Byunghoon Yoon

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gap fill methods using catalyzed deposition
- Patent number 12,351,909
- Issue date Jul 8, 2025
- Applied Materials, Inc.
- Byunghoon Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual silicide process using ruthenium silicide
- Patent number 12,094,785
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Thomas Anthony Empante
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Catalyzed deposition of metal films
- Patent number 12,000,044
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Sang Ho Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Catalyst enhanced seamless ruthenium gap fill
- Patent number 11,680,312
- Issue date Jun 20, 2023
- Applied Materials, Inc.
- Byunghoon Yoon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Catalyst enhanced seamless ruthenium gap fill
- Patent number 11,401,602
- Issue date Aug 2, 2022
- Applied Materials, Inc.
- Byunghoon Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of titanium films
- Patent number 11,286,556
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Byunghoon Yoon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synthesis of metal nitride thin films materials using hydrazine der...
- Patent number 10,487,398
- Issue date Nov 26, 2019
- Applied Materials, Inc.
- Byunghoon Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
DUAL SILICIDE PROCESS USING RUTHENIUM SILICIDE
- Publication number 20240404888
- Publication date Dec 5, 2024
- Applied Materuals, Inc.
- Thomas Anthony Empante
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-TEMPERATURE DEPOSITION PROCESSES TO FORM MOLYBDENUM-BASED MATER...
- Publication number 20240360549
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Non-Halide Oxygen-Free Organometallic Precursors for ALD/CVD of Met...
- Publication number 20230287022
- Publication date Sep 14, 2023
- Applied Materials, Inc.
- Byunghoon Yoon
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DUAL SILICIDE PROCESS USING RUTHENIUM SILICIDE
- Publication number 20230187282
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Thomas Anthony Empante
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CATALYST ENHANCED SEAMLESS RUTHENIUM GAP FILL
- Publication number 20220333232
- Publication date Oct 20, 2022
- Applied Materials, Inc.
- Byunghoon Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAP FILL METHODS USING CATALYZED DEPOSITION
- Publication number 20220325410
- Publication date Oct 13, 2022
- Applied Materials, Inc.
- Byunghoon Yoon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF METAL FILMS
- Publication number 20210317570
- Publication date Oct 14, 2021
- Applied Materials, Inc.
- Byunghoon Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAP FILL METHODS USING CATALYZED DEPOSITION
- Publication number 20210285102
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Byunghoon Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CATALYST ENHANCED SEAMLESS RUTHENIUM GAP FILL
- Publication number 20210214842
- Publication date Jul 15, 2021
- Applied Materials, Inc.
- Byunghoon Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING A COBALT LAYER ON A SUBSTRATE
- Publication number 20200144056
- Publication date May 7, 2020
- Applied Materials, Inc.
- WEI LEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CATALYZED DEPOSITION OF METAL FILMS
- Publication number 20190390340
- Publication date Dec 26, 2019
- Applied Materials, Inc.
- Sang Ho Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Synthesis of Metal Nitride Thin Films Materials using Hydrazine Der...
- Publication number 20180155827
- Publication date Jun 7, 2018
- Applied Materials, Inc.
- Byunghoon Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Byunghoon Yoon

Person

Patents Grantslast 30 patents

Gap fill methods using catalyzed deposition

Dual silicide process using ruthenium silicide

Catalyzed deposition of metal films

Catalyst enhanced seamless ruthenium gap fill

Catalyst enhanced seamless ruthenium gap fill

Selective deposition of titanium films

Synthesis of metal nitride thin films materials using hydrazine der...

Patents Applicationslast 30 patents

DUAL SILICIDE PROCESS USING RUTHENIUM SILICIDE

LOW-TEMPERATURE DEPOSITION PROCESSES TO FORM MOLYBDENUM-BASED MATER...

Non-Halide Oxygen-Free Organometallic Precursors for ALD/CVD of Met...

DUAL SILICIDE PROCESS USING RUTHENIUM SILICIDE

CATALYST ENHANCED SEAMLESS RUTHENIUM GAP FILL

GAP FILL METHODS USING CATALYZED DEPOSITION

DEPOSITION OF METAL FILMS

GAP FILL METHODS USING CATALYZED DEPOSITION

CATALYST ENHANCED SEAMLESS RUTHENIUM GAP FILL

METHOD OF FORMING A COBALT LAYER ON A SUBSTRATE

CATALYZED DEPOSITION OF METAL FILMS

Synthesis of Metal Nitride Thin Films Materials using Hydrazine Der...