication number
20040048468
Publication date
Mar 11, 2004
Chartered Semiconductor Manufacturing Ltd.
Wuping Liu
H01 - BASIC ELECTRIC ELEMENTS