Brent Schwab

Person

Burnsville, MN, US

People

Patents Grantslast 30 patents

Information Patent Grant
System and method for monitoring treatment of microelectronic subst...
- Patent number 10,748,788
- Issue date Aug 18, 2020
- Tel FSI, Inc.
- Brent D. Schwab
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of silyating agents
- Patent number 7,425,505
- Issue date Sep 16, 2008
- FSI International, Inc.
- Philip G. Clark
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching high-k films in solutions comprising dilute fluo...
- Patent number 6,835,667
- Issue date Dec 28, 2004
- FSI International, Inc.
- Kurt K. Christenson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Equipment for UV wafer heating and photochemistry
- Patent number 6,663,792
- Issue date Dec 16, 2003
- FSI International, Inc.
- Robert T. Fayfield
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of surface preparation
- Patent number 6,465,374
- Issue date Oct 15, 2002
- FSI International, Inc.
- Jeffery W. Butterbaugh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for processing both sides of a microelectronic device pre...
- Patent number 6,287,413
- Issue date Sep 11, 2001
- FSI International, Inc.
- Robert T. Fayfield
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
HF/IPA based process for removing undesired oxides form a substrate
- Patent number 6,221,168
- Issue date Apr 24, 2001
- FSI International, Inc.
- Lawrence E. Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Equipment for UV wafer heating and photochemistry
- Patent number 6,165,273
- Issue date Dec 26, 2000
- FSI International Inc.
- Robert T. Fayfield
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
UV/halogen treatment for dry oxide etching
- Patent number 5,922,219
- Issue date Jul 13, 1999
- FSI International, Inc.
- Robert T. Fayfield
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR MONITORING TREATMENT OF MICROELECTRONIC SUBST...
- Publication number 20180269080
- Publication date Sep 20, 2018
- TEL FSI, Inc.
- Brent D. Schwab
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning process for semiconductor substrates
- Publication number 20060272677
- Publication date Dec 7, 2006
- Nam Pyo Lee
- B08 - CLEANING
Information Patent Application
Use of, silyating agents
- Publication number 20050032293
- Publication date Feb 10, 2005
- Philip G. Clark
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for etching high-k films in solutions comprising dilute fluo...
- Publication number 20030235985
- Publication date Dec 25, 2003
- Kurt K. Christenson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gaseous process for surface preparation
- Publication number 20020025684
- Publication date Feb 28, 2002
- Jeffrey W. Butterbaugh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Equipment for UV wafer heating and photochemistry
- Publication number 20010000098
- Publication date Apr 5, 2001
- Robert T. Fayfield
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Brent Schwab

Person

Patents Grantslast 30 patents

System and method for monitoring treatment of microelectronic subst...

Use of silyating agents

Method for etching high-k films in solutions comprising dilute fluo...

Equipment for UV wafer heating and photochemistry

Method of surface preparation

Apparatus for processing both sides of a microelectronic device pre...

HF/IPA based process for removing undesired oxides form a substrate

Equipment for UV wafer heating and photochemistry

UV/halogen treatment for dry oxide etching

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR MONITORING TREATMENT OF MICROELECTRONIC SUBST...

Cleaning process for semiconductor substrates

Use of, silyating agents

Method for etching high-k films in solutions comprising dilute fluo...

Gaseous process for surface preparation

Equipment for UV wafer heating and photochemistry