Brett C. Richardson

Person

San Ramon, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for correcting non-uniformities in plasma proce...
- Patent number 10,872,748
- Issue date Dec 22, 2020
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge ring assembly for improving feature profile tilting at extreme...
- Patent number 10,854,492
- Issue date Dec 1, 2020
- Lam Research Corporation
- William Frederick Bosch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Component of a substrate support assembly producing localized magne...
- Patent number 10,388,493
- Issue date Aug 20, 2019
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulated dielectric window assembly of an inductively coupled plas...
- Patent number 9,437,400
- Issue date Sep 6, 2016
- Lam Research Corporation
- David Setton
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lower electrode assembly of plasma processing chamber
- Patent number 9,412,555
- Issue date Aug 9, 2016
- Lam Research Corporation
- Jason Augustino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for optimizing a substrate in a plasma proces...
- Patent number 7,190,119
- Issue date Mar 13, 2007
- Lam Research Corporation
- Roger Patrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma cleaning of deposition chamber residues using duo-step wafer...
- Patent number 7,028,696
- Issue date Apr 18, 2006
- Lam Research Corporation
- Brett C. Richardson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrates
- Patent number 6,921,493
- Issue date Jul 26, 2005
- Lam Research Corporation
- Ann Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
End point determination of process residues in wafer-less auto clea...
- Patent number 6,815,362
- Issue date Nov 9, 2004
- Lam Research Corporation
- Vincent Wong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning and conditioning plasma reaction chamber
- Patent number 6,350,697
- Issue date Feb 26, 2002
- Lam Research Corporation
- Brett C. Richardson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of and apparatus for minimizing plasma instability in an rf...
- Patent number 6,060,837
- Issue date May 9, 2000
- Lam Research Corporation
- Brett C. Richardson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and apparatus for igniting a plasma in an r.f. plasma pro...
- Patent number 5,982,099
- Issue date Nov 9, 1999
- Lam Research Corporation
- Michael S. Barnes
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Techniques for reducing particulate contamination on a substrate du...
- Patent number 5,961,724
- Issue date Oct 5, 1999
- Lam Research Corporation
- Farro Kaveh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and apparatus for minimizing plasma instability in an RF...
- Patent number 5,929,717
- Issue date Jul 27, 1999
- Lam Research Corporation
- Brett C. Richardson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for reducing byproduct particle generation in...
- Patent number 5,916,454
- Issue date Jun 29, 1999
- Lam Research Corporation
- Brett C. Richardson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for pressure control in vacuum processors
- Patent number 5,803,107
- Issue date Sep 8, 1998
- Lam Research Corporation
- Farro Frank Kaveh
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and apparatus for pressure control in vacuum processors
- Patent number 5,758,680
- Issue date Jun 2, 1998
- Lam Research Corporation
- Farro Frank Kaveh
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method of and apparatus for controlling reactive impedances of a ma...
- Patent number 5,689,215
- Issue date Nov 18, 1997
- Lam Research Corporation
- Brett Richardson
- H03 - BASIC ELECTRONIC CIRCUITRY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR CORRECTING NON-UNIFORMITIES IN PLASMA PROCE...
- Publication number 20190371576
- Publication date Dec 5, 2019
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING ASSEMBLY FOR IMPROVING FEATURE PROFILE TILTING AT EXTREME...
- Publication number 20170053820
- Publication date Feb 23, 2017
- LAM RESEARCH CORPORATION
- William Frederick Bosch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WEAR DETECTION OF CONSUMABLE PART IN SEMICONDUCTOR MANUFACTURING EQ...
- Publication number 20170053819
- Publication date Feb 23, 2017
- LAM RESEARCH CORPORATION
- Brett C. Richardson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR COATING SURFACES
- Publication number 20160254125
- Publication date Sep 1, 2016
- LAM RESEARCH CORPORATION
- Lihua Li HUANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INSULATED DIELECTRIC WINDOW ASSEMBLY OF AN INDUCTIVELY COUPLED PLAS...
- Publication number 20130292055
- Publication date Nov 7, 2013
- LAM RESEARCH CORPORATION
- David Setton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT OF A SUBSTRATE SUPPORT ASSEMBLY PRODUCING LOCALIZED MAGNE...
- Publication number 20130072025
- Publication date Mar 21, 2013
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOWER ELECTRODE ASSEMBLY OF PLASMA PROCESSING CHAMBER
- Publication number 20100108261
- Publication date May 6, 2010
- LAM RESEARCH CORPORATION
- Jason Augustino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma cleaning of deposition chamber residues using duo-step wafer...
- Publication number 20060130873
- Publication date Jun 22, 2006
- LAM RESEARCH CORPORATION
- Brett C. Richardson
- B08 - CLEANING
Information Patent Application
Methods and apparatus for optimizing a substrate in a plasma proces...
- Publication number 20050205532
- Publication date Sep 22, 2005
- Roger Patrick
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Endpoint determination of process residues in wafer-less auto clean...
- Publication number 20040235303
- Publication date Nov 25, 2004
- LAM RESEARCH CORPORATION
- Vincent Wong
- B08 - CLEANING
Information Patent Application
Plasma cleaning of deposition chamber residues using duo-step wafer...
- Publication number 20030000546
- Publication date Jan 2, 2003
- LAM RESEARCH CORPORATION
- Brett C. Richardson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Applications of oxide hardmasking in metal dry etch processors
- Publication number 20020192957
- Publication date Dec 19, 2002
- LAM RESEARCH CORPORATION
- Ann Chien
- H01 - BASIC ELECTRIC ELEMENTS

Brett C. Richardson

Person

Patents Grantslast 30 patents

Systems and methods for correcting non-uniformities in plasma proce...

Edge ring assembly for improving feature profile tilting at extreme...

Component of a substrate support assembly producing localized magne...

Insulated dielectric window assembly of an inductively coupled plas...

Lower electrode assembly of plasma processing chamber

Methods and apparatus for optimizing a substrate in a plasma proces...

Plasma cleaning of deposition chamber residues using duo-step wafer...

Method of processing substrates

End point determination of process residues in wafer-less auto clea...

Method of cleaning and conditioning plasma reaction chamber

Method of and apparatus for minimizing plasma instability in an rf...

Method of and apparatus for igniting a plasma in an r.f. plasma pro...

Techniques for reducing particulate contamination on a substrate du...

Method of and apparatus for minimizing plasma instability in an RF...

Methods and apparatus for reducing byproduct particle generation in...

Method and apparatus for pressure control in vacuum processors

Method and apparatus for pressure control in vacuum processors

Method of and apparatus for controlling reactive impedances of a ma...

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR CORRECTING NON-UNIFORMITIES IN PLASMA PROCE...

EDGE RING ASSEMBLY FOR IMPROVING FEATURE PROFILE TILTING AT EXTREME...

WEAR DETECTION OF CONSUMABLE PART IN SEMICONDUCTOR MANUFACTURING EQ...

METHOD FOR COATING SURFACES

INSULATED DIELECTRIC WINDOW ASSEMBLY OF AN INDUCTIVELY COUPLED PLAS...

COMPONENT OF A SUBSTRATE SUPPORT ASSEMBLY PRODUCING LOCALIZED MAGNE...

LOWER ELECTRODE ASSEMBLY OF PLASMA PROCESSING CHAMBER

Plasma cleaning of deposition chamber residues using duo-step wafer...

Methods and apparatus for optimizing a substrate in a plasma proces...

Endpoint determination of process residues in wafer-less auto clean...

Plasma cleaning of deposition chamber residues using duo-step wafer...

Applications of oxide hardmasking in metal dry etch processors