Calvin T. Gabriel

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Charge trapping split gate embedded flash memory and associated met...
- Patent number 9,922,833
- Issue date Mar 20, 2018
- Cypress Semiconductor Corporation
- Mark Ramsbey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line-edge roughness improvement for small pitches
- Patent number 9,368,393
- Issue date Jun 14, 2016
- Cypress Semiconductor Corporation
- Calvin T. Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line-edge roughness improvement for small pitches
- Patent number 8,877,641
- Issue date Nov 4, 2014
- Spansion LLC
- Calvin T Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned patterning method by using non-conformal film and etch...
- Patent number 8,035,153
- Issue date Oct 11, 2011
- Spansion LLC
- Shenqing Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a polymer spacer and Si trench in a bitline junction of a fl...
- Patent number 7,906,807
- Issue date Mar 15, 2011
- Spansion LLC
- Ning Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a polymer spacer and Si trench in a bitline junction of a fl...
- Patent number 7,776,688
- Issue date Aug 17, 2010
- Spansion LLC
- Ning Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned patterning method by using non-conformal film and etch...
- Patent number 7,732,276
- Issue date Jun 8, 2010
- Spansion LLC
- Shenqing Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film germanium diode with low reverse breakdown
- Patent number 7,468,296
- Issue date Dec 23, 2008
- Spansion LLC
- Ercan Adem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for designing grating structures for use in situ scatterome...
- Patent number 7,427,457
- Issue date Sep 23, 2008
- Advanced Micro Devices, Inc.
- Marina V. Plat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quantifying and predicting the impact of line edge roughness on dev...
- Patent number 7,379,924
- Issue date May 27, 2008
- Advanced Micro Devices, Inc.
- Amit P. Marathe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing resist to pattern organic low k-dielectrics
- Patent number 7,309,659
- Issue date Dec 18, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal/oxide etch after polish to prevent bridging between adjacent...
- Patent number 7,288,487
- Issue date Oct 30, 2007
- Spansion LLC
- Inkuk Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve ignition in plasma etching or plasma deposition s...
- Patent number 7,279,429
- Issue date Oct 9, 2007
- Advanced Micro Devices, Inc.
- Calvin T. Gabriel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Using scatterometry to verify contact hole opening during tapered b...
- Patent number 7,235,414
- Issue date Jun 26, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G01 - MEASURING TESTING
Information Patent Grant
Method of making a semiconductor structure
- Patent number 7,135,396
- Issue date Nov 14, 2006
- Spansion LLC
- Calvin T. Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an interlevel dielectric layer employing dielectr...
- Patent number 7,132,306
- Issue date Nov 7, 2006
- Advanced Micro Devices, Inc.
- Seung-Hyun Rhee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method using in situ scatterometry to detect photoresist...
- Patent number 7,052,921
- Issue date May 30, 2006
- Advanced Micro Devices, Inc.
- Marina V. Plat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing critical dimension attainable via the use of an...
- Patent number 6,864,184
- Issue date Mar 8, 2005
- Advanced Micro Devices, Inc.
- Calvin T. Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
N-containing plasma etch process with reduced resist poisoning
- Patent number 6,846,749
- Issue date Jan 25, 2005
- Advanced Micro Devices, Inc.
- Calvin T. Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optimized gate implants for reducing dopant effects during gate etc...
- Patent number 6,822,291
- Issue date Nov 23, 2004
- Koninklijke Philips Electronics N.V.
- Calvin Todd Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for improving the etch stability of ultra-thin photoresist
- Patent number 6,815,359
- Issue date Nov 9, 2004
- Advanced Micro Devices, Inc.
- Calvin T. Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line edge roughness reduction by plasma treatment before etch
- Patent number 6,811,956
- Issue date Nov 2, 2004
- Advanced Micro Devices, Inc.
- Calvin T. Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch process that resists notching at electrode bottom
- Patent number 6,794,294
- Issue date Sep 21, 2004
- Koninklijke Philips Electronics N.V.
- Tammy Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective photoresist hardening to facilitate lateral trimming
- Patent number 6,716,571
- Issue date Apr 6, 2004
- Advanced Micro Devices, Inc.
- Calvin T. Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor treatment for repairing damage of low-k dielectric
- Patent number 6,713,382
- Issue date Mar 30, 2004
- Advanced Micro Devices, Inc.
- Suzette K. Pangrle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Attenuated phase shift mask for use in EUV lithography and a method...
- Patent number 6,645,679
- Issue date Nov 11, 2003
- Advanced Micro Devices, Inc.
- Bruno M. La Fontaine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for forming an interconnect structure using a CVD organic BA...
- Patent number 6,632,707
- Issue date Oct 14, 2003
- Advanced Micro Devices, Inc.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor blocking layer for preventing UV radiation damage to...
- Patent number 6,627,536
- Issue date Sep 30, 2003
- Koninklijke Philips Electronics N.V.
- Calvin Todd Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching using combination of CHF3 and CH3F
- Patent number 6,610,608
- Issue date Aug 26, 2003
- Advanced Micro Devices, Inc.
- Lynne A. Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slot via filled dual damascene interconnect structure without middl...
- Patent number 6,603,206
- Issue date Aug 5, 2003
- Advanced Micro Devices, Inc.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGE TRAPPING SPLIT GATE EMBEDDED FLASH MEMORY AND ASSOCIATED MET...
- Publication number 20160111292
- Publication date Apr 21, 2016
- CYPRESS SEMICONDUCTOR CORPORATION
- Mark RAMSBEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE-EDGE ROUGHNESS IMPROVEMENT FOR SMALL PITCHES
- Publication number 20150050814
- Publication date Feb 19, 2015
- SPANSION LLC
- Calvin T GABRIEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charge Trapping Split Gate Embedded Flash Memory and Associated Met...
- Publication number 20140167141
- Publication date Jun 19, 2014
- SPANSION LLC
- Mark RAMSBEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE-EDGE ROUGHNESS IMPROVEMENT FOR SMALL PITCHES
- Publication number 20110159699
- Publication date Jun 30, 2011
- Calvin T. GABRIEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A POLYMER SPACER AND SI TRENCH IN A BITLINE JUNCTION OF A FL...
- Publication number 20100264480
- Publication date Oct 21, 2010
- SPANSION LLC
- Ning Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED PATTERNING METHOD BY USING NON-CONFORMAL FILM AND ETCH...
- Publication number 20100230743
- Publication date Sep 16, 2010
- Shenqing Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A POLYMER SPACER AND SI TRENCH IN A BITLINE JUNCTION OF A FL...
- Publication number 20090042378
- Publication date Feb 12, 2009
- SPANSION LLC
- Ning Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-aligned patterning method by using non-conformal film and etch...
- Publication number 20080265301
- Publication date Oct 30, 2008
- Shenqing Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact etch resistant spacers
- Publication number 20050121738
- Publication date Jun 9, 2005
- Calvin T. Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective etch shallow trench isolation barrier integrated circuit...
- Publication number 20050073021
- Publication date Apr 7, 2005
- Calvin Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimized gate implants for reducing dopant effects during gate etc...
- Publication number 20030146472
- Publication date Aug 7, 2003
- Calvin Todd Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective photoresist hardening to facilitate lateral trimming
- Publication number 20020139773
- Publication date Oct 3, 2002
- Advanced Micro Devices, Inc.
- Calvin T. Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for improving the etch stability of ultra-thin photoresist
- Publication number 20020142607
- Publication date Oct 3, 2002
- Advanced Micro Devices, Inc.
- Calvin T. Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Slot via filled dual damascene structure without middle stop layer...
- Publication number 20020106889
- Publication date Aug 8, 2002
- Advanced Micro Devices, Inc.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING A SLOT DUAL DAMASCENE STRUCTURE WITHOUT MIDDL...
- Publication number 20020106885
- Publication date Aug 8, 2002
- Advanced Micro Devices, Inc.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimized metal etch process to enable the use of aluminum plugs
- Publication number 20010012690
- Publication date Aug 9, 2001
- Philips Semiconductors, Inc.
- Tammy Zheng
- H01 - BASIC ELECTRIC ELEMENTS

Calvin T. Gabriel

Person

Patents Grantslast 30 patents

Charge trapping split gate embedded flash memory and associated met...

Line-edge roughness improvement for small pitches

Line-edge roughness improvement for small pitches

Self-aligned patterning method by using non-conformal film and etch...

Use of a polymer spacer and Si trench in a bitline junction of a fl...

Use of a polymer spacer and Si trench in a bitline junction of a fl...

Self-aligned patterning method by using non-conformal film and etch...

Thin film germanium diode with low reverse breakdown

Methods for designing grating structures for use in situ scatterome...

Quantifying and predicting the impact of line edge roughness on dev...

Silicon-containing resist to pattern organic low k-dielectrics

Metal/oxide etch after polish to prevent bridging between adjacent...

Method to improve ignition in plasma etching or plasma deposition s...

Using scatterometry to verify contact hole opening during tapered b...

Method of making a semiconductor structure

Method of forming an interlevel dielectric layer employing dielectr...

System and method using in situ scatterometry to detect photoresist...

Method for reducing critical dimension attainable via the use of an...

N-containing plasma etch process with reduced resist poisoning

Optimized gate implants for reducing dopant effects during gate etc...

Process for improving the etch stability of ultra-thin photoresist

Line edge roughness reduction by plasma treatment before etch

Etch process that resists notching at electrode bottom

Selective photoresist hardening to facilitate lateral trimming

Vapor treatment for repairing damage of low-k dielectric

Attenuated phase shift mask for use in EUV lithography and a method...

Method for forming an interconnect structure using a CVD organic BA...

Semiconductor blocking layer for preventing UV radiation damage to...

Plasma etching using combination of CHF3 and CH3F

Slot via filled dual damascene interconnect structure without middl...

Patents Applicationslast 30 patents

CHARGE TRAPPING SPLIT GATE EMBEDDED FLASH MEMORY AND ASSOCIATED MET...

LINE-EDGE ROUGHNESS IMPROVEMENT FOR SMALL PITCHES

Charge Trapping Split Gate Embedded Flash Memory and Associated Met...

LINE-EDGE ROUGHNESS IMPROVEMENT FOR SMALL PITCHES

USE OF A POLYMER SPACER AND SI TRENCH IN A BITLINE JUNCTION OF A FL...

SELF-ALIGNED PATTERNING METHOD BY USING NON-CONFORMAL FILM AND ETCH...

USE OF A POLYMER SPACER AND SI TRENCH IN A BITLINE JUNCTION OF A FL...

Self-aligned patterning method by using non-conformal film and etch...

Contact etch resistant spacers

Selective etch shallow trench isolation barrier integrated circuit...

Optimized gate implants for reducing dopant effects during gate etc...

Selective photoresist hardening to facilitate lateral trimming

Process for improving the etch stability of ultra-thin photoresist

Slot via filled dual damascene structure without middle stop layer...

METHOD OF FABRICATING A SLOT DUAL DAMASCENE STRUCTURE WITHOUT MIDDL...

Optimized metal etch process to enable the use of aluminum plugs