Carl A. Sorensen

Person

Morgan Hill, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Film stress control for plasma enhanced chemical vapor deposition
- Patent number 11,854,771
- Issue date Dec 26, 2023
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF choke for gas delivery to an RF driven electrode in a plasma pro...
- Patent number 11,532,418
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film stress control for plasma enhanced chemical vapor deposition
- Patent number 11,094,508
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- Chien-Teh Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and apparatus for controlling phase ang...
- Patent number 10,903,048
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Yui Lun Wu
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
RF choke for gas delivery to an RF driven electrode in a plasma pro...
- Patent number 10,886,053
- Issue date Jan 5, 2021
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD thin film stress control method for display application
- Patent number 10,312,475
- Issue date Jun 4, 2019
- Applied Materials, Inc.
- Tae Kyung Won
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF choke for gas delivery to an RF driven electrode in a plasma pro...
- Patent number 10,304,607
- Issue date May 28, 2019
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Transmission line RF applicator for plasma chamber
- Patent number 9,818,580
- Issue date Nov 14, 2017
- Applied Materials, Inc.
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF choke for gas delivery to an RF driven electrode in a plasma pro...
- Patent number 9,761,365
- Issue date Sep 12, 2017
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for improved radio frequency matching networks
- Patent number 9,425,026
- Issue date Aug 23, 2016
- Applied Materials, Inc.
- Suhail Anwar
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Guided wave applicator with non-gaseous dielectric for plasma chamber
- Patent number 9,397,380
- Issue date Jul 19, 2016
- Applied Materials, Inc.
- Jozef Kudela
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ground return for plasma processes
- Patent number 9,382,621
- Issue date Jul 5, 2016
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Transmission line RF applicator for plasma chamber
- Patent number 9,048,518
- Issue date Jun 2, 2015
- Applied Materials, Inc.
- Jozef Kudela
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
RF bus and RF return bus for plasma chamber electrode
- Patent number 8,992,723
- Issue date Mar 31, 2015
- Applied Material, Inc.
- Carl A. Sorensen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source with vertical gradient
- Patent number 8,872,428
- Issue date Oct 28, 2014
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support with gas introduction openings
- Patent number 8,853,098
- Issue date Oct 7, 2014
- Applied Materials, Inc.
- Sam H. Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF choke for gas delivery to an RF driven electrode in a plasma pro...
- Patent number 8,728,586
- Issue date May 20, 2014
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Large area plasma processing chamber with at-electrode RF matching
- Patent number 8,691,047
- Issue date Apr 8, 2014
- Applied Materials, Inc.
- Carl A. Sorensen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for supporting substrates
- Patent number 8,365,682
- Issue date Feb 5, 2013
- Applied Materials, Inc.
- Wendell T. Blonigan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Asymmetrical RF drive for electrode of plasma chamber
- Patent number 8,343,592
- Issue date Jan 1, 2013
- Applied Materials, Inc.
- Jozef Kudela
- B44 - DECORATIVE ARTS
Information Patent Grant
Apparatus and methods for using high frequency chokes in a substrat...
- Patent number 8,163,191
- Issue date Apr 24, 2012
- Applied Materials, Inc.
- Carl A. Sorensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-gas flow diffuser
- Patent number 8,147,614
- Issue date Apr 3, 2012
- Applied Materials, Inc.
- John M. White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Remote inductively coupled plasma source for CVD chamber cleaning
- Patent number 8,075,734
- Issue date Dec 13, 2011
- Applied Materials, Inc.
- Carl A. Sorensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF current return path for a large area substrate plasma reactor
- Patent number 8,062,717
- Issue date Nov 22, 2011
- Applied Materials, Inc.
- Wendell Blonigan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing chamber with ground member integrity indicator an...
- Patent number 8,004,293
- Issue date Aug 23, 2011
- Applied Materials, Inc.
- John M. White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for a fixed impedance transformation network...
- Patent number 7,570,130
- Issue date Aug 4, 2009
- Applied Materials, Inc.
- Carl A. Sorensen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for symmetrical and/or concentric radio frequ...
- Patent number 7,518,466
- Issue date Apr 14, 2009
- Applied Materials, Inc.
- Carl Sorensen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
RF current return path for a large area substrate plasma reactor
- Patent number 7,083,702
- Issue date Aug 1, 2006
- Applied Materials, Inc.
- Wendell Blonigan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF matching network with distributed outputs
- Patent number 6,552,297
- Issue date Apr 22, 2003
- Applied Komatsu Technology, Inc.
- Wendell T. Blonigan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of TEOS oxide using pulsed RF plasma
- Patent number 6,451,390
- Issue date Sep 17, 2002
- Applied Materials, Inc.
- Haruhiro H. Goto
- C03 - GLASS MINERAL OR SLAG WOOL

Patents Applicationslast 30 patents

Information Patent Application
FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
- Publication number 20240105427
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- Chien-Teh KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...
- Publication number 20230272530
- Publication date Aug 31, 2023
- Applied Materials, Inc.
- Suhail ANWAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
- Publication number 20210280392
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Chien-Teh KAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...
- Publication number 20210090777
- Publication date Mar 25, 2021
- Applied Materials, Inc.
- Jozef KUDELA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...
- Publication number 20200347499
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- Suhail ANWAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
- Publication number 20200194233
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Chien-Teh KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...
- Publication number 20190198217
- Publication date Jun 27, 2019
- Applied Materials, Inc.
- Jozef KUDELA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...
- Publication number 20190189328
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Jozef KUDELA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20190043695
- Publication date Feb 7, 2019
- Applied Materials, Inc.
- Yui Lun WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD THIN FILM STRESS CONTROL METHOD FOR DISPLAY APPLICATION
- Publication number 20180331328
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Tae Kyung WON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Asymmetrical RF Drive for Electrode of Plasma Chamber
- Publication number 20180277351
- Publication date Sep 27, 2018
- Applied Materials, Inc.
- Jozef Kudela
- B44 - DECORATIVE ARTS
Information Patent Application
RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...
- Publication number 20170327946
- Publication date Nov 16, 2017
- Applied Materials, Inc.
- Jozef KUDELA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GROUND RETURN FOR PLASMA PROCESSES
- Publication number 20160305025
- Publication date Oct 20, 2016
- Applied Materials, Inc.
- Soo Young CHOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LA...
- Publication number 20160208380
- Publication date Jul 21, 2016
- Applied Materials, Inc.
- John M. WHITE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR IMPROVED RADIO FREQUENCY MATCHING NETWORKS
- Publication number 20160049917
- Publication date Feb 18, 2016
- Applied Materials, Inc.
- Suhail Anwar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Transmission Line RF Applicator for Plasma Chamber
- Publication number 20150340204
- Publication date Nov 26, 2015
- Applied Materials, Inc.
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...
- Publication number 20140216344
- Publication date Aug 7, 2014
- Applied Materials, Inc.
- Jozef KUDELA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Transmission line RF applicator for plasma chamber
- Publication number 20130221833
- Publication date Aug 29, 2013
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINEAR PECVD APPARATUS
- Publication number 20130206068
- Publication date Aug 15, 2013
- Jozef KUDELA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Asymmetrical RF Drive for Electrode of Plasma Chamber
- Publication number 20130186859
- Publication date Jul 25, 2013
- Applied Materials, Inc. a corporation of the State of Delaware, U.S.A.
- Jozef Kudela
- B44 - DECORATIVE ARTS
Information Patent Application
Guided Wave Applicator with Non-Gaseous Dielectric for Plasma Chamber
- Publication number 20130126331
- Publication date May 23, 2013
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LA...
- Publication number 20130068161
- Publication date Mar 21, 2013
- Applied Materials, Inc.
- John M. White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Transmission Line RF Applicator for Plasma Chamber
- Publication number 20120326592
- Publication date Dec 27, 2012
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Source with Vertical Gradient
- Publication number 20120217874
- Publication date Aug 30, 2012
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Support with Gas Introduction Openings
- Publication number 20120149194
- Publication date Jun 14, 2012
- Applied Materials, Inc.
- SAM H. KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR USING HIGH FREQUENCY CHOKES IN A SUBSTRAT...
- Publication number 20110259362
- Publication date Oct 27, 2011
- Applied Materials, Inc.
- Carl A. Sorensen
- B08 - CLEANING
Information Patent Application
LARGE AREA PLASMA PROCESSING CHAMBER WITH AT-ELECTRODE RF MATCHING
- Publication number 20110135844
- Publication date Jun 9, 2011
- Applied Materials, Inc.
- Carl A. Sorensen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-GAS FLOW DIFFUSER
- Publication number 20100311249
- Publication date Dec 9, 2010
- Applied Materials, Inc.
- JOHN M. WHITE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF Bus and RF Return Bus for Plasma Chamber Electrode
- Publication number 20100206483
- Publication date Aug 19, 2010
- Carl A. Sorensen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUND RETURN FOR PLASMA PROCESSES
- Publication number 20100196626
- Publication date Aug 5, 2010
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Carl A. Sorensen

Person

Patents Grantslast 30 patents

Film stress control for plasma enhanced chemical vapor deposition

RF choke for gas delivery to an RF driven electrode in a plasma pro...

Film stress control for plasma enhanced chemical vapor deposition

Substrate processing method and apparatus for controlling phase ang...

RF choke for gas delivery to an RF driven electrode in a plasma pro...

CVD thin film stress control method for display application

RF choke for gas delivery to an RF driven electrode in a plasma pro...

Transmission line RF applicator for plasma chamber

RF choke for gas delivery to an RF driven electrode in a plasma pro...

Systems and methods for improved radio frequency matching networks

Guided wave applicator with non-gaseous dielectric for plasma chamber

Ground return for plasma processes

Transmission line RF applicator for plasma chamber

RF bus and RF return bus for plasma chamber electrode

Plasma source with vertical gradient

Substrate support with gas introduction openings

RF choke for gas delivery to an RF driven electrode in a plasma pro...

Large area plasma processing chamber with at-electrode RF matching

Methods and apparatus for supporting substrates

Asymmetrical RF drive for electrode of plasma chamber

Apparatus and methods for using high frequency chokes in a substrat...

Multi-gas flow diffuser

Remote inductively coupled plasma source for CVD chamber cleaning

RF current return path for a large area substrate plasma reactor

Plasma processing chamber with ground member integrity indicator an...

Apparatus and methods for a fixed impedance transformation network...

Methods and apparatus for symmetrical and/or concentric radio frequ...

RF current return path for a large area substrate plasma reactor

RF matching network with distributed outputs

Deposition of TEOS oxide using pulsed RF plasma

Patents Applicationslast 30 patents

FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...

FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...

LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...

FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...

RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...

SUBSTRATE PROCESSING METHOD AND APPARATUS

CVD THIN FILM STRESS CONTROL METHOD FOR DISPLAY APPLICATION

Asymmetrical RF Drive for Electrode of Plasma Chamber

RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...

GROUND RETURN FOR PLASMA PROCESSES

GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LA...

SYSTEMS AND METHODS FOR IMPROVED RADIO FREQUENCY MATCHING NETWORKS

Transmission Line RF Applicator for Plasma Chamber

RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PRO...

Transmission line RF applicator for plasma chamber

LINEAR PECVD APPARATUS

Asymmetrical RF Drive for Electrode of Plasma Chamber

Guided Wave Applicator with Non-Gaseous Dielectric for Plasma Chamber

GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LA...

Transmission Line RF Applicator for Plasma Chamber

Plasma Source with Vertical Gradient

Substrate Support with Gas Introduction Openings

APPARATUS AND METHODS FOR USING HIGH FREQUENCY CHOKES IN A SUBSTRAT...

LARGE AREA PLASMA PROCESSING CHAMBER WITH AT-ELECTRODE RF MATCHING

MULTI-GAS FLOW DIFFUSER

RF Bus and RF Return Bus for Plasma Chamber Electrode

GROUND RETURN FOR PLASMA PROCESSES