Bryan J. Rice

Person

Hillsboro, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma-based debris mitigation for extreme ultraviolet (EUV) light...
- Patent number 7,652,272
- Issue date Jan 26, 2010
- Intel Corporation
- David Ruzic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Technique to prevent tin contamination of mirrors and electrodes in...
- Patent number 7,567,379
- Issue date Jul 28, 2009
- Intel Corporation
- Robert Bristol
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Active hardmask for lithographic patterning
- Patent number 7,527,920
- Issue date May 5, 2009
- Intel Corporation
- Michael Goldstein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Erosion resistance of EUV source electrodes
- Patent number 7,446,329
- Issue date Nov 4, 2008
- Intel Corporation
- Robert Bristol
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Forming a reticle for extreme ultraviolet radiation and structures...
- Patent number 7,329,588
- Issue date Feb 12, 2008
- Intel Corporation
- Kramadhati V. Ravi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-based debris mitigation for extreme ultraviolet (EUV) light...
- Patent number 7,230,258
- Issue date Jun 12, 2007
- Intel Corporation
- David Ruzic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Adjustment of distance between source plasma and mirrors to change...
- Patent number 7,208,747
- Issue date Apr 24, 2007
- Intel Corporation
- Manish Chandhok
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for plasma formation for extreme ultraviolet lithography-the...
- Patent number 7,180,082
- Issue date Feb 20, 2007
- The United States of America as represented by the United States Department o...
- Ahmed Hassanein
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet pellicle using a thin film and supportive mesh
- Patent number 7,153,615
- Issue date Dec 26, 2006
- Intel Corporation
- Robert Bristol
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Extreme ultraviolet illumination source
- Patent number 7,109,504
- Issue date Sep 19, 2006
- Intel Corporation
- Manish Chandhok
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Adjustable illumination source
- Patent number 7,098,466
- Issue date Aug 29, 2006
- Intel Corporation
- Manish Chandhok
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optics for extreme ultraviolet lithography
- Patent number 7,078,700
- Issue date Jul 18, 2006
- Intel Corporation
- Manish Chandhok
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electrode in a discharge produced plasma extreme ultraviolet source
- Patent number 7,049,614
- Issue date May 23, 2006
- Intel Corporation
- Bryan J. Rice
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Active hardmask for lithographic patterning
- Patent number 7,033,739
- Issue date Apr 25, 2006
- Intel Corporation
- Michael Goldstein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electrical discharge gas plasma EUV source insulator components
- Patent number 6,847,044
- Issue date Jan 25, 2005
- Intel Corporation
- Bryan J. Rice
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electrode insulator materials for use in extreme ultraviolet electr...
- Patent number 6,787,788
- Issue date Sep 7, 2004
- Melissa Shell
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR DIGITAL, MULTIPLEXED, EXTRACELLULAR VESICLE-D...
- Publication number 20240382958
- Publication date Nov 21, 2024
- Bryan Joseph Rice
- G01 - MEASURING TESTING
Information Patent Application
Systems and Methods for Digital, Multiplexed, Extracellular Vesicle...
- Publication number 20240319201
- Publication date Sep 26, 2024
- Bryan Joseph Rice
- G01 - MEASURING TESTING
Information Patent Application
Systems and Methods for Digital, Multiplexed, Extracellular Vesicle...
- Publication number 20230417702
- Publication date Dec 28, 2023
- Exokeryx, Inc.
- Bryan Joseph Rice
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHODS OF FORMING STRESS LINERS USING ATOMIC LAYER DEPOSITION TO F...
- Publication number 20200111704
- Publication date Apr 9, 2020
- GLOBALFOUNDRIES INC.
- Eric S. Kozarksy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-Based Debris Mitigation for Extreme Ultraviolet (EUV) Light...
- Publication number 20070235666
- Publication date Oct 11, 2007
- Intel Corporation
- David Ruzic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Adjustment of distance between source plasma and mirrors to change...
- Publication number 20060289810
- Publication date Dec 28, 2006
- Manish Chandhok
- B82 - NANO-TECHNOLOGY
Information Patent Application
Forming a reticle for extreme ultraviolet radiation and structures...
- Publication number 20060102986
- Publication date May 18, 2006
- Kramadhati V. Ravi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Active hardmask for lithographic patterning
- Publication number 20060093972
- Publication date May 4, 2006
- Michael Goldstein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme ultraviolet illumination source
- Publication number 20060017024
- Publication date Jan 26, 2006
- Manish Chandhok
- B82 - NANO-TECHNOLOGY
Information Patent Application
Adjustable illumination source
- Publication number 20060002113
- Publication date Jan 5, 2006
- Manish Chandhok
- B82 - NANO-TECHNOLOGY
Information Patent Application
Optics for extreme ultraviolet lithography
- Publication number 20060000985
- Publication date Jan 5, 2006
- Manish Chandhok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Technique to prevent tin contamination of mirrors and electrodes in...
- Publication number 20050244572
- Publication date Nov 3, 2005
- Robert Bristol
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Extreme ultraviolet pellicle using a thin film and supportive mesh
- Publication number 20050042153
- Publication date Feb 24, 2005
- Intel Corporation
- Robert Bristol
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Erosion resistance of EUV source electrodes
- Publication number 20050031502
- Publication date Feb 10, 2005
- Robert Bristol
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma-based debris mitigation for extreme ultraviolet (EUV) light...
- Publication number 20050016679
- Publication date Jan 27, 2005
- Intel Corporation
- David Ruzic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Pattern transfer of an extreme ultraviolet imaging layer via flood...
- Publication number 20040265748
- Publication date Dec 30, 2004
- Robert Bristol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Active hardmask for lithographic patterning
- Publication number 20040214113
- Publication date Oct 28, 2004
- Michael Goldstein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electrode in a discharge produced plasma extreme ultraviolet source
- Publication number 20040178365
- Publication date Sep 16, 2004
- Intel Corporation
- Bryan J. Rice
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ELECTRODE INSULATOR MATERIALS FOR USE IN EXTREME ULTRAVIOLET ELECTR...
- Publication number 20040140439
- Publication date Jul 22, 2004
- Melissa Shell
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Electrical discharge gas plasma EUV source insulator components
- Publication number 20040124373
- Publication date Jul 1, 2004
- Bryan J. Rice
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Bryan J. Rice

Person

Patents Grantslast 30 patents

Plasma-based debris mitigation for extreme ultraviolet (EUV) light...

Technique to prevent tin contamination of mirrors and electrodes in...

Active hardmask for lithographic patterning

Erosion resistance of EUV source electrodes

Forming a reticle for extreme ultraviolet radiation and structures...

Plasma-based debris mitigation for extreme ultraviolet (EUV) light...

Adjustment of distance between source plasma and mirrors to change...

Method for plasma formation for extreme ultraviolet lithography-the...

Extreme ultraviolet pellicle using a thin film and supportive mesh

Extreme ultraviolet illumination source

Adjustable illumination source

Optics for extreme ultraviolet lithography

Electrode in a discharge produced plasma extreme ultraviolet source

Active hardmask for lithographic patterning

Electrical discharge gas plasma EUV source insulator components

Electrode insulator materials for use in extreme ultraviolet electr...

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR DIGITAL, MULTIPLEXED, EXTRACELLULAR VESICLE-D...

Systems and Methods for Digital, Multiplexed, Extracellular Vesicle...

Systems and Methods for Digital, Multiplexed, Extracellular Vesicle...

METHODS OF FORMING STRESS LINERS USING ATOMIC LAYER DEPOSITION TO F...

Plasma-Based Debris Mitigation for Extreme Ultraviolet (EUV) Light...

Adjustment of distance between source plasma and mirrors to change...

Forming a reticle for extreme ultraviolet radiation and structures...

Active hardmask for lithographic patterning

Extreme ultraviolet illumination source

Adjustable illumination source

Optics for extreme ultraviolet lithography

Technique to prevent tin contamination of mirrors and electrodes in...

Extreme ultraviolet pellicle using a thin film and supportive mesh

Erosion resistance of EUV source electrodes

Plasma-based debris mitigation for extreme ultraviolet (EUV) light...

Pattern transfer of an extreme ultraviolet imaging layer via flood...

Active hardmask for lithographic patterning

Electrode in a discharge produced plasma extreme ultraviolet source

ELECTRODE INSULATOR MATERIALS FOR USE IN EXTREME ULTRAVIOLET ELECTR...

Electrical discharge gas plasma EUV source insulator components