Bradley J. Howard

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of controlling striations and CD loss in contact oxide etch
- Patent number 8,093,155
- Issue date Jan 10, 2012
- Micron Technology, Inc.
- Li Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multifrequency plasma reactor
- Patent number 7,625,460
- Issue date Dec 1, 2009
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching methods and contact opening forming methods
- Patent number 7,615,164
- Issue date Nov 10, 2009
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch aided by electrically shorting upper and lower sidewall portio...
- Patent number 7,573,116
- Issue date Aug 11, 2009
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Barrier layer, IC via, and IC line forming methods
- Patent number 7,538,028
- Issue date May 26, 2009
- Micron Technology, Inc.
- Gurtej S. Sandu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching a substrate
- Patent number 7,470,625
- Issue date Dec 30, 2008
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for using photo-definable layers in the manufacture of semi...
- Patent number 7,323,292
- Issue date Jan 29, 2008
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Barrier layer, IC via, and IC line forming methods
- Patent number 7,271,089
- Issue date Sep 18, 2007
- Micron Technology, Inc.
- Gurtej S. Sandu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming contact openings
- Patent number 7,255,803
- Issue date Aug 14, 2007
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching a substrate
- Patent number 7,122,480
- Issue date Oct 17, 2006
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch aided by electrically shorting upper and lower sidewall portio...
- Patent number 7,094,699
- Issue date Aug 22, 2006
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching methods
- Patent number 6,958,297
- Issue date Oct 25, 2005
- Micron Technology, Inc.
- David S. Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching methods
- Patent number 6,812,154
- Issue date Nov 2, 2004
- Micron Technology, Inc.
- David S. Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling striations and CD loss in contact oxide etch
- Patent number 6,753,264
- Issue date Jun 22, 2004
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch aided by electrically shorting upper and lower sidewall portio...
- Patent number 6,730,609
- Issue date May 4, 2004
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling striations and CD loss in contact oxide etch
- Patent number 6,716,763
- Issue date Apr 6, 2004
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Recessed container cells and method of forming the same
- Patent number 6,583,457
- Issue date Jun 24, 2003
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing tapered opening using an anisotropic etch...
- Patent number 6,524,875
- Issue date Feb 25, 2003
- Micron Technology, Inc.
- Thomas A. Figura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching methods
- Patent number 6,492,279
- Issue date Dec 10, 2002
- Micron Technology, Inc.
- David S. Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of a self-aligned structure
- Patent number 6,420,259
- Issue date Jul 16, 2002
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process and apparatus for improving the performance of a temperatur...
- Patent number 6,413,875
- Issue date Jul 2, 2002
- Micron Technology, Inc.
- Guy T. Blalock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-limiting method of reducing contamination in a contact opening...
- Patent number 6,400,029
- Issue date Jun 4, 2002
- Micron Technology, Inc.
- Guy T. Blalock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing surface defects or other recesses during the for...
- Patent number 6,355,566
- Issue date Mar 12, 2002
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for using photo-definable layers in the manufacture of semi...
- Patent number 6,350,706
- Issue date Feb 26, 2002
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling striations and CD loss in contact oxide etch
- Patent number 6,335,292
- Issue date Jan 1, 2002
- Micron Technology, Inc.
- Li Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask having a tapered profile used during the formation of a semico...
- Patent number 6,329,109
- Issue date Dec 11, 2001
- Micron Technology, Inc.
- Thomas A. Figura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Recessed-container cells and method of forming the same
- Patent number 6,313,022
- Issue date Nov 6, 2001
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a contact during the formation of a semiconducto...
- Patent number 6,274,936
- Issue date Aug 14, 2001
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-limiting method of reducing contamination in a contact opening...
- Patent number 6,232,219
- Issue date May 15, 2001
- Micron Technology, Inc.
- Guy T. Blalock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing surface defects or other recesses during the for...
- Patent number 6,228,772
- Issue date May 8, 2001
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF CONTROLLING STRIATIONS AND CD LOSS IN CONTACT OXIDE ETCH
- Publication number 20090081877
- Publication date Mar 26, 2009
- Li Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Etch aided by electrically shorting upper and lower sidewall portio...
- Publication number 20060281319
- Publication date Dec 14, 2006
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Barrier layer, IC via, and IC line forming methods
- Publication number 20060264037
- Publication date Nov 23, 2006
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming contact openings
- Publication number 20060255011
- Publication date Nov 16, 2006
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching a substrate
- Publication number 20060252198
- Publication date Nov 9, 2006
- Li Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of in-situ chamber cleaning
- Publication number 20060201624
- Publication date Sep 14, 2006
- Bradley J. Howard
- B08 - CLEANING
Information Patent Application
Multifrequency plasma reactor and method of etching
- Publication number 20060054596
- Publication date Mar 16, 2006
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Barrier layer, IC via, and IC line forming methods
- Publication number 20060046472
- Publication date Mar 2, 2006
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching methods and contact opening forming methods
- Publication number 20050284843
- Publication date Dec 29, 2005
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching a substrate
- Publication number 20050056875
- Publication date Mar 17, 2005
- Li Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-frequency plasma reactor and method of etching
- Publication number 20050022933
- Publication date Feb 3, 2005
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch aided by electrically shorting upper and lower sidewall portio...
- Publication number 20040203240
- Publication date Oct 14, 2004
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for using photo-definable layers in the manufacture of semi...
- Publication number 20040101784
- Publication date May 27, 2004
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of in-situ chamber cleaning
- Publication number 20040025903
- Publication date Feb 12, 2004
- Bradley J. Howard
- B08 - CLEANING
Information Patent Application
Plasma etching methods
- Publication number 20030207581
- Publication date Nov 6, 2003
- David S. Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of controlling striations and CD loss in contact oxide etch
- Publication number 20030096506
- Publication date May 22, 2003
- Li Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Etch aided by electrically shorting upper and lower sidewall portio...
- Publication number 20030068896
- Publication date Apr 10, 2003
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching methods
- Publication number 20030036283
- Publication date Feb 20, 2003
- David S. Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING TAPERED OPENINGS USING AN ANISOTROPIC ETCH...
- Publication number 20030017638
- Publication date Jan 23, 2003
- Thomas A. Figura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for using photo-definable layers in the manufacture of semi...
- Publication number 20030008513
- Publication date Jan 9, 2003
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR USING PHOTO-DEFINABLE LAYERS IN THE MANUFACTURE OF SEMI...
- Publication number 20020039809
- Publication date Apr 4, 2002
- BRADLEY J. HOWARD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of controlling striations and CD loss in contact oxide etch
- Publication number 20020019140
- Publication date Feb 14, 2002
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of controlling striations and CD loss in contact oxide etch
- Publication number 20010050413
- Publication date Dec 13, 2001
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS

Bradley J. Howard

Person

Patents Grantslast 30 patents

Method of controlling striations and CD loss in contact oxide etch

Multifrequency plasma reactor

Plasma etching methods and contact opening forming methods

Etch aided by electrically shorting upper and lower sidewall portio...

Barrier layer, IC via, and IC line forming methods

Method of plasma etching a substrate

Process for using photo-definable layers in the manufacture of semi...

Barrier layer, IC via, and IC line forming methods

Method of forming contact openings

Method of plasma etching a substrate

Etch aided by electrically shorting upper and lower sidewall portio...

Plasma etching methods

Plasma etching methods

Method of controlling striations and CD loss in contact oxide etch

Etch aided by electrically shorting upper and lower sidewall portio...

Method of controlling striations and CD loss in contact oxide etch

Recessed container cells and method of forming the same

Method for manufacturing tapered opening using an anisotropic etch...

Plasma etching methods

Formation of a self-aligned structure

Process and apparatus for improving the performance of a temperatur...

Self-limiting method of reducing contamination in a contact opening...

Method of removing surface defects or other recesses during the for...

Process for using photo-definable layers in the manufacture of semi...

Method of controlling striations and CD loss in contact oxide etch

Mask having a tapered profile used during the formation of a semico...

Recessed-container cells and method of forming the same

Method for forming a contact during the formation of a semiconducto...

Self-limiting method of reducing contamination in a contact opening...

Method of removing surface defects or other recesses during the for...

Patents Applicationslast 30 patents

METHOD OF CONTROLLING STRIATIONS AND CD LOSS IN CONTACT OXIDE ETCH

Etch aided by electrically shorting upper and lower sidewall portio...

Barrier layer, IC via, and IC line forming methods

Method of forming contact openings

Method of plasma etching a substrate

Method of in-situ chamber cleaning

Multifrequency plasma reactor and method of etching

Barrier layer, IC via, and IC line forming methods

Plasma etching methods and contact opening forming methods

Method of plasma etching a substrate

Multi-frequency plasma reactor and method of etching

Etch aided by electrically shorting upper and lower sidewall portio...

Process for using photo-definable layers in the manufacture of semi...

Method of in-situ chamber cleaning

Plasma etching methods

Method of controlling striations and CD loss in contact oxide etch

Etch aided by electrically shorting upper and lower sidewall portio...

Plasma etching methods

METHOD FOR MANUFACTURING TAPERED OPENINGS USING AN ANISOTROPIC ETCH...

Process for using photo-definable layers in the manufacture of semi...

PROCESS FOR USING PHOTO-DEFINABLE LAYERS IN THE MANUFACTURE OF SEMI...

Method of controlling striations and CD loss in contact oxide etch

Method of controlling striations and CD loss in contact oxide etch