Canfeng Lai

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Single chamber flowable film formation and treatments
- Patent number 12,142,459
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Khokan Chandra Paul
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic holding structures for plasma processing applications
- Patent number 12,020,965
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic-material shield around plasma chambers near pedestal
- Patent number 11,984,302
- Issue date May 14, 2024
- Applied Materials, Inc.
- Job George Konnoth Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chambers for deposition and etch
- Patent number 11,699,571
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Khokan Chandra Paul
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for selective nitridation process
- Patent number 11,581,408
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Matthew Scott Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductive plasma source with metallic shower head using b-field con...
- Patent number 11,450,509
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency conduit
- Patent number D946534
- Issue date Mar 22, 2022
- Applied Materials, Inc.
- Adam Fischbach
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Method and apparatus for selective nitridation process
- Patent number 10,950,698
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Matthew Scott Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber member of a plasma source and pedestal with radially outwar...
- Patent number 10,699,878
- Issue date Jun 30, 2020
- Lam Research Corporation
- James Eugene Caron
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductive plasma source with metallic shower head using B-field con...
- Patent number 10,529,541
- Issue date Jan 7, 2020
- Applied Materials, Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing substrates using an ion shield
- Patent number 9,048,190
- Issue date Jun 2, 2015
- Applied Materials, Inc.
- Jeffrey Tobin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceiling electrode with process gas dispersers housing plural induct...
- Patent number 8,317,970
- Issue date Nov 27, 2012
- Applied Materials, Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation process with chamber seasoning an...
- Patent number 8,003,500
- Issue date Aug 23, 2011
- Applied Materials, Inc.
- Manoj Vellaikal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal balanced coil for inductively coupled high density plasma...
- Patent number 7,789,993
- Issue date Sep 7, 2010
- Applied Materials, Inc.
- Robert Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation process with chamber seasoning an...
- Patent number 7,659,184
- Issue date Feb 9, 2010
- Applied Materials, Inc.
- Manoj Vellaikal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-piece dome with separate RF coils for inductively coupled plasm...
- Patent number 7,651,587
- Issue date Jan 26, 2010
- Applied Materials, Inc.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber clean method using remote and in situ plasma cleaning systems
- Patent number 7,588,036
- Issue date Sep 15, 2009
- Applied Materials, Inc.
- Zhenjiang Cui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-frequency bias power in HDP-CVD processes
- Patent number 7,571,698
- Issue date Aug 11, 2009
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal balanced coil for inductively coupled high density plasma...
- Patent number 7,572,647
- Issue date Aug 11, 2009
- Applied Materials, Inc.
- Robert Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In situ application of etch back for improved deposition into high-...
- Patent number 7,399,707
- Issue date Jul 15, 2008
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-core transformer plasma source
- Patent number 7,363,876
- Issue date Apr 29, 2008
- Applied Materials, Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-intrusive plasma probe
- Patent number 6,894,474
- Issue date May 17, 2005
- Applied Materials, Inc.
- Michael S. Cox
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
In situ application of etch back for improved deposition into high-...
- Patent number 6,869,880
- Issue date Mar 22, 2005
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device fabrication chamber cleaning method and appara...
- Patent number 6,863,019
- Issue date Mar 8, 2005
- Applied Materials, Inc.
- Shamouil Shamouilian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atmospheric substrate processing apparatus for depositing multiple...
- Patent number 6,841,006
- Issue date Jan 11, 2005
- Applied Materials, Inc.
- Michael Barnes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-core transformer plasma source
- Patent number 6,755,150
- Issue date Jun 29, 2004
- Applied Materials Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Toroidal plasma source for plasma processing
- Patent number 6,712,020
- Issue date Mar 30, 2004
- Applied Materials Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with extended radio frequency electrode upper sur...
- Patent number 6,682,603
- Issue date Jan 27, 2004
- Applied Materials Inc.
- Sudhir Gondhalekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Directing a flow of gas in a substrate processing chamber
- Patent number 6,450,117
- Issue date Sep 17, 2002
- Applied Materials, Inc.
- Laxman Murugesh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-permeability magnetic shield for improved process uniformity i...
- Patent number 6,447,651
- Issue date Sep 10, 2002
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MAGNETIC HOLDING STRUCTURES FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20240297059
- Publication date Sep 5, 2024
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOWER DEPOSITION CHAMBER CCP ELECTRODE CLEANING SOLUTION
- Publication number 20230377855
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Mukesh Shivakumaraiah CHITRADURGA
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR DEPOSITION AND ETCH
- Publication number 20230343552
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Khokan Chandra Paul
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETIC-MATERIAL SHIELD AROUND PLASMA CHAMBERS NEAR PEDESTAL
- Publication number 20220139679
- Publication date May 5, 2022
- Applied Materials, Inc.
- Job George KONNOTH JOSEPH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC HOLDING STRUCTURES FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20220122866
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SINGLE CHAMBER FLOWABLE FILM FORMATION AND TREATMENTS
- Publication number 20220076922
- Publication date Mar 10, 2022
- Applied Materials, Inc.
- Khokan Chandra Paul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBERS FOR DEPOSITION AND ETCH
- Publication number 20220076920
- Publication date Mar 10, 2022
- Applied Materials, Inc.
- Khokan Chandra Paul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD DESIGN TO CONTROL STRAY DEPOSITION
- Publication number 20220064797
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Akshay DHANAKSHIRUR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR SELECTIVE NITRIDATION PROCESS
- Publication number 20210202702
- Publication date Jul 1, 2021
- Applied Materials, Inc.
- Matthew Scott ROGERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVE PLASMA SOURCE WITH METALLIC SHOWER HEAD USING B-FIELD CON...
- Publication number 20200144027
- Publication date May 7, 2020
- Applied Materials, Inc.
- Canfeng LAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUSES FOR CONTROLLING TRANSITIONS BETWEEN CONTINU...
- Publication number 20170330764
- Publication date Nov 16, 2017
- LAM RESEARCH CORPORATION
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER MEMEBER OF A PLASMA SOURCE AND PEDESTAL WITH RADIALLY OUTWA...
- Publication number 20170236688
- Publication date Aug 17, 2017
- LAM RESEARCH CORPORATION
- James Eugene Caron
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVE PLASMA SOURCE WITH METALLIC SHOWER HEAD USING B-FIELD CON...
- Publication number 20170194128
- Publication date Jul 6, 2017
- Applied Materials, Inc.
- Canfeng LAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR PRODUCING ENERGETIC NEUTRALS
- Publication number 20160013020
- Publication date Jan 14, 2016
- LAM RESEARCH CORPORATION
- Kaihan Ashtiani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING SUBSTRATES USING AN ION SHIELD
- Publication number 20150332941
- Publication date Nov 19, 2015
- Applied Materials, Inc.
- JEFFREY TOBIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING SUBSTRATES USING AN ION SHIELD
- Publication number 20140099795
- Publication date Apr 10, 2014
- Applied Materials, Inc.
- JEFFREY TOBIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING POWER DISTRIBUTION IN SUBSTRA...
- Publication number 20130014894
- Publication date Jan 17, 2013
- Applied Materials, Inc.
- CANFENG LAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING POWER DISTRIBUTION IN SUBSTRA...
- Publication number 20130017315
- Publication date Jan 17, 2013
- Applied Materials, Inc.
- CANFENG LAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL PLASMA SOURCE, LAMP HEATED PLASMA CHAMBER
- Publication number 20120222618
- Publication date Sep 6, 2012
- Applied Materials, Inc.
- Christopher Olsen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVE PLASMA SOURCE WITH METALLIC SHOWER HEAD USING B-FIELD CON...
- Publication number 20110278260
- Publication date Nov 17, 2011
- Applied Materials, Inc.
- Canfeng Lai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CEILING ELECTRODE WITH PROCESS GAS DISPERSERS HOUSING PLURAL INDUCT...
- Publication number 20090294065
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- CANFENG LAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AN...
- Publication number 20090280628
- Publication date Nov 12, 2009
- Applied Materials, Inc.
- Manoj Vellaikal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-FREQUENCY BIAS POWER IN HDP-CVD PROCESSES
- Publication number 20090263594
- Publication date Oct 22, 2009
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AN...
- Publication number 20090215251
- Publication date Aug 27, 2009
- Applied Materials, Inc.
- Manoj Vellaikal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...
- Publication number 20080185284
- Publication date Aug 7, 2008
- Applied Materials, Inc.
- Robert Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...
- Publication number 20080188090
- Publication date Aug 7, 2008
- Applied Materials, Inc.
- ROBERT CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...
- Publication number 20080188087
- Publication date Aug 7, 2008
- Applied Materials, Inc.
- ROBERT CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Two-piece dome with separate RF coils for inductively coupled plasm...
- Publication number 20070037397
- Publication date Feb 15, 2007
- Applied Materials, Inc.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductive plasma system with sidewall magnet
- Publication number 20060177600
- Publication date Aug 10, 2006
- Applied Materials, Inc.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low-frequency bias power in HDP-CVD processes
- Publication number 20060150913
- Publication date Jul 13, 2006
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS

Canfeng Lai

Person

Patents Grantslast 30 patents

Single chamber flowable film formation and treatments

Magnetic holding structures for plasma processing applications

Magnetic-material shield around plasma chambers near pedestal

Semiconductor processing chambers for deposition and etch

Method and apparatus for selective nitridation process

Inductive plasma source with metallic shower head using b-field con...

Radio frequency conduit

Method and apparatus for selective nitridation process

Chamber member of a plasma source and pedestal with radially outwar...

Inductive plasma source with metallic shower head using B-field con...

Methods and apparatus for processing substrates using an ion shield

Ceiling electrode with process gas dispersers housing plural induct...

Plasma immersion ion implantation process with chamber seasoning an...

Internal balanced coil for inductively coupled high density plasma...

Plasma immersion ion implantation process with chamber seasoning an...

Two-piece dome with separate RF coils for inductively coupled plasm...

Chamber clean method using remote and in situ plasma cleaning systems

Low-frequency bias power in HDP-CVD processes

Internal balanced coil for inductively coupled high density plasma...

In situ application of etch back for improved deposition into high-...

Multi-core transformer plasma source

Non-intrusive plasma probe

In situ application of etch back for improved deposition into high-...

Semiconductor device fabrication chamber cleaning method and appara...

Atmospheric substrate processing apparatus for depositing multiple...

Multi-core transformer plasma source

Toroidal plasma source for plasma processing

Substrate support with extended radio frequency electrode upper sur...

Directing a flow of gas in a substrate processing chamber

High-permeability magnetic shield for improved process uniformity i...

Patents Applicationslast 30 patents

MAGNETIC HOLDING STRUCTURES FOR PLASMA PROCESSING APPLICATIONS

LOWER DEPOSITION CHAMBER CCP ELECTRODE CLEANING SOLUTION

SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR DEPOSITION AND ETCH

MAGNETIC-MATERIAL SHIELD AROUND PLASMA CHAMBERS NEAR PEDESTAL

MAGNETIC HOLDING STRUCTURES FOR PLASMA PROCESSING APPLICATIONS

SINGLE CHAMBER FLOWABLE FILM FORMATION AND TREATMENTS

SEMICONDUCTOR PROCESSING CHAMBERS FOR DEPOSITION AND ETCH

SHOWERHEAD DESIGN TO CONTROL STRAY DEPOSITION

METHOD AND APPARATUS FOR SELECTIVE NITRIDATION PROCESS

INDUCTIVE PLASMA SOURCE WITH METALLIC SHOWER HEAD USING B-FIELD CON...

METHODS AND APPARATUSES FOR CONTROLLING TRANSITIONS BETWEEN CONTINU...

CHAMBER MEMEBER OF A PLASMA SOURCE AND PEDESTAL WITH RADIALLY OUTWA...

INDUCTIVE PLASMA SOURCE WITH METALLIC SHOWER HEAD USING B-FIELD CON...

SYSTEMS AND METHODS FOR PRODUCING ENERGETIC NEUTRALS

METHODS AND APPARATUS FOR PROCESSING SUBSTRATES USING AN ION SHIELD

METHODS AND APPARATUS FOR PROCESSING SUBSTRATES USING AN ION SHIELD

METHODS AND APPARATUS FOR CONTROLLING POWER DISTRIBUTION IN SUBSTRA...

METHODS AND APPARATUS FOR CONTROLLING POWER DISTRIBUTION IN SUBSTRA...

DUAL PLASMA SOURCE, LAMP HEATED PLASMA CHAMBER

INDUCTIVE PLASMA SOURCE WITH METALLIC SHOWER HEAD USING B-FIELD CON...

CEILING ELECTRODE WITH PROCESS GAS DISPERSERS HOUSING PLURAL INDUCT...

PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AN...

LOW-FREQUENCY BIAS POWER IN HDP-CVD PROCESSES

PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AN...

INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...

INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...

INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...

Two-piece dome with separate RF coils for inductively coupled plasm...

Inductive plasma system with sidewall magnet

Low-frequency bias power in HDP-CVD processes