Bo Zheng

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Display device with peripherally surrounding audio trench and acous...
- Patent number 10,863,268
- Issue date Dec 8, 2020
- Facebook Technologies, LLC
- Katherine Suzi Torigoe
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Method of enabling seamless cobalt gap-fill
- Patent number 10,699,946
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Bhushan N. Zope
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pre-clean of silicon germanium for pre-metal contact at source and...
- Patent number 10,615,034
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Bo Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of enabling seamless cobalt gap-fill
- Patent number 10,269,633
- Issue date Apr 23, 2019
- Applied Materials, Inc.
- Bhushan N. Zope
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for selective deposition of metal silicides via atomic laye...
- Patent number 10,199,230
- Issue date Feb 5, 2019
- Applied Materials, Inc.
- Seshadri Ganguli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-clean of silicon germanium for pre-metal contact at source and...
- Patent number 10,163,630
- Issue date Dec 25, 2018
- Applied Materials, Inc.
- Bo Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of enabling seamless cobalt gap-fill
- Patent number 9,842,769
- Issue date Dec 12, 2017
- Applied Materials, Inc.
- Bhushan N. Zope
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-clean of silicon germanium for pre-metal contact at source and...
- Patent number 9,735,009
- Issue date Aug 15, 2017
- Applied Materials, Inc.
- Bo Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of enabling seamless cobalt gap-fill
- Patent number 9,685,371
- Issue date Jun 20, 2017
- Applied Materials, Inc.
- Bhushan N. Zope
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cobalt removal for chamber clean or pre-clean process
- Patent number 9,528,183
- Issue date Dec 27, 2016
- Applied Materials, Inc.
- Kai Wu
- B08 - CLEANING
Information Patent Grant
Film deposition using spatial atomic layer deposition or pulsed che...
- Patent number 9,514,933
- Issue date Dec 6, 2016
- Applied Materials, Inc.
- Yu Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of enabling seamless cobalt gap-fill
- Patent number 9,330,939
- Issue date May 3, 2016
- Applied Materials, Inc.
- Bhushan N. Zope
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated platform for fabricating n-type metal oxide semiconducto...
- Patent number 9,230,835
- Issue date Jan 5, 2016
- Applied Materials, Inc.
- Avgerinos V. Gelatos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatuses and methods for atomic layer deposition
- Patent number 9,017,776
- Issue date Apr 28, 2015
- Applied Materials, Inc.
- Hyman W. H. Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removing native oxide and associated residue from a subs...
- Patent number 8,951,913
- Issue date Feb 10, 2015
- Applied Materials, Inc.
- Bo Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for precleaning a substrate prior to metal silicide fabrica...
- Patent number 8,912,096
- Issue date Dec 16, 2014
- Applied Materials, Inc.
- Bo Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing native oxide and associated residue from a subs...
- Patent number 8,772,162
- Issue date Jul 8, 2014
- Applied Materials, Inc.
- Bo Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatuses and methods for atomic layer deposition
- Patent number 8,747,556
- Issue date Jun 10, 2014
- Applied Materials, Inc.
- Hyman W. H. Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of end point detection for substrate fabrication processes
- Patent number 8,747,686
- Issue date Jun 10, 2014
- Applied Materials, Inc.
- Bo Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for contact clean
- Patent number 8,642,473
- Issue date Feb 4, 2014
- Applied Materials, Inc.
- Mei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing native oxide and associated residue from a subs...
- Patent number 8,455,352
- Issue date Jun 4, 2013
- Applied Materials, Inc.
- Bo Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatuses and methods for atomic layer deposition
- Patent number 8,291,857
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Hyman Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatuses and methods for atomic layer deposition
- Patent number 8,293,015
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Hyman W. H. Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electric field reducing thrust plate
- Patent number 7,285,195
- Issue date Oct 23, 2007
- Applied Materials, Inc.
- Harald Herchen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of annealing metal layers
- Patent number 7,109,111
- Issue date Sep 19, 2006
- Applied Materials, Inc.
- Zhonghui Alex Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of application of electrical biasing to enhance metal deposi...
- Patent number 6,913,680
- Issue date Jul 5, 2005
- Applied Materials, Inc.
- Bo Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for regulating the electrical power applied to a substrate d...
- Patent number 6,911,136
- Issue date Jun 28, 2005
- Applied Materials, Inc.
- Bo Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ECP gap fill by modulating the voltate on the seed layer to increas...
- Patent number 6,746,591
- Issue date Jun 8, 2004
- Applied Materials Inc.
- Bo Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and associated apparatus to mechanically enhance the deposit...
- Patent number 6,610,189
- Issue date Aug 26, 2003
- Applied Materials, Inc.
- Hougong Wang
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Showerhead with reduced contact area
- Patent number 6,461,435
- Issue date Oct 8, 2002
- Applied Materials, Inc.
- Karl A. Littau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PRE-CLEAN OF SILICON GERMANIUM FOR PRE-METAL CONTACT AT SOURCE AND...
- Publication number 20190326115
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Bo ZHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF ENABLING SEAMLESS COBALT GAP-FILL
- Publication number 20180068890
- Publication date Mar 8, 2018
- Applied Materials, Inc.
- Bhushan N. ZOPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE-CLEAN OF SILICON GERMANIUM FOR PRE-METAL CONTACT AT SOURCE AND...
- Publication number 20170365468
- Publication date Dec 21, 2017
- Applied Materials, Inc.
- Bo ZHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF ENABLING SEAMLESS COBALT GAP-FILL
- Publication number 20170084486
- Publication date Mar 23, 2017
- Applied Materials, Inc.
- Bhushan N. ZOPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SELECTIVE DEPOSITION OF METAL SILICIDES VIA ATOMIC LAYE...
- Publication number 20160322229
- Publication date Nov 3, 2016
- Applied Materials, Inc.
- Seshadri GANGULI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ENABLING SEAMLESS COBALT GAP-FILL
- Publication number 20160247718
- Publication date Aug 25, 2016
- Applied Materials, Inc.
- Bhushan N. ZOPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE-CLEAN OF SILICON GERMANIUM FOR PRE-METAL CONTACT AT SOURCE AND...
- Publication number 20160079062
- Publication date Mar 17, 2016
- Applied Materials, Inc.
- Bo ZHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film Deposition Using Spatial Atomic Layer Deposition Or Pulsed Che...
- Publication number 20150194298
- Publication date Jul 9, 2015
- Applied Materials, Inc.
- Yu Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ENABLING SEAMLESS COBALT GAP-FILL
- Publication number 20150093891
- Publication date Apr 2, 2015
- Applied Materials, Inc.
- Bhushan N. ZOPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COBALT SUBSTRATE PROCESSING SYSTEMS, APPARATUS, AND METHODS
- Publication number 20150030771
- Publication date Jan 29, 2015
- Applied Materials, Inc.
- Avgerinos V. Gelatos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COBALT REMOVAL FOR CHAMBER CLEAN OR PRE-CLEAN PROCESS
- Publication number 20140326276
- Publication date Nov 6, 2014
- Applied Materials, Inc.
- Kai WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REMOVING NATIVE OXIDE AND ASSOCIATED RESIDUE FROM A SUBS...
- Publication number 20140295665
- Publication date Oct 2, 2014
- Bo ZHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED PLATFORM FOR FABRICATING N-TYPE METAL OXIDE SEMICONDUCTO...
- Publication number 20140273515
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- AVGERINOS V. GELATOS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION
- Publication number 20140087091
- Publication date Mar 27, 2014
- Applied Materials, Inc.
- Hyman W.H. Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REMOVING NATIVE OXIDE AND RESIDUE FROM A GERMANIUM OR II...
- Publication number 20140011339
- Publication date Jan 9, 2014
- Applied Materials, Inc.
- Bo ZHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REMOVING NATIVE OXIDE AND ASSOCIATED RESIDUE FROM A SUBS...
- Publication number 20130316533
- Publication date Nov 28, 2013
- Bo ZHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ENABLING SEAMLESS COBALT GAP-FILL
- Publication number 20130260555
- Publication date Oct 3, 2013
- Bhushan N. ZOPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF END POINT DETECTION FOR SUBSTRATE FABRICATION PROCESSES
- Publication number 20130193108
- Publication date Aug 1, 2013
- Applied Materials, Inc.
- Bo Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION
- Publication number 20130008984
- Publication date Jan 10, 2013
- Applied Materials, Inc.
- Hyman Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR PRECLEANING A SUBSTRATE PRIOR TO METAL SILICIDE FABRICA...
- Publication number 20120276740
- Publication date Nov 1, 2012
- Applied Materials, Inc.
- Bo Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR CONTACT CLEAN
- Publication number 20120225558
- Publication date Sep 6, 2012
- Applied Materials, Inc.
- MEI CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION
- Publication number 20120000422
- Publication date Jan 5, 2012
- Applied Materials, Inc.
- Hyman Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION
- Publication number 20100003406
- Publication date Jan 7, 2010
- Applied Materials, Inc.
- Hyman Lam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FORMATION OF PROTECTION LAYER ON WAFER TO PREVENT STAIN FORMATION
- Publication number 20070232072
- Publication date Oct 4, 2007
- Bo Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable dosing algorithm for control of a copper electroplating...
- Publication number 20070089990
- Publication date Apr 26, 2007
- Joseph F. Behnke
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method and apparatus for reducing tensile stress in a deposited layer
- Publication number 20070049020
- Publication date Mar 1, 2007
- APPLIED MATERIALS, INC.
- Yi-Chiau Huang
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
MULTIPLE CHEMISTRY ELECTROCHEMICAL PLATING METHOD
- Publication number 20060266655
- Publication date Nov 30, 2006
- Zhi-Wen Sun
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Electric field reducing thrust plate
- Publication number 20050284754
- Publication date Dec 29, 2005
- Harald Herchen
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Conditioning of contact leads for metal plating systems
- Publication number 20050218000
- Publication date Oct 6, 2005
- APPLIED MATERIALS, INC.
- Hooman Hafezi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Formation of protection layer by dripping DI on wafer with high rot...
- Publication number 20050020077
- Publication date Jan 27, 2005
- APPLIED MATERIALS, INC.
- Bo Zheng
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Display device with peripherally surrounding audio trench and acous...

Method of enabling seamless cobalt gap-fill

Pre-clean of silicon germanium for pre-metal contact at source and...

Method of enabling seamless cobalt gap-fill

Methods for selective deposition of metal silicides via atomic laye...

Pre-clean of silicon germanium for pre-metal contact at source and...

Method of enabling seamless cobalt gap-fill

Pre-clean of silicon germanium for pre-metal contact at source and...

Method of enabling seamless cobalt gap-fill

Cobalt removal for chamber clean or pre-clean process

Film deposition using spatial atomic layer deposition or pulsed che...

Method of enabling seamless cobalt gap-fill

Integrated platform for fabricating n-type metal oxide semiconducto...

Apparatuses and methods for atomic layer deposition

Method for removing native oxide and associated residue from a subs...

Methods for precleaning a substrate prior to metal silicide fabrica...

Method for removing native oxide and associated residue from a subs...

Apparatuses and methods for atomic layer deposition

Methods of end point detection for substrate fabrication processes

Methods for contact clean

Method for removing native oxide and associated residue from a subs...

Apparatuses and methods for atomic layer deposition

Apparatuses and methods for atomic layer deposition

Electric field reducing thrust plate

Method of annealing metal layers

Method of application of electrical biasing to enhance metal deposi...

Method for regulating the electrical power applied to a substrate d...

ECP gap fill by modulating the voltate on the seed layer to increas...

Method and associated apparatus to mechanically enhance the deposit...

Showerhead with reduced contact area

Patents Applicationslast 30 patents

PRE-CLEAN OF SILICON GERMANIUM FOR PRE-METAL CONTACT AT SOURCE AND...

METHOD OF ENABLING SEAMLESS COBALT GAP-FILL

PRE-CLEAN OF SILICON GERMANIUM FOR PRE-METAL CONTACT AT SOURCE AND...

METHOD OF ENABLING SEAMLESS COBALT GAP-FILL

METHODS FOR SELECTIVE DEPOSITION OF METAL SILICIDES VIA ATOMIC LAYE...

METHOD OF ENABLING SEAMLESS COBALT GAP-FILL

PRE-CLEAN OF SILICON GERMANIUM FOR PRE-METAL CONTACT AT SOURCE AND...

Film Deposition Using Spatial Atomic Layer Deposition Or Pulsed Che...

METHOD OF ENABLING SEAMLESS COBALT GAP-FILL

COBALT SUBSTRATE PROCESSING SYSTEMS, APPARATUS, AND METHODS

COBALT REMOVAL FOR CHAMBER CLEAN OR PRE-CLEAN PROCESS

METHOD FOR REMOVING NATIVE OXIDE AND ASSOCIATED RESIDUE FROM A SUBS...

INTEGRATED PLATFORM FOR FABRICATING N-TYPE METAL OXIDE SEMICONDUCTO...

APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION

METHOD FOR REMOVING NATIVE OXIDE AND RESIDUE FROM A GERMANIUM OR II...

METHOD FOR REMOVING NATIVE OXIDE AND ASSOCIATED RESIDUE FROM A SUBS...

METHOD OF ENABLING SEAMLESS COBALT GAP-FILL

METHODS OF END POINT DETECTION FOR SUBSTRATE FABRICATION PROCESSES

APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION

METHODS FOR PRECLEANING A SUBSTRATE PRIOR TO METAL SILICIDE FABRICA...

METHODS FOR CONTACT CLEAN

APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION

APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION

FORMATION OF PROTECTION LAYER ON WAFER TO PREVENT STAIN FORMATION

Adjustable dosing algorithm for control of a copper electroplating...

Method and apparatus for reducing tensile stress in a deposited layer

MULTIPLE CHEMISTRY ELECTROCHEMICAL PLATING METHOD

Electric field reducing thrust plate

Conditioning of contact leads for metal plating systems

Formation of protection layer by dripping DI on wafer with high rot...