BYUNGGOOK KIM

Person

Seoul, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Lithography method using multi-scale simulation, semiconductor devi...
- Patent number 11,493,850
- Issue date Nov 8, 2022
- Samsung Electronics Co., Ltd.
- Byunghoon Lee
- G05 - CONTROLLING REGULATING
Information Patent Grant
Pellicle for preventing thermal accumulation and extreme ultra-viol...
- Patent number 10,274,820
- Issue date Apr 30, 2019
- Samsung Electronics Co., Ltd.
- Hwanchul Jeon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems including a beam projection device providing variable expos...
- Patent number 10,115,562
- Issue date Oct 30, 2018
- Samsung Electronics Co., Ltd.
- Suyoung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle for preventing thermal accumulation and extreme ultra-viol...
- Patent number 9,952,502
- Issue date Apr 24, 2018
- Samsung Electronics Co., Ltd.
- Hwanchul Jeon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask including pellicle, pellicle repairing apparatus, and substrat...
- Patent number 9,703,186
- Issue date Jul 11, 2017
- Samsung Electronics Co., Ltd.
- Mun Ja Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of manufacturing pellicles having graphite layers
- Patent number 9,612,528
- Issue date Apr 4, 2017
- Samsung Electronics Co., Ltd.
- Munja Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of fabricating a photomask and use thereof
- Patent number 8,232,029
- Issue date Jul 31, 2012
- Samsung Electronics Co., Ltd.
- MyoungSoo Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of correcting patterns for semiconductor device
- Patent number 8,105,737
- Issue date Jan 31, 2012
- Samsung Electronics Co., Ltd.
- MyoungSoo Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHY METHOD USING MULTI-SCALE SIMULATION, SEMICONDUCTOR DEVI...
- Publication number 20230047588
- Publication date Feb 16, 2023
- Seoul National University R&DB Foundation
- Byunghoon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY METHOD USING MULTI-SCALE SIMULATION, SEMICONDUCTOR DEVI...
- Publication number 20210026249
- Publication date Jan 28, 2021
- Seoul National University R&DB Foundation
- Byunghoon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE FOR PREVENTING THERMAL ACCUMULATION AND EXTREME ULTRA-VIOL...
- Publication number 20180203346
- Publication date Jul 19, 2018
- Samsung Electronics Co., Ltd.
- Hwanchul JEON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS INCLUDING A BEAM PROJECTION DEVICE PROVIDING VARIABLE EXPOS...
- Publication number 20170133199
- Publication date May 11, 2017
- Samsung Electronics Co., Ltd.
- SUYOUNG LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS GENERATING EXTREME ULTRAVIOLET LIGHT AND EXPOSURE SYSTEM...
- Publication number 20170031142
- Publication date Feb 2, 2017
- Samsung Electronics Co., Ltd.
- Eokbong KIM
- G02 - OPTICS
Information Patent Application
PELLICLE FOR PREVENTING THERMAL ACCUMULATION AND EXTREME ULTRA-VIOL...
- Publication number 20160334698
- Publication date Nov 17, 2016
- Hwanchul JEON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Including Pellicle, Pellicle Repairing Apparatus, and Substrat...
- Publication number 20160139501
- Publication date May 19, 2016
- Samsung Electronics Co., Ltd.
- Mun Ja Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF MANUFACTURING PELLICLES HAVING GRAPHITE LAYERS
- Publication number 20160139500
- Publication date May 19, 2016
- Samsung Electronics Co., Ltd.
- Munja KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK FOR FABRICATING SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING...
- Publication number 20140302428
- Publication date Oct 9, 2014
- Samsung Electronics Co., Ltd.
- So-Eun Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF FABRICATING A PHOTOMASK AND USE THEREOF
- Publication number 20120100468
- Publication date Apr 26, 2012
- Samsung Electronics Co., Ltd.
- MyoungSoo LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CORRECTING PATTERNS FOR SEMICONDUCTOR DEVICE
- Publication number 20110096979
- Publication date Apr 28, 2011
- MyoungSoo LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask providing uniform critical dimension on semiconductor dev...
- Publication number 20070065732
- Publication date Mar 22, 2007
- Donggun Lee
- B82 - NANO-TECHNOLOGY

BYUNGGOOK KIM

Person

Patents Grantslast 30 patents

Lithography method using multi-scale simulation, semiconductor devi...

Pellicle for preventing thermal accumulation and extreme ultra-viol...

Systems including a beam projection device providing variable expos...

Pellicle for preventing thermal accumulation and extreme ultra-viol...

Mask including pellicle, pellicle repairing apparatus, and substrat...

Methods of manufacturing pellicles having graphite layers

Methods of fabricating a photomask and use thereof

Method of correcting patterns for semiconductor device

Patents Applicationslast 30 patents

LITHOGRAPHY METHOD USING MULTI-SCALE SIMULATION, SEMICONDUCTOR DEVI...

LITHOGRAPHY METHOD USING MULTI-SCALE SIMULATION, SEMICONDUCTOR DEVI...

PELLICLE FOR PREVENTING THERMAL ACCUMULATION AND EXTREME ULTRA-VIOL...

SYSTEMS INCLUDING A BEAM PROJECTION DEVICE PROVIDING VARIABLE EXPOS...

APPARATUS GENERATING EXTREME ULTRAVIOLET LIGHT AND EXPOSURE SYSTEM...

PELLICLE FOR PREVENTING THERMAL ACCUMULATION AND EXTREME ULTRA-VIOL...

Mask Including Pellicle, Pellicle Repairing Apparatus, and Substrat...

METHODS OF MANUFACTURING PELLICLES HAVING GRAPHITE LAYERS

MASK FOR FABRICATING SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING...

METHODS OF FABRICATING A PHOTOMASK AND USE THEREOF

METHOD OF CORRECTING PATTERNS FOR SEMICONDUCTOR DEVICE

Photomask providing uniform critical dimension on semiconductor dev...