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Brian Brown
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Palo Alto, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Roller for location-specific wafer polishing
Patent number
12,138,733
Issue date
Nov 12, 2024
Applied Materials, Inc.
Ekaterina A. Mikhaylichenko
B24 - GRINDING POLISHING
Information
Patent Grant
Cleaning method with in-line SPM processing
Patent number
12,051,599
Issue date
Jul 30, 2024
Applied Materials, Inc.
Brian J. Brown
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Polishing carrier head with piezoelectric pressure control
Patent number
12,030,156
Issue date
Jul 9, 2024
Applied Materials, Inc.
Brian J. Brown
B24 - GRINDING POLISHING
Information
Patent Grant
Surface cleaning with directed high pressure chemistry
Patent number
12,027,382
Issue date
Jul 2, 2024
Applied Materials, Inc.
Brian K. Kirkpatrick
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Wafer edge asymmetry correction using groove in polishing pad
Patent number
11,951,589
Issue date
Apr 9, 2024
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Grant
Control of processing parameters for substrate polishing with angul...
Patent number
11,931,853
Issue date
Mar 19, 2024
Applied Materials, Inc.
Eric Lau
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing using time share control
Patent number
11,931,854
Issue date
Mar 19, 2024
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Grant
Low-temperature metal CMP for minimizing dishing and corrosion, and...
Patent number
11,897,079
Issue date
Feb 13, 2024
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing carrier head with piezoelectric pressure control
Patent number
11,890,715
Issue date
Feb 6, 2024
Applied Materials, Inc.
Brian J. Brown
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing using time share control
Patent number
11,883,923
Issue date
Jan 30, 2024
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Grant
Temperature and slurry flow rate control in CMP
Patent number
11,826,872
Issue date
Nov 28, 2023
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Grant
Apparatus and method of substrate edge cleaning and substrate carri...
Patent number
11,823,916
Issue date
Nov 21, 2023
Applied Materials, Inc.
Wei Lu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Asymmetry correction via variable relative velocity of a wafer
Patent number
11,764,069
Issue date
Sep 19, 2023
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Grant
Cleaning system with in-line SPM processing
Patent number
11,682,567
Issue date
Jun 20, 2023
Applied Materials, Inc.
Brian J. Brown
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Retaining ring design
Patent number
11,400,560
Issue date
Aug 2, 2022
Applied Materials, Inc.
Jeonghoon Oh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chemical mechanical polishing using time share control
Patent number
11,298,794
Issue date
Apr 12, 2022
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Grant
High throughput polishing system for workpieces
Patent number
11,267,095
Issue date
Mar 8, 2022
UTICA LEASECO, LLC
Stephen M. Fisher
B24 - GRINDING POLISHING
Information
Patent Grant
Reflector and susceptor assembly for chemical vapor deposition reactor
Patent number
10,932,323
Issue date
Feb 23, 2021
Alta Devices, Inc.
Brian Burrows
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Single use rinse in a linear Marangoni drier
Patent number
10,672,628
Issue date
Jun 2, 2020
Applied Materials, Inc.
Brian J. Brown
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Epitaxial lift off systems and methods
Patent number
10,259,206
Issue date
Apr 16, 2019
Alta Devices, Inc.
Brian Brown
B32 - LAYERED PRODUCTS
Information
Patent Grant
Systems, methods and apparatus for post-chemical mechanical planari...
Patent number
10,256,120
Issue date
Apr 9, 2019
Applied Materials, Inc.
Clinton P. Sakata
B08 - CLEANING
Information
Patent Grant
Double sided buff module for post CMP cleaning
Patent number
10,229,842
Issue date
Mar 12, 2019
Applied Materials, Inc.
Clinton Sakata
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
In-situ temperature control during chemical mechanical polishing wi...
Patent number
10,058,975
Issue date
Aug 28, 2018
Applied Materials, Inc.
Brian J. Brown
B24 - GRINDING POLISHING
Information
Patent Grant
Systems and methods for rinsing and drying substrates
Patent number
9,984,867
Issue date
May 29, 2018
Applied Materials, Inc.
Ekaterina Mikhaylichenko
B08 - CLEANING
Information
Patent Grant
High throughput polishing system for workpieces
Patent number
9,950,404
Issue date
Apr 24, 2018
Alta Devices, Inc.
Stephen M. Fisher
B24 - GRINDING POLISHING
Information
Patent Grant
Substrate rinsing systems and methods
Patent number
9,859,135
Issue date
Jan 2, 2018
Applied Materials, Inc.
Jonathan S. Frankel
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Systems, methods and apparatus for post-chemical mechanical planari...
Patent number
9,844,800
Issue date
Dec 19, 2017
Applied Materials, Inc.
Steven M. Zuniga
B24 - GRINDING POLISHING
Information
Patent Grant
Single use rinse in a linear Marangoni drier
Patent number
9,728,428
Issue date
Aug 8, 2017
Applied Materials, Inc.
Brian J. Brown
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Conditioning of grooving in polishing pads
Patent number
9,486,893
Issue date
Nov 8, 2016
Applied Materials, Inc.
Hung Chen
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Epitaxial lift off systems and methods
Patent number
9,381,731
Issue date
Jul 5, 2016
Alta Devices, Inc.
Brian Brown
B32 - LAYERED PRODUCTS
Patents Applications
last 30 patents
Information
Patent Application
PROCESS CONTROL METHOD FOR PATTERN WAFER INDEX POLISHING
Publication number
20240371646
Publication date
Nov 7, 2024
Applied Materials, Inc.
Jimin ZHANG
B24 - GRINDING POLISHING
Information
Patent Application
DETERMINING THE ORIENTATION OF A SUBSTRATE IN-SITU
Publication number
20240359291
Publication date
Oct 31, 2024
Applied Materials, Inc.
Wei LU
B24 - GRINDING POLISHING
Information
Patent Application
APPARATUS AND METHOD OF BRUSH CLEANING USING PERIODIC CHEMICAL TREA...
Publication number
20240332037
Publication date
Oct 3, 2024
Applied Materials, Inc.
Brian J. BROWN
B08 - CLEANING
Information
Patent Application
INDEX POLISHING FOR PROCESS CONTROL SIGNAL AND WAFER UNIFORMITY
Publication number
20240269796
Publication date
Aug 15, 2024
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Application
APPARATUS AND METHOD FOR CONTROLLING SUBSTRATE POLISH EDGE UNIFORMITY
Publication number
20240253183
Publication date
Aug 1, 2024
Applied Materials, Inc.
Priscilla Michelle Diep LAROSA
B24 - GRINDING POLISHING
Information
Patent Application
ACOUSTIC CARRIER HEAD MONITORING
Publication number
20240139900
Publication date
May 2, 2024
Applied Materials, Inc.
Jeonghoon Oh
B24 - GRINDING POLISHING
Information
Patent Application
CARRIER HEAD ACOUSTIC MONITORING WITH SENSOR IN PLATEN
Publication number
20240139905
Publication date
May 2, 2024
Applied Materials, Inc.
Benjamin Cherian
B24 - GRINDING POLISHING
Information
Patent Application
METHOD FOR CMP TEMPERATURE CONTROL
Publication number
20240109163
Publication date
Apr 4, 2024
Applied Materials, Inc.
Haosheng Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
WAFER EDGE ASYMMETRY CORRECTION USING GROOVE IN POLISHING PAD
Publication number
20240075583
Publication date
Mar 7, 2024
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Application
LOW-TEMPERATURE METAL CMP FOR MINIMIZING DISHING AND CORROSION, AND...
Publication number
20240066660
Publication date
Feb 29, 2024
Applied Materials, Inc.
Haosheng Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS AND METHOD OF SUBSTRATE EDGE CLEANING AND SUBSTRATE CARRI...
Publication number
20240047238
Publication date
Feb 8, 2024
Applied Materials, Inc.
Wei LU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CLEANING OF CMP TEMPERATURE CONTROL SYSTEM
Publication number
20240042570
Publication date
Feb 8, 2024
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Application
TEMPERATURE AND SLURRY FLOW RATE CONTROL IN CMP
Publication number
20240025006
Publication date
Jan 25, 2024
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Application
MONITORING THICKNESS IN FACE-UP POLISHING WITH ROLLER
Publication number
20240017376
Publication date
Jan 18, 2024
Applied Materials, Inc.
Brian J. Brown
B24 - GRINDING POLISHING
Information
Patent Application
MONITORING THICKNESS IN FACE-UP POLISHING
Publication number
20240017371
Publication date
Jan 18, 2024
Applied Materials, Inc.
Brian J. Brown
B24 - GRINDING POLISHING
Information
Patent Application
ACOUSTIC MONITORING OF CONDITIONER DURING POLISHING
Publication number
20230390891
Publication date
Dec 7, 2023
Applied Materials, Inc.
Thomas H. Osterheld
B24 - GRINDING POLISHING
Information
Patent Application
CONDENSED GAS PAD CONDITIONER
Publication number
20230390894
Publication date
Dec 7, 2023
Applied Materials, Inc.
Jeonghoon Oh
B24 - GRINDING POLISHING
Information
Patent Application
ACOUSTIC MONITORING OF CMP RETAINING RING
Publication number
20230390883
Publication date
Dec 7, 2023
Applied Materials, Inc.
Haoquan Fang
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING HEAD WITH LOCAL INNER RING DOWNFORCE CONTROL
Publication number
20230356355
Publication date
Nov 9, 2023
Applied Materials, Inc.
Jeonghoon Oh
B24 - GRINDING POLISHING
Information
Patent Application
CLEANING METHOD WITH IN-LINE SPM PROCESSING
Publication number
20230290652
Publication date
Sep 14, 2023
Applied Materials, Inc.
Brian J. Brown
B08 - CLEANING
Information
Patent Application
SURFACE CLEANING WITH DIRECTED HIGH PRESSURE CHEMISTRY
Publication number
20230178388
Publication date
Jun 8, 2023
Applied Materials, Inc.
Brian K. Kirkpatrick
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
POINT-OF-USE ULTRASONIC HOMOGENIZER FOR CMP SLURRY AGGLOMERATION RE...
Publication number
20230054165
Publication date
Feb 23, 2023
Applied Materials, Inc.
Chih Chung Chou
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information
Patent Application
ASYMMETRY CORRECTION VIA VARIABLE RELATIVE VELOCITY OF A WAFER
Publication number
20220379428
Publication date
Dec 1, 2022
Applied Materials, Inc.
Jimin ZHANG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Chemical Mechanical Polishing With Die-Based Modification
Publication number
20220359219
Publication date
Nov 10, 2022
Applied Materials, Inc.
Haosheng Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RETAINING RING DESIGN
Publication number
20220339755
Publication date
Oct 27, 2022
Applied Materials, Inc.
Jeonghoon OH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CONTROL OF PROCESSING PARAMETERS FOR SUBSTRATE POLISHING WITH SUBST...
Publication number
20220283554
Publication date
Sep 8, 2022
Applied Materials, Inc.
Eric Lau
B24 - GRINDING POLISHING
Information
Patent Application
CONTROL OF PROCESSING PARAMETERS FOR SUBSTRATE POLISHING WITH ANGUL...
Publication number
20220281053
Publication date
Sep 8, 2022
Applied Materials, Inc.
Eric Lau
B24 - GRINDING POLISHING
Information
Patent Application
ROLLER FOR LOCATION-SPECIFIC WAFER POLISHING
Publication number
20220281062
Publication date
Sep 8, 2022
Applied Materials, Inc.
Ekaterina A. Mikhaylichenko
B24 - GRINDING POLISHING
Information
Patent Application
CHEMICAL MECHANICAL POLISHING USING TIME SHARE CONTROL
Publication number
20220234163
Publication date
Jul 28, 2022
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Application
APPARATUS AND METHOD OF SUBSTRATE EDGE CLEANING AND SUBSTRATE CARRI...
Publication number
20220148892
Publication date
May 12, 2022
Applied Materials, Inc.
Wei LU
H01 - BASIC ELECTRIC ELEMENTS