Bernhard Geuppert

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Supporting an optical element
- Patent number 11,314,177
- Issue date Apr 26, 2022
- Carl Zeiss SMT GmbH
- Jens Kugler
- G02 - OPTICS
Information Patent Grant
Optical imaging arrangement with actively adjustable metrology supp...
- Patent number 10,890,850
- Issue date Jan 12, 2021
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and method
- Patent number 10,635,003
- Issue date Apr 28, 2020
- Carl Zeiss SMT GmbH
- Bernhard Geuppert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus, and method for reducing deformations...
- Patent number 10,599,051
- Issue date Mar 24, 2020
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging arrangement with a piezoelectric device
- Patent number 10,416,570
- Issue date Sep 17, 2019
- Carl Zeiss SMT GmbH
- Jens Kugler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus and measuring devic...
- Patent number 10,345,710
- Issue date Jul 9, 2019
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for microlithography with a measurement...
- Patent number 10,042,271
- Issue date Aug 7, 2018
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical projection system
- Patent number 9,891,535
- Issue date Feb 13, 2018
- Carl Zeiss SMT GmbH
- Johannes Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,696,630
- Issue date Jul 4, 2017
- ASML Netherlands B.V.
- Marc Wilhelmus Maria Van Der Wijst
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for microlithography with a measurement...
- Patent number 9,696,639
- Issue date Jul 4, 2017
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical projection system
- Patent number 9,557,653
- Issue date Jan 31, 2017
- Carl Zeiss SMT GmbH
- Johannes Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for replacing objective parts
- Patent number 9,551,944
- Issue date Jan 24, 2017
- Carl Zeiss SMT GmbH
- Bernhard Geuppert
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Exposure apparatus and measuring device for a projection lens
- Patent number 9,436,095
- Issue date Sep 6, 2016
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement for mounting an optical element, in particular in an EU...
- Patent number 9,410,662
- Issue date Aug 9, 2016
- Carl Zeiss SMT GmbH
- Bernhard Geuppert
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Arrangement for actuating an element in a microlithographic project...
- Patent number 9,304,404
- Issue date Apr 5, 2016
- Carl Zeiss SMT GmbH
- Juergen Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,134,632
- Issue date Sep 15, 2015
- ASML Netherlands B.V.
- Marc Wilhelmus Maria Van Der Wijst
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with multiple sets of piezoelectric e...
- Patent number 9,110,388
- Issue date Aug 18, 2015
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Optical projection system
- Patent number 9,104,016
- Issue date Aug 11, 2015
- Carl Zeiss SMT GmbH
- Johannes Rau
- G02 - OPTICS
Information Patent Grant
Projection exposure system for microlithography with a measurement...
- Patent number 9,001,304
- Issue date Apr 7, 2015
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element
- Patent number 8,705,185
- Issue date Apr 22, 2014
- Carl Zeiss SMT GmbH
- Johannes Rau
- G02 - OPTICS
Information Patent Grant
Optical system with an exchangeable, manipulable correction arrange...
- Patent number 8,659,745
- Issue date Feb 25, 2014
- Carl Zeiss SMT GmbH
- Guido Limbach
- G02 - OPTICS
Information Patent Grant
Optical system with an exchangeable, manipulable correction arrange...
- Patent number 8,542,346
- Issue date Sep 24, 2013
- Carl Zeiss SMT GmbH
- Guido Limbach
- G02 - OPTICS
Information Patent Grant
Optical module with minimized overrun of the optical element
- Patent number 8,441,747
- Issue date May 14, 2013
- Carl Zeiss SMT GmbH
- Willi Heintel
- G02 - OPTICS
Information Patent Grant
Exposure apparatus and measuring device for a projection lens
- Patent number 8,330,935
- Issue date Dec 11, 2012
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical projection system
- Patent number 8,300,210
- Issue date Oct 30, 2012
- Carl Zeiss SMT GmbH
- Johannes Rau
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus and optical system
- Patent number 8,269,948
- Issue date Sep 18, 2012
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Optical apparatus and method for modifying the imaging behavior of...
- Patent number 8,169,595
- Issue date May 1, 2012
- Carl Zeiss SMT GmbH
- Martin Schriever
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vibration damping for photolithographic lens mount
- Patent number 7,826,155
- Issue date Nov 2, 2010
- Carl Zeiss SMT AG
- Bernhard Geuppert
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Reflecting optical element with eccentric optical passageway
- Patent number 7,760,327
- Issue date Jul 20, 2010
- Carl Zeiss SMT AG
- Hans-Jürgen Scherle
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus, device manufacturing method and exchangeabl...
- Patent number 7,724,351
- Issue date May 25, 2010
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUPPORTING AN OPTICAL ELEMENT
- Publication number 20210181644
- Publication date Jun 17, 2021
- Carl Zeiss SMT GMBH
- Jens Kugler
- G01 - MEASURING TESTING
Information Patent Application
Lithographic Apparatus, Lithographic Projection Apparatus and Devic...
- Publication number 20200209757
- Publication date Jul 2, 2020
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHOD
- Publication number 20190310557
- Publication date Oct 10, 2019
- Carl Zeiss SMT GMBH
- Bernhard Geuppert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS, AND METHOD FOR REDUCING DEFORMATIONS...
- Publication number 20190219926
- Publication date Jul 18, 2019
- Carl Zeiss SMT GMBH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20190129318
- Publication date May 2, 2019
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL IMAGING ARRANGEMENT WITH A PIEZOELECTRIC DEVICE
- Publication number 20190094705
- Publication date Mar 28, 2019
- Carl Zeiss SMT GMBH
- Jens Kugler
- G02 - OPTICS
Information Patent Application
OPTICAL IMAGING ARRANGEMENT WITH ACTIVELY ADJUSTABLE METROLOGY SUPP...
- Publication number 20180275527
- Publication date Sep 27, 2018
- Carl Zeiss SMT GMBH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Projection System
- Publication number 20180259856
- Publication date Sep 13, 2018
- Carl Zeiss SMT GMBH
- Johannes Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20180024445
- Publication date Jan 25, 2018
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Projection System
- Publication number 20170219929
- Publication date Aug 3, 2017
- Carl Zeiss SMT GMBH
- Johannes Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...
- Publication number 20170082930
- Publication date Mar 23, 2017
- Carl Zeiss SMT GMBH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Device Manufacturing Method
- Publication number 20160004170
- Publication date Jan 7, 2016
- ASML NETHERLANDS B.V.
- Marc Wilhelmus Maria VAN DER WIJST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROJECTION SYSTEM
- Publication number 20150323873
- Publication date Nov 12, 2015
- Carl Zeiss SMT GMBH
- Johannes Rau
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20150212431
- Publication date Jul 30, 2015
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY APPARATUS WITH RESTRICTED MOVEMENT RELATIVE TO FLOOR AN...
- Publication number 20150168853
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Mathias Schumacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Device for Replacing Objective Parts
- Publication number 20140359990
- Publication date Dec 11, 2014
- Bernhard Geuppert
- B08 - CLEANING
Information Patent Application
ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECT...
- Publication number 20140043596
- Publication date Feb 13, 2014
- ASML NETHERLANDS B.V.
- Juergen Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20140021324
- Publication date Jan 23, 2014
- Mathias Schumacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ARRANGEMENT FOR MOUNTING AN OPTICAL ELEMENT, IN PARTICULAR IN AN EU...
- Publication number 20130314771
- Publication date Nov 28, 2013
- Bernhard Geuppert
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...
- Publication number 20130278911
- Publication date Oct 24, 2013
- Guido Limbach
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
- Publication number 20130120723
- Publication date May 16, 2013
- Carl Zeiss SMT GMBH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROJECTION SYSTEM
- Publication number 20130044304
- Publication date Feb 21, 2013
- Carl Zeiss SMT GMBH
- Johannes Rau
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS AND OPTICAL SYSTEM
- Publication number 20120320353
- Publication date Dec 20, 2012
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT
- Publication number 20120194795
- Publication date Aug 2, 2012
- Carl Zeiss SMT GMBH
- Johannes Rau
- G02 - OPTICS
Information Patent Application
Lithographic Apparatus and Device Manufacturing Method
- Publication number 20120154774
- Publication date Jun 21, 2012
- Carl Zeiss SMT GMBH
- Marc Wilhelmus Maria VAN DER WIJST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20110013171
- Publication date Jan 20, 2011
- Carl Zeiss SMT AG
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
- Publication number 20100141912
- Publication date Jun 10, 2010
- Carl Zeiss SMT AG
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR REPLACING OBJECTIVE PARTS
- Publication number 20090260654
- Publication date Oct 22, 2009
- Carl Zeiss SMT AG
- Bernhard Geuppert
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...
- Publication number 20090244509
- Publication date Oct 1, 2009
- Carl Zeiss SMT AG
- Guido Limbach
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS AND OPTICAL SYSTEM
- Publication number 20090225297
- Publication date Sep 10, 2009
- Carl Zeiss SMT AG
- Sascha Bleidistel
- G02 - OPTICS

Bernhard Geuppert

Person

Patents Grantslast 30 patents

Supporting an optical element

Optical imaging arrangement with actively adjustable metrology supp...

Lithography system and method

Projection exposure apparatus, and method for reducing deformations...

Optical imaging arrangement with a piezoelectric device

Microlithographic projection exposure apparatus and measuring devic...

Projection exposure system for microlithography with a measurement...

Optical projection system

Lithographic apparatus and device manufacturing method

Projection exposure system for microlithography with a measurement...

Optical projection system

Method for replacing objective parts

Exposure apparatus and measuring device for a projection lens

Arrangement for mounting an optical element, in particular in an EU...

Arrangement for actuating an element in a microlithographic project...

Lithographic apparatus and device manufacturing method

Projection exposure apparatus with multiple sets of piezoelectric e...

Optical projection system

Projection exposure system for microlithography with a measurement...

Optical element

Optical system with an exchangeable, manipulable correction arrange...

Optical system with an exchangeable, manipulable correction arrange...

Optical module with minimized overrun of the optical element

Exposure apparatus and measuring device for a projection lens

Optical projection system

Projection exposure apparatus and optical system

Optical apparatus and method for modifying the imaging behavior of...

Vibration damping for photolithographic lens mount

Reflecting optical element with eccentric optical passageway

Lithographic apparatus, device manufacturing method and exchangeabl...

Patents Applicationslast 30 patents

SUPPORTING AN OPTICAL ELEMENT

Lithographic Apparatus, Lithographic Projection Apparatus and Devic...

LITHOGRAPHY SYSTEM AND METHOD

PROJECTION EXPOSURE APPARATUS, AND METHOD FOR REDUCING DEFORMATIONS...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

OPTICAL IMAGING ARRANGEMENT WITH A PIEZOELECTRIC DEVICE

OPTICAL IMAGING ARRANGEMENT WITH ACTIVELY ADJUSTABLE METROLOGY SUPP...

Optical Projection System

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

Optical Projection System

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...

Lithographic Apparatus and Device Manufacturing Method

OPTICAL PROJECTION SYSTEM

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

LITHOGRAPHY APPARATUS WITH RESTRICTED MOVEMENT RELATIVE TO FLOOR AN...

Method and Device for Replacing Objective Parts

ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECT...

LITHOGRAPHY APPARATUS AND METHOD

ARRANGEMENT FOR MOUNTING AN OPTICAL ELEMENT, IN PARTICULAR IN AN EU...

OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...

EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS

OPTICAL PROJECTION SYSTEM

PROJECTION EXPOSURE APPARATUS AND OPTICAL SYSTEM

OPTICAL ELEMENT

Lithographic Apparatus and Device Manufacturing Method

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS

METHOD AND DEVICE FOR REPLACING OBJECTIVE PARTS

OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...

PROJECTION EXPOSURE APPARATUS AND OPTICAL SYSTEM