Brian L. Mueller

Person

Aurora, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for electrochemical planarization of a workpiece
- Patent number 8,268,135
- Issue date Sep 18, 2012
- Novellus Systems, Inc.
- Ismail Emesh
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System for the preferential removal of silicon oxide
- Patent number 7,365,013
- Issue date Apr 29, 2008
- Cabot Microelectronics Corporation
- Brian L. Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for the preferential removal of silicon oxide
- Patent number 7,238,618
- Issue date Jul 3, 2007
- Cabot Microelectronics Corporation
- Brian L. Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions for oxide CMP
- Patent number 6,984,588
- Issue date Jan 10, 2006
- Cabot Microelectronics Corporation
- Gautam S. Grover
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for electrochemical planarization of a workpiece
- Patent number 6,974,525
- Issue date Dec 13, 2005
- SpeedFam-IPEC Corporation
- Ismail Emesh
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and process for polishing a workpiece
- Patent number 6,849,547
- Issue date Feb 1, 2005
- SpeedFam-IPEC Corporation
- Saket Chadda
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for electrochemical planarization of a workpiece
- Patent number 6,736,952
- Issue date May 18, 2004
- SpeedFam-IPEC Corporation
- Ismail Emesh
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Preequilibrium polishing method and system
- Patent number 6,726,534
- Issue date Apr 27, 2004
- Cabot Microelectronics Corporation
- Gregory H. Bogush
- B24 - GRINDING POLISHING
Information Patent Grant
Composition for oxide CMP
- Patent number 6,689,692
- Issue date Feb 10, 2004
- Cabot Microelectronics Corporation
- Gautam S. Grover
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alkali metal-containing polishing system and method
- Patent number 6,612,911
- Issue date Sep 2, 2003
- Cabot Microelectronics Corporation
- Phillip Carter
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method and apparatus for electrochemically depositing a material on...
- Patent number 6,572,755
- Issue date Jun 3, 2003
- SpeedFam-IPEC Corporation
- Ismail Emesh
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Chemical mechanical polishing slurry and method for using same
- Patent number 6,533,832
- Issue date Mar 18, 2003
- Cabot Microelectronics Corporation
- J. Scott Steckenrider
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and method for planarizing surfaces
- Patent number 6,527,817
- Issue date Mar 4, 2003
- Cabot Microelectronics Corporation
- Mingming Fang
- G11 - INFORMATION STORAGE
Information Patent Grant
CMP polishing pad including a solid catalyst
- Patent number 6,435,947
- Issue date Aug 20, 2002
- Cabot Microelectronics Corporation
- Brian L. Mueller
- B24 - GRINDING POLISHING
Information Patent Grant
Catalytic reactive pad for metal CMP
- Patent number 6,383,065
- Issue date May 7, 2002
- Cabot Microelectronics Corporation
- Steven K. Grumbine
- B24 - GRINDING POLISHING
Information Patent Grant
Method for polishing a substrate using a CMP slurry
- Patent number 6,362,104
- Issue date Mar 26, 2002
- Cabot Microelectronics Corporation
- Shumin Wang
- B24 - GRINDING POLISHING
Information Patent Grant
Use of CsOH in a dielectric CMP slurry
- Patent number 6,350,393
- Issue date Feb 26, 2002
- Cabot Microelectronics Corporation
- Alicia F. Francis
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition and method for planarizing surfaces
- Patent number 6,319,096
- Issue date Nov 20, 2001
- Cabot Corporation
- Brian L. Mueller
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition and method for planarizing surfaces
- Patent number 6,293,848
- Issue date Sep 25, 2001
- Cabot Microelectronics Corporation
- Mingming Fang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP slurry containing a solid catalyst
- Patent number 6,177,026
- Issue date Jan 23, 2001
- Cabot Microelectronics Corporation
- Shumin Wang
- B24 - GRINDING POLISHING
Information Patent Grant
Storage stable autodepositable dispersions of epoxy resins and proc...
- Patent number 6,096,806
- Issue date Aug 1, 2000
- Henkel Corporation
- Brian L. Mueller
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition and slurry useful for metal CMP
- Patent number 6,068,787
- Issue date May 30, 2000
- Cabot Corporation
- Steven K. Grumbine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition and method for polishing rigid disks
- Patent number 6,015,506
- Issue date Jan 18, 2000
- Cabot Corporation
- Christopher C. Streinz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluoride additive containing chemical mechanical polishing slurry a...
- Patent number 5,993,686
- Issue date Nov 30, 1999
- Cabot Corporation
- Christopher C. Streinz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition and slurry useful for metal CMP
- Patent number 5,980,775
- Issue date Nov 9, 1999
- Cabot Corporation
- Steven K. Grumbine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition and slurry useful for metal CMP
- Patent number 5,958,288
- Issue date Sep 28, 1999
- Cabot Corporation
- Brian L. Mueller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical mechanical polishing slurry for metal layers and films
- Patent number 5,858,813
- Issue date Jan 12, 1999
- Cabot Corporation
- Debra L. Scherber
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition for oxide CMP
- Patent number 5,759,917
- Issue date Jun 2, 1998
- Cabot Corporation
- Gautam S. Grover
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
System for the Preferential Removal of Silicon Oxide
- Publication number 20070120090
- Publication date May 31, 2007
- Cabot Microelectronics Corporation
- Brian L. MUELLER
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD AND APPARATUS FOR ELECTROCHEMICAL PLANARIZATION OF A WORKPIECE
- Publication number 20060081460
- Publication date Apr 20, 2006
- SpeedFam-IPEC Corporation
- Ismail Emesh
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
System for the preferential removal of silicon oxide
- Publication number 20050072524
- Publication date Apr 7, 2005
- Cabot Microelectronics Corporation
- Brian L. Mueller
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD AND APPARATUS FOR ELECTROCHEMICAL PLANARIZATION OF A WORKPIECE
- Publication number 20040195110
- Publication date Oct 7, 2004
- SpeedFam-IPEC Corporation
- Ismail Emesh
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Compositions for oxide CMP
- Publication number 20040089634
- Publication date May 13, 2004
- Cabot Microelectronics Corporation
- Gautam S. Grover
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical mechanical polishing slurry and method for using same
- Publication number 20030143848
- Publication date Jul 31, 2003
- Cabot Microelectronics Corporation
- J. Scott Steckenrider
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Alkali metal-containing polishing system and method
- Publication number 20030082998
- Publication date May 1, 2003
- Cabot Microelectronics Corporation
- Phillip Carter
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of polishing a substrate
- Publication number 20020197935
- Publication date Dec 26, 2002
- Brian L. Mueller
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method and apparatus for electrochemically depositing a material on...
- Publication number 20020148732
- Publication date Oct 17, 2002
- Ismail Emesh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Apparatus and process for polishing a workpiece
- Publication number 20020146908
- Publication date Oct 10, 2002
- Saket Chadda
- B24 - GRINDING POLISHING
Information Patent Application
Method and apparatus for electrochemical planarization of a workpiece
- Publication number 20020108861
- Publication date Aug 15, 2002
- Ismail Emesh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY AND METHOD FOR USING SAME
- Publication number 20020032987
- Publication date Mar 21, 2002
- J. SCOTT STECKENRIDER
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
USE OF CSOH IN A DIELECTRIC CMP SLURRY
- Publication number 20010051433
- Publication date Dec 13, 2001
- Alicia F. Francis
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Integrated chemical-mechanical polishing
- Publication number 20010037821
- Publication date Nov 8, 2001
- Bradley J. Staley
- B24 - GRINDING POLISHING
Information Patent Application
CMP polishing pad including a solid catalyst
- Publication number 20010036804
- Publication date Nov 1, 2001
- Brian L. Mueller
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Brian L. Mueller

Person

Patents Grantslast 30 patents

Method and apparatus for electrochemical planarization of a workpiece

System for the preferential removal of silicon oxide

System for the preferential removal of silicon oxide

Compositions for oxide CMP

Method and apparatus for electrochemical planarization of a workpiece

Apparatus and process for polishing a workpiece

Method and apparatus for electrochemical planarization of a workpiece

Preequilibrium polishing method and system

Composition for oxide CMP

Alkali metal-containing polishing system and method

Method and apparatus for electrochemically depositing a material on...

Chemical mechanical polishing slurry and method for using same

Composition and method for planarizing surfaces

CMP polishing pad including a solid catalyst

Catalytic reactive pad for metal CMP

Method for polishing a substrate using a CMP slurry

Use of CsOH in a dielectric CMP slurry

Composition and method for planarizing surfaces

Composition and method for planarizing surfaces

CMP slurry containing a solid catalyst

Storage stable autodepositable dispersions of epoxy resins and proc...

Composition and slurry useful for metal CMP

Composition and method for polishing rigid disks

Fluoride additive containing chemical mechanical polishing slurry a...

Composition and slurry useful for metal CMP

Composition and slurry useful for metal CMP

Chemical mechanical polishing slurry for metal layers and films

Composition for oxide CMP

Patents Applicationslast 30 patents

System for the Preferential Removal of Silicon Oxide

METHOD AND APPARATUS FOR ELECTROCHEMICAL PLANARIZATION OF A WORKPIECE

System for the preferential removal of silicon oxide

METHOD AND APPARATUS FOR ELECTROCHEMICAL PLANARIZATION OF A WORKPIECE

Compositions for oxide CMP

Chemical mechanical polishing slurry and method for using same

Alkali metal-containing polishing system and method

Method of polishing a substrate

Method and apparatus for electrochemically depositing a material on...

Apparatus and process for polishing a workpiece

Method and apparatus for electrochemical planarization of a workpiece

CHEMICAL MECHANICAL POLISHING SLURRY AND METHOD FOR USING SAME

USE OF CSOH IN A DIELECTRIC CMP SLURRY

Integrated chemical-mechanical polishing

CMP polishing pad including a solid catalyst