Brian Saxton Underwood

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Deposition of silicon and oxygen-containing films without an oxidizer
- Patent number 10,790,139
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Brian Saxton Underwood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photo-assisted deposition of flowable films
- Patent number 10,460,936
- Issue date Oct 29, 2019
- Applied Materials, Inc.
- Brian Saxton Underwood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
UV-assisted material injection into porous films
- Patent number 9,947,576
- Issue date Apr 17, 2018
- Applied Materials, Inc.
- Brian Saxton Underwood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flowable silicon—carbon—oxygen layers for semiconductor processing
- Patent number 9,343,293
- Issue date May 17, 2016
- Applied Materials, Inc.
- Brian Saxton Underwood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
HDD patterning using flowable CVD film
- Patent number 8,986,557
- Issue date Mar 24, 2015
- Applied Materials, Inc.
- Brian Saxton Underwood
- G11 - INFORMATION STORAGE
Information Patent Grant
Low cost flowable dielectric films
- Patent number 8,889,566
- Issue date Nov 18, 2014
- Applied Materials, Inc.
- Amit Chatterjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molecular layer deposition of silicon carbide
- Patent number 8,753,985
- Issue date Jun 17, 2014
- Applied Materials, Inc.
- Brian Underwood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PHOTO-ASSISTED DEPOSITION OF FLOWABLE FILMS
- Publication number 20180040473
- Publication date Feb 8, 2018
- Applied Materials, Inc.
- Brian Saxton UNDERWOOD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UV-ASSISTED MATERIAL INJECTION INTO POROUS FILMS
- Publication number 20170018455
- Publication date Jan 19, 2017
- Applied Materials, Inc.
- Brian Saxton Underwood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF SILICON AND OXYGEN-CONTAINING FILMS WITHOUT AN OXIDIZER
- Publication number 20160336174
- Publication date Nov 17, 2016
- Applied Materials, Inc.
- Brian Saxton UNDERWOOD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON FILM STRESS RELAXATION
- Publication number 20150200094
- Publication date Jul 16, 2015
- Applied Materials, Inc.
- Brian Saxton Underwood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTO-ASSISTED DEPOSITION OF FLOWABLE FILMS
- Publication number 20150187563
- Publication date Jul 2, 2015
- Applied Materials, Inc.
- BRIAN SAXTON UNDERWOOD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL LINKERS TO IMPART IMPROVED MECHANICAL STRENGTH TO FLOWABLE...
- Publication number 20140302690
- Publication date Oct 9, 2014
- Applied Materials, Inc.
- Brian S. Underwood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOWABLE SILICON-CARBON-OXYGEN LAYERS FOR SEMICONDUCTOR PROCESSING
- Publication number 20140302688
- Publication date Oct 9, 2014
- Applied Materials, Inc.
- Brian Saxton Underwood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HDD PATTERNING USING FLOWABLE CVD FILM
- Publication number 20140231384
- Publication date Aug 21, 2014
- Brian Saxton UNDERWOOD
- G11 - INFORMATION STORAGE
Information Patent Application
LOW COST FLOWABLE DIELECTRIC FILMS
- Publication number 20140073144
- Publication date Mar 13, 2014
- Amit Chatterjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOLECULAR LAYER DEPOSITION OF SILICON CARBIDE
- Publication number 20130267079
- Publication date Oct 10, 2013
- Applied Materials, Inc.
- Brian Underwood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TREATMENTS FOR DECREASING ETCH RATES AFTER FLOWABLE DEPOSITION OF S...
- Publication number 20130217241
- Publication date Aug 22, 2013
- Applied Materials, Inc.
- Brian S. Underwood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOWABLE SILICON-CARBON-NITROGEN LAYERS FOR SEMICONDUCTOR PROCESSING
- Publication number 20130217240
- Publication date Aug 22, 2013
- Applied Materials, Inc.
- Abhijit Basu Mallick
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOPING OF DIELECTRIC LAYERS
- Publication number 20130217243
- Publication date Aug 22, 2013
- Applied Materials, Inc.
- Brian S. Underwood
- H01 - BASIC ELECTRIC ELEMENTS

Brian Saxton Underwood

Person

Patents Grantslast 30 patents

Deposition of silicon and oxygen-containing films without an oxidizer

Photo-assisted deposition of flowable films

UV-assisted material injection into porous films

Flowable silicon—carbon—oxygen layers for semiconductor processing

HDD patterning using flowable CVD film

Low cost flowable dielectric films

Molecular layer deposition of silicon carbide

Patents Applicationslast 30 patents

PHOTO-ASSISTED DEPOSITION OF FLOWABLE FILMS

UV-ASSISTED MATERIAL INJECTION INTO POROUS FILMS

DEPOSITION OF SILICON AND OXYGEN-CONTAINING FILMS WITHOUT AN OXIDIZER

CARBON FILM STRESS RELAXATION

PHOTO-ASSISTED DEPOSITION OF FLOWABLE FILMS

CHEMICAL LINKERS TO IMPART IMPROVED MECHANICAL STRENGTH TO FLOWABLE...

FLOWABLE SILICON-CARBON-OXYGEN LAYERS FOR SEMICONDUCTOR PROCESSING

HDD PATTERNING USING FLOWABLE CVD FILM

LOW COST FLOWABLE DIELECTRIC FILMS

MOLECULAR LAYER DEPOSITION OF SILICON CARBIDE

TREATMENTS FOR DECREASING ETCH RATES AFTER FLOWABLE DEPOSITION OF S...

FLOWABLE SILICON-CARBON-NITROGEN LAYERS FOR SEMICONDUCTOR PROCESSING

DOPING OF DIELECTRIC LAYERS