Caizhong Tian

Person

Hyogo-Ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for plasma treatment and method for plasma treatment
- Patent number 9,277,637
- Issue date Mar 1, 2016
- Tokyo Electron Limited
- Toshihisa Nozawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Dielectric window for plasma treatment device, and plasma treatment...
- Patent number 9,048,070
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Caizhong Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Top plate of microwave plasma processing apparatus, plasma processi...
- Patent number 8,967,080
- Issue date Mar 3, 2015
- Tokyo Electron Limited
- Caizhong Tian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Manufacturing method of top plate of plasma processing apparatus
- Patent number 8,925,351
- Issue date Jan 6, 2015
- Tokyo Electron Limited
- Caizhong Tian
- B32 - LAYERED PRODUCTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,480,848
- Issue date Jul 9, 2013
- Tokyo Electron Limited
- Caizhong Tian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing unit
- Patent number 8,387,560
- Issue date Mar 5, 2013
- Tokyo Electron Limited
- Caizhong Tian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ceiling plate and plasma process apparatus
- Patent number 8,343,308
- Issue date Jan 1, 2013
- Tokyo Electron Limited
- Caizhong Tian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method for adjusting plasma density...
- Patent number 8,273,210
- Issue date Sep 25, 2012
- Tokyo Electron Limited
- Caizhong Tian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Microwave plasma processing apparatus
- Patent number 7,895,971
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Caizhong Tian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system for treating a substrate
- Patent number 7,396,431
- Issue date Jul 8, 2008
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DIELECTRIC WINDOW FOR PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT...
- Publication number 20140312767
- Publication date Oct 23, 2014
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS MONITORING DEVICE FOR USE IN SUBSTRATE PROCESS APPARATUS, P...
- Publication number 20140166205
- Publication date Jun 19, 2014
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR PLASMA TREATMENT AND METHOD FOR PLASMA TREATMENT
- Publication number 20130302992
- Publication date Nov 14, 2013
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF TOP PLATE OF PLASMA PROCESSING APPARATUS
- Publication number 20130292047
- Publication date Nov 7, 2013
- Caizhong Tian
- B32 - LAYERED PRODUCTS
Information Patent Application
CEILING PLATE AND PLASMA PROCESS APPARATUS
- Publication number 20130081763
- Publication date Apr 4, 2013
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLANAR ANTENNA MEMBER AND PLASMA PROCESSING APPARATUS INCLUDING THE...
- Publication number 20110114021
- Publication date May 19, 2011
- Atsushi Ueda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TOP PLATE OF MICROWAVE PLASMA PROCESSING APPARATUS, PLASMA PROCESSI...
- Publication number 20110000780
- Publication date Jan 6, 2011
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS
- Publication number 20100307685
- Publication date Dec 9, 2010
- TOKYO ELECTRON LIMITED
- Kinya Ota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR ADJUSTING PLASMA DENSITY...
- Publication number 20100252412
- Publication date Oct 7, 2010
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CEILING PLATE AND PLASMA PROCESS APPARATUS
- Publication number 20100032094
- Publication date Feb 11, 2010
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE INTRODUCTION DEVICE
- Publication number 20090266487
- Publication date Oct 29, 2009
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20090242130
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TEMPERATURE CONTROL DEVICE AND PROCESSING APPARATUS USING THE SAME
- Publication number 20090183677
- Publication date Jul 23, 2009
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20090050052
- Publication date Feb 26, 2009
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20080254220
- Publication date Oct 16, 2008
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- B32 - LAYERED PRODUCTS
Information Patent Application
Microwave Plasma Processing Apparatus
- Publication number 20080190560
- Publication date Aug 14, 2008
- Caizhong Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Unit
- Publication number 20080035058
- Publication date Feb 14, 2008
- Caizhong Tian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Microwave Plasma Processing Apparatus
- Publication number 20070283887
- Publication date Dec 13, 2007
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Caizhong Tian

Person

Patents Grantslast 30 patents

Apparatus for plasma treatment and method for plasma treatment

Dielectric window for plasma treatment device, and plasma treatment...

Top plate of microwave plasma processing apparatus, plasma processi...

Manufacturing method of top plate of plasma processing apparatus

Plasma processing apparatus

Plasma processing unit

Ceiling plate and plasma process apparatus

Plasma processing apparatus and method for adjusting plasma density...

Microwave plasma processing apparatus

Plasma processing system for treating a substrate

Patents Applicationslast 30 patents

DIELECTRIC WINDOW FOR PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT...

PROCESS MONITORING DEVICE FOR USE IN SUBSTRATE PROCESS APPARATUS, P...

APPARATUS FOR PLASMA TREATMENT AND METHOD FOR PLASMA TREATMENT

MANUFACTURING METHOD OF TOP PLATE OF PLASMA PROCESSING APPARATUS

CEILING PLATE AND PLASMA PROCESS APPARATUS

PLANAR ANTENNA MEMBER AND PLASMA PROCESSING APPARATUS INCLUDING THE...

TOP PLATE OF MICROWAVE PLASMA PROCESSING APPARATUS, PLASMA PROCESSI...

MICROWAVE PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD FOR ADJUSTING PLASMA DENSITY...

CEILING PLATE AND PLASMA PROCESS APPARATUS

MICROWAVE INTRODUCTION DEVICE

PLASMA PROCESSING APPARATUS

TEMPERATURE CONTROL DEVICE AND PROCESSING APPARATUS USING THE SAME

PLASMA PROCESSING APPARATUS

Plasma processing apparatus

Microwave Plasma Processing Apparatus

Plasma Processing Unit

Microwave Plasma Processing Apparatus