BYUNG-IN KWON

Person

Singapore, SG

People

Patents Grantslast 30 patents

Information Patent Grant
Exhaust module for wafer baking apparatus and wafer processing syst...
- Patent number 11,779,871
- Issue date Oct 10, 2023
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- Byung-In Kwon
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Reticle pod for preventing haze contamination and reticle stocker h...
- Patent number 11,693,307
- Issue date Jul 4, 2023
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- Jiyong Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment system
- Patent number 11,605,550
- Issue date Mar 14, 2023
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- Siwon Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming multiple patterned layers on wafer and exposure a...
- Patent number 11,342,184
- Issue date May 24, 2022
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- Bum-Hwan Jeon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correction method of photomask pattern
- Patent number 11,340,523
- Issue date May 24, 2022
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- Siwon Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for processing a substrate using the same
- Patent number 11,079,690
- Issue date Aug 3, 2021
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- Hyun-Suk Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR PROCESSING A SUBSTRATE USING THE SAME
- Publication number 20210208515
- Publication date Jul 8, 2021
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- HYUN-SUK YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE STAGE FOR PREVENTING HAZE CONTAMINATION AND EXPOSURE APPARA...
- Publication number 20210208516
- Publication date Jul 8, 2021
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- JIYONG YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE POD FOR PREVENTING HAZE CONTAMINATION AND RETICLE STOCKER H...
- Publication number 20210157227
- Publication date May 27, 2021
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- JIYONG YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING MULTIPLE PATTERNED LAYERS ON WAFER AND EXPOSURE A...
- Publication number 20210159071
- Publication date May 27, 2021
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- BUM-HWAN JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR CONTROL CABINET MODULE AND CLEAN ROOM SYSTEM HAVING THE SAME
- Publication number 20210125843
- Publication date Apr 29, 2021
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- SUNG-UK KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT SYSTEM
- Publication number 20200219746
- Publication date Jul 9, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- SIWON YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CORRECTION METHOD OF PHOTOMASK PATTERN
- Publication number 20200218144
- Publication date Jul 9, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- SIWON YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST MODULE FOR WAFER BAKING APPARATUS AND WAFER PROCESSING SYST...
- Publication number 20200197851
- Publication date Jun 25, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- BYUNG-IN KWON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRACK SYSTEM AND METHOD OF PROCESSING SEMICONDUCTOR WAFERS
- Publication number 20200194297
- Publication date Jun 18, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- SUNGKUN JANG
- H01 - BASIC ELECTRIC ELEMENTS

BYUNG-IN KWON

Person

Patents Grantslast 30 patents

Exhaust module for wafer baking apparatus and wafer processing syst...

Reticle pod for preventing haze contamination and reticle stocker h...

Alignment system

Method of forming multiple patterned layers on wafer and exposure a...

Correction method of photomask pattern

Apparatus and method for processing a substrate using the same

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR PROCESSING A SUBSTRATE USING THE SAME

RETICLE STAGE FOR PREVENTING HAZE CONTAMINATION AND EXPOSURE APPARA...

RETICLE POD FOR PREVENTING HAZE CONTAMINATION AND RETICLE STOCKER H...

METHOD OF FORMING MULTIPLE PATTERNED LAYERS ON WAFER AND EXPOSURE A...

AIR CONTROL CABINET MODULE AND CLEAN ROOM SYSTEM HAVING THE SAME

ALIGNMENT SYSTEM

CORRECTION METHOD OF PHOTOMASK PATTERN

EXHAUST MODULE FOR WAFER BAKING APPARATUS AND WAFER PROCESSING SYST...

TRACK SYSTEM AND METHOD OF PROCESSING SEMICONDUCTOR WAFERS