Bing Ji

Person

Allentown, PA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Impedance match with an elongated RF strap
- Patent number 12,080,518
- Issue date Sep 3, 2024
- Lam Research Corporation
- Felix Leib Kozakevich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High speed synchronization of plasma source/bias power delivery
- Patent number 11,935,726
- Issue date Mar 19, 2024
- MKS Instruments, Inc.
- Aaron T. Radomski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing power delivery to an electrode o...
- Patent number 11,908,660
- Issue date Feb 20, 2024
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing power delivery to an electrode o...
- Patent number 11,335,539
- Issue date May 17, 2022
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High speed synchronization of plasma source/bias power delivery
- Patent number 11,158,488
- Issue date Oct 26, 2021
- MKS Instruments, Inc.
- Aaron T. Radomski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active control of radial etch uniformity
- Patent number 10,916,409
- Issue date Feb 9, 2021
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing twisting in ultra-high aspect ratio dielectric etch
- Patent number 8,741,165
- Issue date Jun 3, 2014
- Lam Research Corporation
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Strip with reduced low-K dielectric damage
- Patent number 8,691,701
- Issue date Apr 8, 2014
- Lam Research Corporation
- Bing Ji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for low-K dielectric etch with reduced damage
- Patent number 8,236,188
- Issue date Aug 7, 2012
- Lam Research Corporation
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for plasma etching performance enhancement
- Patent number 7,977,390
- Issue date Jul 12, 2011
- Lam Research Corporation
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing carbon-containing residues from a substrate
- Patent number 7,581,549
- Issue date Sep 1, 2009
- Air Products and Chemicals, Inc.
- Andrew David Johnson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Removal of transition metal ternary and/or quaternary barrier mater...
- Patent number 7,371,688
- Issue date May 13, 2008
- Air Products and Chemicals, Inc.
- Bing Ji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching high dielectric constant materials and for clean...
- Patent number 7,357,138
- Issue date Apr 15, 2008
- Air Products and Chemicals, Inc.
- Bing Ji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Xenon recovery system
- Patent number 7,285,154
- Issue date Oct 23, 2007
- Air Products and Chemicals, Inc.
- Eugene Joseph Karwacki, Jr.
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for removing titanium dioxide deposits from a reactor
- Patent number 7,267,842
- Issue date Sep 11, 2007
- Air Products and Chemicals, Inc.
- Dingjun Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to protect internal components of semiconductor processing e...
- Patent number 7,119,032
- Issue date Oct 10, 2006
- Air Products and Chemicals, Inc.
- Bing Ji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning deposition chambers for high dielectric constan...
- Patent number 7,055,263
- Issue date Jun 6, 2006
- Air Products and Chemicals, Inc.
- Dingjun Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
On-line UV-Visible light halogen gas analyzer for semiconductor pro...
- Patent number 6,686,594
- Issue date Feb 3, 2004
- Air Products and Chemicals, Inc.
- Bing Ji
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...
- Publication number 20240186112
- Publication date Jun 6, 2024
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL USING A STATIC MAGNETIC FIELD
- Publication number 20230298866
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC FIELD CONTROL SYSTEM
- Publication number 20230282455
- Publication date Sep 7, 2023
- LAM RESEARCH CORPORATION
- Alecia Chantalle Griffin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW FREQUENCY RF GENERATOR AND ASSOCIATED ELECTROSTATIC CHUCK
- Publication number 20230274914
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DISCHARGE UNIFORMITY CONTROL USING MAGNETIC FIELDS
- Publication number 20230260768
- Publication date Aug 17, 2023
- LAM RESEARCH CORPORATION
- Theodoros Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORMITY CONTROL CIRCUIT FOR IMPEDANCE MATCH
- Publication number 20230253184
- Publication date Aug 10, 2023
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CONTROLLING A PLASMA SHEATH CHARACTERISTIC
- Publication number 20230245874
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL USING A PULSED MAGNETIC FIELD
- Publication number 20230223242
- Publication date Jul 13, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUTY CYCLE CONTROL TO ACHIEVE UNIFORMITY
- Publication number 20230215694
- Publication date Jul 6, 2023
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MATCH WITH AN ELONGATED RF STRAP
- Publication number 20230081542
- Publication date Mar 16, 2023
- LAM RESEARCH CORPORATION
- Felix Leib Kozakevich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radiofrequency Signal Filter Arrangement for Plasma Processing System
- Publication number 20230054699
- Publication date Feb 23, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimization of Radiofrequency Signal Ground Return in Plasma Proce...
- Publication number 20230059495
- Publication date Feb 23, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR USING BINNING TO INCREASE POWER DURING A LO...
- Publication number 20230007885
- Publication date Jan 12, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...
- Publication number 20220199366
- Publication date Jun 23, 2022
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Speed Synchronization Of Plasma Source/Bias Power Delivery
- Publication number 20220005674
- Publication date Jan 6, 2022
- MKS Instruments, Inc.
- Aaron T. RADOMSKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...
- Publication number 20210319980
- Publication date Oct 14, 2021
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Speed Synchronization Of Plasma Source/Bias Power Delivery
- Publication number 20200411289
- Publication date Dec 31, 2020
- MKS Instruments, Inc.
- Aaron T. RADOMSKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE CONTROL OF RADIAL ETCH UNIFORMITY
- Publication number 20190385822
- Publication date Dec 19, 2019
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCING TWISTING IN ULTRA-HIGH ASPECT RATIO DIELECTRIC ETCH
- Publication number 20110021030
- Publication date Jan 27, 2011
- LAM RESEARCH CORPORATION
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRIP WITH REDUCED LOW-K DIELECTRIC DAMAGE
- Publication number 20100285671
- Publication date Nov 11, 2010
- LAM RESEARCH CORPORATION
- Bing Ji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR LOW-K DIELECTRIC ETCH WITH REDUCED DAMAGE
- Publication number 20100261352
- Publication date Oct 14, 2010
- LAM RESEARCH CORPORATION
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCING TWISTING IN ULTRA-HIGH ASPECT RATIO DIELECTRIC ETCH
- Publication number 20080119055
- Publication date May 22, 2008
- Lam Research Corporation
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Detecting the endpoint of a cleaning process
- Publication number 20080047579
- Publication date Feb 28, 2008
- Bing Ji
- B08 - CLEANING
Information Patent Application
Use Of Hypofluorites, Fluoroperoxides, And/Or Fluorotrioxides As Ox...
- Publication number 20070224829
- Publication date Sep 27, 2007
- Air Products and Chemicals, Inc.
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for plasma etching performance enhancement
- Publication number 20070026677
- Publication date Feb 1, 2007
- Lam Research Corporation
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Free radical initiator in remote plasma chamber clean
- Publication number 20070006893
- Publication date Jan 11, 2007
- Bing Ji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and process for reactive gas cleaning of tool parts
- Publication number 20060254613
- Publication date Nov 16, 2006
- Dingjun Wu
- B08 - CLEANING
Information Patent Application
Xenon recovery system
- Publication number 20060107831
- Publication date May 25, 2006
- Eugene Joseph Karwacki
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Method to protect internal components of semiconductor processing e...
- Publication number 20060040508
- Publication date Feb 23, 2006
- Bing Ji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Passivating ALD reactor chamber internal surfaces to prevent residu...
- Publication number 20060040054
- Publication date Feb 23, 2006
- Ronald Martin Pearlstein
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Impedance match with an elongated RF strap

High speed synchronization of plasma source/bias power delivery

Systems and methods for optimizing power delivery to an electrode o...

Systems and methods for optimizing power delivery to an electrode o...

High speed synchronization of plasma source/bias power delivery

Active control of radial etch uniformity

Reducing twisting in ultra-high aspect ratio dielectric etch

Strip with reduced low-K dielectric damage

Method for low-K dielectric etch with reduced damage

Method for plasma etching performance enhancement

Method for removing carbon-containing residues from a substrate

Removal of transition metal ternary and/or quaternary barrier mater...

Method for etching high dielectric constant materials and for clean...

Xenon recovery system

Method for removing titanium dioxide deposits from a reactor

Method to protect internal components of semiconductor processing e...

Method for cleaning deposition chambers for high dielectric constan...

On-line UV-Visible light halogen gas analyzer for semiconductor pro...

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...

PLASMA UNIFORMITY CONTROL USING A STATIC MAGNETIC FIELD

MAGNETIC FIELD CONTROL SYSTEM

LOW FREQUENCY RF GENERATOR AND ASSOCIATED ELECTROSTATIC CHUCK

PLASMA DISCHARGE UNIFORMITY CONTROL USING MAGNETIC FIELDS

UNIFORMITY CONTROL CIRCUIT FOR IMPEDANCE MATCH

SYSTEMS AND METHODS FOR CONTROLLING A PLASMA SHEATH CHARACTERISTIC

PLASMA UNIFORMITY CONTROL USING A PULSED MAGNETIC FIELD

DUTY CYCLE CONTROL TO ACHIEVE UNIFORMITY

IMPEDANCE MATCH WITH AN ELONGATED RF STRAP

Radiofrequency Signal Filter Arrangement for Plasma Processing System

Optimization of Radiofrequency Signal Ground Return in Plasma Proce...

SYSTEMS AND METHODS FOR USING BINNING TO INCREASE POWER DURING A LO...

SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...

High Speed Synchronization Of Plasma Source/Bias Power Delivery

SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...

High Speed Synchronization Of Plasma Source/Bias Power Delivery

ACTIVE CONTROL OF RADIAL ETCH UNIFORMITY

REDUCING TWISTING IN ULTRA-HIGH ASPECT RATIO DIELECTRIC ETCH

STRIP WITH REDUCED LOW-K DIELECTRIC DAMAGE

METHOD FOR LOW-K DIELECTRIC ETCH WITH REDUCED DAMAGE

REDUCING TWISTING IN ULTRA-HIGH ASPECT RATIO DIELECTRIC ETCH

Detecting the endpoint of a cleaning process

Use Of Hypofluorites, Fluoroperoxides, And/Or Fluorotrioxides As Ox...

Method for plasma etching performance enhancement

Free radical initiator in remote plasma chamber clean

Method and process for reactive gas cleaning of tool parts

Xenon recovery system

Method to protect internal components of semiconductor processing e...

Passivating ALD reactor chamber internal surfaces to prevent residu...