Bill H. Quon

Person

Tempe, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Inductively coupled high-density plasma source
- Patent number 7,482,757
- Issue date Jan 27, 2009
- Tokyo Electron Limited
- Bill H. Quon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-linear test load and method of calibrating a plasma system
- Patent number 7,216,067
- Issue date May 8, 2007
- Tokyo Electron Limited
- Bill H. Quon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improved plasma processing uniformity
- Patent number 7,164,236
- Issue date Jan 16, 2007
- Tokyo Electron Limited
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impedance monitoring system and method
- Patent number 7,019,543
- Issue date Mar 28, 2006
- Tokyo Electron Limited
- Bill H. Quon
- G01 - MEASURING TESTING
Information Patent Grant
Inter-stage plasma source
- Patent number 6,979,954
- Issue date Dec 27, 2005
- Tokyo Electron Limited
- Bill H Quon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed-drift hall effect plasma vacuum pump for process reactors
- Patent number 6,899,527
- Issue date May 31, 2005
- Tokyo Electron Limited
- Bill H Quon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,885,153
- Issue date Apr 26, 2005
- Tokyo Electron Limited
- Bill H Quon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stand alone plasma vacuum pump
- Patent number 6,873,113
- Issue date Mar 29, 2005
- Tokyo Electron Limited
- Raphael A. Dandl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Applied plasma duct system
- Patent number 6,729,850
- Issue date May 4, 2004
- Tokyo Electron Limited
- Raphael A. Dandl
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Inductively coupled high-density plasma source
- Publication number 20050099133
- Publication date May 12, 2005
- Bill H. Quon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for processing a workpiece with a plasma
- Publication number 20040219737
- Publication date Nov 4, 2004
- TOKYO ELECTRON LIMITED
- Bill H Quon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Non-linear test load and method of calibrating a plasma system
- Publication number 20040210407
- Publication date Oct 21, 2004
- TOKYO ELECTRON LIMITED
- Bill H. Quon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for improved plasma processing uniformity
- Publication number 20040168770
- Publication date Sep 2, 2004
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inter-stage plasma source
- Publication number 20040160191
- Publication date Aug 19, 2004
- TOKYO ELECTRON LIMITED
- Bill H. Quon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Closed-drift hall effect plasma vacuum pump for process reactors
- Publication number 20040151595
- Publication date Aug 5, 2004
- TOKYO ELECTRON LIMITED
- Bill H. Quon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Impedance monitoring system and method
- Publication number 20040135590
- Publication date Jul 15, 2004
- Bill H. Quon
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing apparatus and method
- Publication number 20040112536
- Publication date Jun 17, 2004
- TOKYO ELECTRON LIMITED
- Bill H Quon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method to control the uniformity of plasma by reducin...
- Publication number 20030150562
- Publication date Aug 14, 2003
- Bill H. Quon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for improved plasma processing uniformity
- Publication number 20030137251
- Publication date Jul 24, 2003
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stand alone plasma vacuum pump
- Publication number 20030122492
- Publication date Jul 3, 2003
- Raphael A. Dandl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Applied plasma duct system
- Publication number 20030117080
- Publication date Jun 26, 2003
- Raphael A. Dandl
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Apparatus and method for improving electron ecceleration
- Publication number 20030094239
- Publication date May 22, 2003
- Bill H. Quon
- H01 - BASIC ELECTRIC ELEMENTS

Bill H. Quon

Person

Patents Grantslast 30 patents

Inductively coupled high-density plasma source

Non-linear test load and method of calibrating a plasma system

Method and apparatus for improved plasma processing uniformity

Impedance monitoring system and method

Inter-stage plasma source

Closed-drift hall effect plasma vacuum pump for process reactors

Plasma processing apparatus and method

Stand alone plasma vacuum pump

Applied plasma duct system

Patents Applicationslast 30 patents

Inductively coupled high-density plasma source

Method and apparatus for processing a workpiece with a plasma

Non-linear test load and method of calibrating a plasma system

Method and apparatus for improved plasma processing uniformity

Inter-stage plasma source

Closed-drift hall effect plasma vacuum pump for process reactors

Impedance monitoring system and method

Plasma processing apparatus and method

Apparatus and method to control the uniformity of plasma by reducin...

Method and apparatus for improved plasma processing uniformity

Stand alone plasma vacuum pump

Applied plasma duct system

Apparatus and method for improving electron ecceleration